公开(公告)号：US09964861B2

公开(公告)日：2018-05-08

申请号：US15791317

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Jacobus Johannus Leonardus Hendricus Verspay ,  Hans Jansen ,  Marco Koert Stavenga

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

公开(公告)号：US20180004100A1

公开(公告)日：2018-01-04

申请号：US15707703

申请日：2017-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthonie Kuijper

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

公开(公告)号：US09436097B2

公开(公告)日：2016-09-06

申请号：US14586518

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria Mertens ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Antonius Johannus Van Der Net ,  Franciscus Johannes Herman Maria Teunissen ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Edwin Augustinus Matheus Van Gompel

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.