ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME AND DISPLAY DEVICE

    公开(公告)号:US20210225893A1

    公开(公告)日:2021-07-22

    申请号:US16765216

    申请日:2019-12-06

    Abstract: A method of manufacturing an array substrate includes: forming a first semiconductor pattern and a first insulating layer group sequentially on a base substrate; forming a second semiconductor pattern and a second insulating layer group sequentially on the first insulating layer group; forming two first via holes in the first insulating layer group and the second insulating layer group to expose the first semiconductor pattern, annealing the exposed first semiconductor pattern and then removing an oxide layer on a surface of the first semiconductor pattern; forming connecting wires in the first via holes; forming second via holes in the second insulating layer group to expose the second semiconductor pattern, and forming a first source electrode and a first drain electrode in the second via holes such that the first source electrode or the first drain electrode covers and is connected to one of the connecting wires.

    THIN FILM TRANSISTOR AND METHOD FOR FABRICATING THE SAME, ARRAY SUBSTRATE AND DISPLAY DEVICE

    公开(公告)号:US20210210516A1

    公开(公告)日:2021-07-08

    申请号:US16074282

    申请日:2018-01-19

    Abstract: A thin film transistor and a method for fabricating the same, an array substrate and a display device are provided. The thin film transistor includes an active layer and a protective layer being provided on and in direct contact with the active layer, the protective layer is provided corresponding to a channel region of the thin film transistor; the protective layer is made of an oxygen-enriched metallic oxide insulation material which will not introduce any new element into the active layer. In the thin film transistor and the method for fabricating the same, the array substrate and the display device provided by the present disclosure, the active layer can be protected from being damaged by the etchant for forming the source/drain, and no new element will be introduced into the active layer; thus the characteristics and the stability of the thin film transistor is improved.

    DISPLAY PANEL AND METHOD FOR FABRICATING THE SAME

    公开(公告)号:US20200066758A1

    公开(公告)日:2020-02-27

    申请号:US16531231

    申请日:2019-08-05

    Abstract: A display panel and a method for fabricating the same are provided. The display panel includes: a base substrate; a first thin film transistor on one side of the base substrate, the first thin film transistor comprising: a first active layer, a first protection layer, a second protection layer, a first source and a first drain; wherein the first protection layer and the second protection layer are on one side of the first active layer away from the base substrate, and are separated from each other; the first protection layer and the second protection layer are configured to protect the first active layer from being etched during forming of a via-hole corresponding to the first source and/or a via-hole corresponding to the first drain,

    METHOD OF FABRICATING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE

    公开(公告)号:US20250169183A1

    公开(公告)日:2025-05-22

    申请号:US19028449

    申请日:2025-01-17

    Inventor: Wei YANG Xinhong LU

    Abstract: An OLED display device including a display area is provided. A first and second thin film transistors (TFTs) are arranged in the display area, the first TFT includes a first active layer, the second TFT includes a second active layer, a material of the first active layer is different from that of the second active layer. The OLED display device includes a substrate, the second active layer, a second gate of the second TFT, the first active layer, a first gate of the first TFT, a first source and drain of the first TFT, a second source and drain of the second TFT, a first data line in a same layer as the second source and drain, a first planarization layer on the first data line, and a second data line on the first planarization layer and electrically insulated from the first data line.

    DISPLAY SUBSTRATE, PREPARATION METHOD THEREFOR, AND DISPLAY DEVICE

    公开(公告)号:US20240097071A1

    公开(公告)日:2024-03-21

    申请号:US18262802

    申请日:2021-01-25

    CPC classification number: H01L33/24 H01L25/0753 H01L33/62

    Abstract: Disclosed in the present application are a display substrate, a preparation method therefor, and a display device. The display substrate includes a rigid substrate, and a flexible film layer and a display function layer that are sequentially stacked on the rigid substrate. The rigid substrate is provided with an opening at a bending region to expose the flexible film layer in the bending region. The display substrate further includes a first light absorption portion in a display region and is on the side of the display region close to the bending region. The first light absorption portion is on the side of the rigid substrate facing away from the flexible film layer or is between the rigid substrate and the flexible film layer.

    ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230163145A1

    公开(公告)日:2023-05-25

    申请号:US16965495

    申请日:2019-07-22

    CPC classification number: H01L27/1288 H01L27/1248

    Abstract: Provided are an array substrate and a manufacturing method thereof, the manufacturing method includes: forming a first active layer on a base substrate; forming a second active layer; forming a second gate on the second active layer; forming a first insulating layer covering the first active layer on the second gate; patterning the first insulating layer to form first via holes at both sides of the second gate to expose the second active layer; depositing a first metal layer in the first via holes and on the first insulating layer; patterning the first metal layer, removing a part of the first metal layer above the first active layer to expose the first insulating layer; etching the first insulating layer using the patterned first metal layer as a mask, forming second via holes above the first active layer to expose the first active layer; cleaning the exposed first active layer.

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