公开(公告)号：US20170038695A1

公开(公告)日：2017-02-09

申请号：US15299240

申请日：2016-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Marcel BECKERS ,  Stefan Philip Christiaan BELFROID ,  Ferdy MIGCHELBRINK ,  Sergei SHULEPOV

IPC: G03F7/20

Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Abstract translation: 提供多个提取管道以将浸入液体移入室中。 提取管道布置在与基板的目标部分不同的距离处。 提供了一个通道，吸入力被施加到该通道上。 当所有导管充满浸没液体时，提取能力将大于当一个或多个导管包含气体时的提取能力。

公开(公告)号：US20160320714A1

公开(公告)日：2016-11-03

申请号：US15142671

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Cédric Désiré GROUWSTRA ,  Nicolaas Rudolf KEMPER ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Dirk DE VRIES ,  Hua LI ,  Marinus JOCHEMSEN

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

Abstract translation: 一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。

公开(公告)号：US20150355556A1

公开(公告)日：2015-12-10

申请号：US14831663

申请日：2015-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Nicolaas Rudolf KEMPER ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

公开(公告)号：US20150309422A1

公开(公告)日：2015-10-29

申请号：US14792143

申请日：2015-07-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。