公开(公告)号：US20220082945A1

公开(公告)日：2022-03-17

申请号：US17418719

申请日：2019-11-29

Applicant: ASML Netherlands B.V.

Inventor： Andrey NIKIPELOV ,  Antonius Franciscus Johannes DE GROOT ,  Mariya NEKLYUDOVA

IPC: G03F7/20

Abstract: A method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a main body having a main body surface, wherein the method includes the steps of: coating at least part of the main body with a layer of a first coating material; and treating a plurality of discrete regions of the first coating material with laser irradiation to selectively convert said first coating material in said regions to a second coating material having a different structure or density.

公开(公告)号：US20210055660A1

公开(公告)日：2021-02-25

申请号：US16977503

申请日：2019-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexey Olegovich POLYAKOV ,  Erwin Paul SMAKMAN ,  Andrey NIKIPELOV ,  Albertus Victor Gerardus MANGNUS

IPC: G03F7/20 ,  G01N23/2251 ,  H01L21/67

Abstract: An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.

公开(公告)号：US20160012929A1

公开(公告)日：2016-01-14

申请号：US14765367

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexey Sergeevich KUZNETSOV ,  Arjen BOOGAARD ,  Jeroen Marcel HUIJBREGTSE ,  Andrey NIKIPELOV ,  Maarten VAN KAMPEN

IPC: G21K1/06 ,  G03F7/20 ,  C23C28/00 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜的方法，其包括第一材料和硅的交替层对的多层堆叠，所述方法包括沉积所述第一材料和硅层的交替层对，所述堆叠为 由衬底支撑并且用掺杂剂材料掺杂至少第一材料的第一层。