公开(公告)号：US20200300321A1

公开(公告)日：2020-09-24

申请号：US16362061

申请日：2019-03-22

Applicant: GOODRICH CORPORATION

Inventor： Peter A.T. Cocks ,  Thomas P. Filburn ,  Ying She ,  Haralambos Cordatos ,  Zissis A. Dardas ,  William P. May

IPC: F16D65/853 ,  B64C25/42

Abstract: A system, and associated method, for reducing oxidation of a friction disk may include a braking assembly comprising the friction disk and a coolant loop coupled to the braking assembly, with the coolant loop being configured to circulate liquid coolant from the braking assembly. That is, the coolant loop may be configured to reduce the temperature of the braking assembly, thus reducing the rate/extent of oxidation of the friction disks and potentially enabling the concentration of oxygen around the braking assembly to be reduced.

公开(公告)号：US20200239130A1

公开(公告)日：2020-07-30

申请号：US16259327

申请日：2019-01-28

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Haralambos Cordatos ,  Zissis A. Dardas

IPC: B64C25/42

Abstract: A system, and associated method, for reducing oxidation of a friction disk may include a braking assembly comprising the friction disk and a conduit coupled to the braking assembly, with the conduit being in selectable fluid providing communication with the braking assembly. That is, the conduit may be configured to deliver inert fluid to the braking assembly, thus reducing the concentration of oxygen in the vicinity of the friction disks and thus reducing/mitigating oxidation of the friction disks.

公开(公告)号：US20200040447A1

公开(公告)日：2020-02-06

申请号：US16598843

申请日：2019-10-10

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC: C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628 ,  C23C16/455

Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

公开(公告)号：US20190085446A1

公开(公告)日：2019-03-21

申请号：US15709338

申请日：2017-09-19

Applicant: GOODRICH CORPORATION

Inventor： Ying She ,  Naveen G. Menon ,  Zissis A. Dardas ,  Thomas P. Filburn ,  Xiaodan Cai

IPC: C23C16/04 ,  C23C16/32 ,  C23C16/44 ,  C04B35/80 ,  C04B35/628

CPC classification number: C23C16/045 ,  C04B35/62863 ,  C04B35/62884 ,  C04B35/806 ,  C04B2235/3826 ,  C04B2235/444 ,  C04B2235/483 ,  C04B2235/5244 ,  C04B2235/5248 ,  C04B2235/614 ,  C23C16/325 ,  C23C16/4405 ,  C23C16/4412 ,  C23C16/45502 ,  C23C16/45565 ,  C23C16/45574

Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.