公开(公告)号：US07710640B2

公开(公告)日：2010-05-04

申请号：US12138851

申请日：2008-06-13

Applicant: Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

Inventor： Susanne Beder ,  Daniel Kraehmer ,  Heiko Feldmann

IPC: G02B13/14

CPC classification number: G02B13/14 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70966

Abstract: A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.

Abstract translation: 一种用于微光刻投影曝光装置的投影物镜。 投影物镜可以将可以在物平面中的位置设置的掩模的图像投影到能够被设置在图像平面中的位置的感光涂层上。 投影物镜可以被设计为以浸没模式操作，并且可以产生至少一个中间图像。 投影物镜可以包括图像平面侧的光学子系统，其中间图像以绝对值至少为0.3的像平面侧投影比率投射到像平面中。

公开(公告)号：US20090207487A1

公开(公告)日：2009-08-20

申请号：US12413981

申请日：2009-03-30

Applicant: Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

Inventor： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC: G02B17/08 ,  G06F17/00

CPC classification number: G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Abstract translation: 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

公开(公告)号：US20070285644A1

公开(公告)日：2007-12-13

申请号：US11575042

申请日：2005-09-13

Applicant: Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

Inventor： Markus Brotsack ,  Markus Deguenther ,  Wilhelm Ulrich ,  Joachim Wietzorrek ,  Johannes Wangler ,  Heiko Feldmann ,  Andreas Zeiler

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066

Abstract: An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.

Abstract translation: 用于微光刻投影曝光装置的照明系统包括掩蔽装置和将掩模装置投影到图像平面上的掩蔽对象。 照明系统还包括光学校正元件，其具有非球面形状的表面或支撑具有至少基本上非球面的作用的衍射结构。 该表面至少大致布置在掩蔽对象的图像平面之前的场平面中。非球面作用表面被设计成使得由照明系统在图像平面中产生的主射线分布与投影所需的主射线分布相匹配 目的。

公开(公告)号：US20070013882A1

公开(公告)日：2007-01-18

申请号：US11447996

申请日：2006-06-07

Applicant: Aurelian Dodoc ,  Wilhelm Ulrich ,  Heiko Feldmann

Inventor： Aurelian Dodoc ,  Wilhelm Ulrich ,  Heiko Feldmann

IPC: G03B21/00

CPC classification number: G02B27/0012 ,  G03B21/006 ,  G03F7/70225 ,  G03F7/70233 ,  G03F7/70241 ,  G03F7/705

Abstract: In a method of manufacturing projection objectives including defining an initial design for a projection objective and optimizing the design using a merit function, a set of related projection objectives including a first projection objective and at least one second projection objective is defined. Further, a plurality of merit function components, each of which reflects a particular quality parameter, is defined. One of these merit function components defines a common module requirement requiring that the first projection objective and the second projection objective each include at least one common optical module that is constructed to be substantially identical for the first and the second projection objective. The method results in a set of projection objectives having at least one common optical module. Employing the method in the manufacturing of complex projection objectives, such as projection objectives for microlithography, facilitates the manufacturing process and allows substantial cost savings.

Abstract translation: 在制造投影物镜的方法中，包括定义投影物镜的初始设计并使用优值函数优化设计，定义了包括第一投影物镜和至少一个第二投影物镜的一组相关投影物镜。 此外，定义了反映特定质量参数的多个优点函数分量。 这些优点功能部件中的一个定义了共同的模块要求，其要求第一投影物镜和第二投影物镜每个包括至少一个共同的光学模块，其被构造为对于第一和第二投影物镜基本相同。 该方法产生一组具有至少一个公共光学模块的投影物镜。 采用该方法制造复杂的投影物镜，例如用于微光刻的投影物镜，便于制造过程，并且可以节省大量成本。

公开(公告)号：US10114293B2

公开(公告)日：2018-10-30

申请号：US13587077

申请日：2012-08-16

Applicant: Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

Inventor： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

公开(公告)号：US09733395B2

公开(公告)日：2017-08-15

申请号：US13112357

申请日：2011-05-20

Applicant: Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

Inventor： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC: G03B27/68 ,  G02B1/11 ,  G03F7/20

CPC classification number: G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

公开(公告)号：US20130156939A1

公开(公告)日：2013-06-20

申请号：US13805960

申请日：2011-06-24

Applicant: Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

Inventor： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

IPC: G01N21/95 ,  G06F17/50 ,  G03B27/68 ,  G06T7/00 ,  C23C14/48 ,  G21K5/00

CPC classification number: G01N21/95 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/48 ,  G03B27/68 ,  G03F1/24 ,  G03F1/72 ,  G03F1/74 ,  G03F1/84 ,  G03F7/705 ,  G03F7/7065 ,  G06F17/5009 ,  G06T7/0002 ,  G21K5/00

Abstract: The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures.

Abstract translation: 本发明涉及一种用于分析用于极紫外（EUV）波长范围（EUV掩模）的光刻掩模的缺陷的方法，包括以下步骤：（a）使用EUV掩模检查产生与缺陷有关的至少一个焦点叠层 工具，（b）在缺陷的位置确定EUV掩模的表面结构，（c）提供具有确定的表面配置的模型结构，其具有不同的相位误差并产生相应的焦点堆叠，以及（d）确定三维 通过比较所述缺陷的至少一个生成的焦点堆栈和所产生的模型结构的焦点堆栈，来确定EUV掩模缺陷的三维误差结构。

公开(公告)号：US08451458B2

公开(公告)日：2013-05-28

申请号：US13423760

申请日：2012-03-19

Applicant: Hans-Juergen Rostalski ,  Heiko Feldmann

Inventor： Hans-Juergen Rostalski ,  Heiko Feldmann

IPC: G02B13/14

CPC classification number: G03F7/70666 ,  G02B13/143

Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

Abstract translation: 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供了一个放大| beta | | > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。

公开(公告)号：US20120176670A1

公开(公告)日：2012-07-12

申请号：US13423760

申请日：2012-03-19

Applicant: Hans-Juergen Rostalski ,  Heiko Feldmann

Inventor： Hans-Juergen Rostalski ,  Heiko Feldmann

IPC: G02B11/04

CPC classification number: G03F7/70666 ,  G02B13/143

Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

Abstract translation: 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供放大| | bgr;'| > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。

公开(公告)号：US20110026110A1

公开(公告)日：2011-02-03

申请号：US12899297

申请日：2010-10-06

Applicant: Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

Inventor： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

IPC: G02B3/00

CPC classification number: G02B17/0844 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308

Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

Abstract translation: 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。