公开(公告)号：US12271008B2

公开(公告)日：2025-04-08

申请号：US17282559

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Marcus Adrianus Van De Kerkhof ,  Pieter-Jan Van Zwol ,  Laurentius Cornelius De Winter ,  Wouter Joep Engelen ,  Alexey Olegovich Polyakov

IPC: G02B5/02 ,  G03F7/00 ,  B82Y40/00

Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.

公开(公告)号：US11977326B2

公开(公告)日：2024-05-07

申请号：US17048875

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis De Graaf ,  Richard Beaudry ,  Maxime Biron ,  Paul Janssen ,  Thijs Kater ,  Kevin Kornelsen ,  Michael Alfred Josephus Kuijken ,  Jan Hendrik Willem Kuntzel ,  Stephane Martel ,  Maxim Aleksandrovich Nasalevich ,  Guido Salmaso ,  Pieter-Jan Van Zwol

IPC: G03F1/64 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70983

Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

公开(公告)号：US11686997B2

公开(公告)日：2023-06-27

申请号：US17685988

申请日：2022-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan Van Zwol ,  Adrianus Johannes Maria Giesbers ,  Johan Hendrik Klootwijk ,  Evgenia Kurganova ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Leonid Aizikovitsj Sjmaenok ,  Ties Wouter Van Der Woord ,  David Ferdinand Vles

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：US11467486B2

公开(公告)日：2022-10-11

申请号：US16969211

申请日：2019-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia Kurganova ,  Adrianus Johannes Maria Giesbers ,  Alexander Ludwig Klein ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles ,  Sten Vollebregt ,  Willem-Pieter Voorthuijzen

IPC: G03F1/62 ,  G03F7/20

Abstract: A catalyst including: a first layer including a transition metal; a base layer; and an interlayer, wherein the interlayer is disposed between the base layer and the first layer is disclosed. Also disclosed are methods for preparing a catalyst as well as for synthesizing graphene, a pellicle produced using the catalyst or methods disclosed herein, as well as a lithography apparatus including such a pellicle.

公开(公告)号：US11347142B2

公开(公告)日：2022-05-31

申请号：US17206649

申请日：2021-03-19

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US11314163B2

公开(公告)日：2022-04-26

申请号：US16754865

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Wilhelmus Duys ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles

IPC: G03F1/64

Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.

公开(公告)号：US11036128B2

公开(公告)日：2021-06-15

申请号：US16060837

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Mohammad Reza Kamali ,  Mária Péter ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/64 ,  G03F1/66 ,  G03F7/20

Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

公开(公告)号：US10983431B2

公开(公告)日：2021-04-20

申请号：US16667956

申请日：2019-10-30

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand Vles ,  Erik Achilles Abegg ,  Aage Bendiksen ,  Derk Servatius Gertruda Brouns ,  Pradeep K. Govil ,  Paul Janssen ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Marcus Adrianus Van De Kerkhof ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  James Norman Wiley

IPC: G03B27/42 ,  G03F1/64 ,  G03F1/22 ,  G03F7/20 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US10359710B2

公开(公告)日：2019-07-23

申请号：US15766225

申请日：2016-10-25

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Gijsbertus Schimmel ,  Jeroen Marcel Huijbregtse ,  Maarten Van Kampen ,  Pieter-Jan Van Zwol

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.