公开(公告)号：US20150378058A1

公开(公告)日：2015-12-31

申请号：US14850310

申请日：2015-09-10

Applicant: FUJIFILM Corporation

Inventor： Shinichiro SONODA ,  Tatsuya YOSHIHIRO

IPC: G02B1/11 ,  G02B1/12

CPC classification number: G02B1/11 ,  C03C17/34 ,  C03C2217/73 ,  G02B1/113 ,  G02B1/118 ,  G02B1/12 ,  G02B5/0294

Abstract: A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order.

Abstract translation: 第一光遮蔽层形成步骤，仅在其中将形成遮光涂层的透明基板的一部分区域中形成遮光涂层;沉积光学薄膜的步骤包括： 最外层，要进行水热处理的层，在要形成抗反射涂层的区域中通过水热处理成为细微不均匀图案涂层;第二遮光涂层形成步骤，形成遮光罩 在其中将形成遮光涂层的所有区域中的涂层，但是在第一遮光涂层形成步骤中没有形成遮光涂层，以及在该区域中形成微细凹凸图案涂层的步骤 通过水热处理要水热处理的层来形成抗反射涂层的顺序是按此顺序进行的。