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公开(公告)号：US10788755B2
公开(公告)日：2020-09-29
申请号：US16229102
申请日：2018-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
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公开(公告)号：US10678139B2
公开(公告)日：2020-06-09
申请号：US16245400
申请日：2019-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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Patent Agency Ranking
公开(公告)号：US10345712B2
公开(公告)日：2019-07-09
申请号：US15918575
申请日：2018-03-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US09958787B2
公开(公告)日：2018-05-01
申请号：US14428023
申请日：2013-09-17
Applicant: ASML Netherlands B.V.
Inventor： Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Christiaan Louis Valentin , Antonius Johannes Josephus Van Dijsseldonk
CPC classification number: G03F7/70425 , G03F7/7045 , G03F7/70466 , G03F7/70475
Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.
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公开(公告)号：US09568841B2
公开(公告)日：2017-02-14
申请号：US15080258
申请日：2016-03-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
CPC classification number: G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Abstract translation: 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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公开(公告)号：US09134622B2
公开(公告)日：2015-09-15
申请号：US14107734
申请日：2013-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US08830446B2
公开(公告)日：2014-09-09
申请号：US13928203
申请日：2013-06-26
Applicant: ASML Netherlands B.V.
Inventor： Arjen Boogaard , Timotheus Franciscus Sengers , Wilhelmus Sebastianus Marcus Maria Ketelaars , Carolus Ida Maria Antonius Spee
CPC classification number: G03F7/70058 , G03B27/42 , G03F7/70716 , G03F7/7085 , G03F7/70916 , G03F7/70958
Abstract: An extreme ultraviolet exposure apparatus includes a radiation system configured to supply a beam of extreme ultraviolet radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam of extreme ultraviolet radiation according to a desired pattern; a substrate table having an area configured to support a substrate; a projection system configured to project the patterned beam of extreme ultraviolet radiation onto a target portion of the substrate, the projection system comprising a reflective optical system; wherein at least a part of the apparatus that during use of the apparatus is exposed to the beam of extreme ultraviolet radiation is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.
Abstract translation: 一种极紫外曝光装置包括一个被配置为提供一束极紫外线辐射的辐射系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被配置为根据期望的图案来对所述紫外线辐射束进行图案化; 具有被配置为支撑衬底的区域的衬底台; 投影系统，被配置为将所述图案化的极紫外辐射束投影到所述基板的目标部分上，所述投影系统包括反射光学系统; 其中所述装置的至少一部分在所述装置的使用期间暴露于所述紫外线辐射束时被涂覆，所述涂层包含金属氧化物或光催化剂，或半导体或其任何组合。
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