公开(公告)号：US06787692B2

公开(公告)日：2004-09-07

申请号：US09984905

申请日：2001-10-31

Applicant: Kenji Wada ,  Yoshiyuki Nasuno ,  Michio Kondo ,  Akihisa Matsuda

Inventor： Kenji Wada ,  Yoshiyuki Nasuno ,  Michio Kondo ,  Akihisa Matsuda

IPC: H01L31052

CPC classification number: H01L31/076 ,  H01L31/02366 ,  H01L31/056 ,  H01L31/077 ,  H01L31/182 ,  H01L31/1884 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  Y10T428/26

Abstract: A solar cell substrate has irregularities on a surface which is in contact with a photo-electric conversion layer, and light is incident on the side of the irregularities. The height of the irregularities is set so that the root mean square height is in a range of 15 nm to 600 nm, and tan &thgr; is in a range of 0.10 to 0.30, where &thgr; is the angle of incline of the surface of the irregularities with respect to an average line of the irregularities. Light incident on the irregularities is scattered at the interface. This increases the optical path length and thus the quantity of light absorbed in the photo-electric conversion layer, resulting in improved efficiency. Additionally, the photo-electric conversion layer can be made thinner reducing deposit time and manufacturing cost. Further, collision of crystals is not incurred, thus preventing deterioration of photo-electric conversion efficiency which is caused by defects.

Abstract translation: 太阳能电池基板在与光电转换层接触的表面上具有不规则性，并且光入射到不规则部分的一侧。 凹凸的高度被设定为使得均方根高度在15nm至600nm的范围内，并且tanθ在0.10至0.30的范围内，其中θ是不规则部分的表面的倾斜角 相对于平均线的违规行为。 光线不规则的事件分散在界面处。 这增加了光路长度，从而增加了光电转换层中吸收的光量，从而提高了效率。 另外，可以使光电转换层更薄，减少沉积时间和制造成本。 此外，不会发生晶体碰撞，从而防止由缺陷引起的光电转换效率的劣化。

公开(公告)号：US06287723B1

公开(公告)日：2001-09-11

申请号：US09124896

申请日：1998-07-30

Applicant: Koichiro Maeda ,  Toshihiro Inoue ,  Kenji Wada ,  Hidekazu Haneda ,  Haruhisa Yamamoto

Inventor： Koichiro Maeda ,  Toshihiro Inoue ,  Kenji Wada ,  Hidekazu Haneda ,  Haruhisa Yamamoto

IPC: H01M604

CPC classification number: H01M4/621 ,  H01M10/24

Abstract: An alkaline secondary battery comprising an electrolyte such as aqueous solution of potassium hydroxide, at least one cathode electrode, at least one anode electrode having an anode active material layer, and a separator such as non-woven fabric between the anode electrode and the cathode electrode, in which the anode active material layer containing an anode active material such as a hydridable alloy or a cadmium alloy, and an anode binder which includes a nonionic polymer produced by emulsion polymerization of a nonionic monomer in the presence of a nonionic surfactant, and in which the electrolyte essentially surrounds the cathode electrode and the anode electrode.

Abstract translation: 一种碱性二次电池，包括电解质如氢氧化钾水溶液，至少一个阴极电极，至少一个具有负极活性物质层的阳极电极和在阳极电极和阴极电极之间的诸如无纺布之类的隔膜 ，其中含有负极活性物质如可合金或镉合金的负极活性物质层和包含非离子聚合物的非极性聚合物的阳极粘合剂，其通过在非离子表面活性剂的存在下通过非离子单体的乳液聚合制备， 电解质基本上围绕阴极电极和阳极电极。

公开(公告)号：US4039355A

公开(公告)日：1977-08-02

申请号：US550223

申请日：1975-02-18

Applicant: Toshiro Takahashi ,  Toshihiro Nagano ,  Kenji Wada ,  Masaru Kikuchi

Inventor： Toshiro Takahashi ,  Toshihiro Nagano ,  Kenji Wada ,  Masaru Kikuchi

IPC: C22F1/05 ,  C22C21/02 ,  C22C21/06 ,  C22C21/08 ,  C22F1/00

CPC classification number: C22C21/08 ,  Y10T428/31935

Abstract: An aluminum alloy consising essentially of 0.65 to 0.75% by weight of magnesium and 0.50 to 0.60% by weight of silicon or 0.47 to 0.57% by weight of magnesium and 0.75 to 0.85% by weight of silicon, 0.15% to 0.25% by weight of iron, less than 0.05% of an impurity selected from the group consisting of copper, manganese, zinc, chromium, and titanium and the balance aluminum, the aluminum alloy being subjected to aging treatment at a temperature below 200.degree. C for 20 to 50 minutes to obtain 0.2% proof stress larger than 11 kg/mm.sup.2, ultimate tensile strength larger than 20 kg/mm.sup.2 and elongation more than 8%. Aluminum alloy shapes are formed of the above aluminum alloy by extrusion forming of the aluminum alloy to obtain an extrusion, coating a film on the surface of the extrusion with a water-soluble paint after forming thereon a ground film, heating the extrusion at a temperature below 200.degree. C for 20 to 50 minutes to effect printing and hardening of the coated film and age hardening of the extrusion at the same time.

Abstract translation: 一种铝合金基本上占0.65至0.75重量％的镁和0.50-0.60重量％的硅或0.47至0.57重量％的镁和0.75至0.85重量％的硅，0.15重量％至0.25重量％的硅， 铁，小于0.05％的选自铜，锰，锌，铬和钛的杂质，余量为铝，铝合金在200℃以下进行20-50分钟的时效处理 获得大于11kg / mm2的0.2％屈服应力，极限抗拉强度大于20kg / mm2，伸长率大于8％。 铝合金的形状由上述铝合金形成，通过铝合金的挤出成型得到挤出，在其上成型后用水溶性涂料在挤压成形表面上涂覆膜，在该温度下加热挤出 在200℃以下20〜50分钟，同时进行涂膜的印刷硬化和挤出的时效硬化。

公开(公告)号：US08877969B2

公开(公告)日：2014-11-04

申请号：US12759549

申请日：2010-04-13

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: C07C311/48 ,  C07C311/51 ,  C07C233/91 ,  C07C233/92 ,  C07D323/00 ,  C07D295/033 ,  C07D233/64 ,  C07D401/04 ,  C07D211/58 ,  C07D213/82 ,  C07D211/46 ,  C07D333/46 ,  G03F7/038 ,  C07D211/22 ,  G03F7/039 ,  C07D295/26 ,  G03F7/004

CPC classification number: C07C311/48 ,  C07D211/22 ,  C07D211/46 ,  C07D211/58 ,  C07D213/82 ,  C07D233/64 ,  C07D295/033 ,  C07D295/18 ,  C07D295/26 ,  C07D323/00 ,  C07D333/46 ,  C07D401/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

Abstract: A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.

Abstract translation: 一种光敏组合物，其包含：（A）能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物，使用该感光性组合物的图案形成方法和能够在照射时产生具有特定结构的化合物的化合物 与光化射线或辐射。

公开(公告)号：US08603733B2

公开(公告)日：2013-12-10

申请号：US13196530

申请日：2011-08-02

Applicant: Shinji Tarutani ,  Hideaki Tsubaki ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

Inventor： Shinji Tarutani ,  Hideaki Tsubaki ,  Kazuyoshi Mizutani ,  Kenji Wada ,  Wataru Hoshino

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/32 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.

Abstract translation: 一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射的照射而降低，并且其含有具有脂环族烃结构和分散性为1.7以下并且能够增加的树脂 通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。

公开(公告)号：US08158326B2

公开(公告)日：2012-04-17

申请号：US12191153

申请日：2008-08-13

Applicant: Kunihiko Kodama ,  Kenji Wada ,  Kaoru Iwato

Inventor： Kunihiko Kodama ,  Kenji Wada ,  Kaoru Iwato

IPC: G03F7/039 ,  G03F7/038

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C311/09 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.

Abstract translation: 在用光化射线或辐射照射时产生具有一个或多个-SO 3 H基团和一个或多个-SO 2 - 键的磺酸的化合物; 含有该化合物的光敏组合物; 以及用感光性组合物形成图案的方法。

公开(公告)号：US07923199B2

公开(公告)日：2011-04-12

申请号：US11337899

申请日：2006-01-24

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03C5/00

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382

Abstract: The invention provides a photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a pattern forming method using the photosensitive composition, and a specific organic acid, which are: a photosensitive composition comprising a compound having a proton acceptor functional group and producing a sulfonic acid group upon irradiation with actinic rays or radiation to reduce or lose the acceptor property or change the proton acceptor functional group to be acidic, or a compound capable of generating a specific organic acid upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; and a specific organic acid.

Abstract translation: 本发明提供了一种用于半导体（例如IC）的制造中的液晶，热敏头等电路基板的制造中的光敏性组合物，或者其他的光加工工序，使用该感光性组合物的图案形成方法， 和特定的有机酸，其是：包含具有质子受体官能团的化合物并在用光化射线或辐射照射时产生磺酸基以降低或失去受主性质或将质子受体官能团改变为 酸性或能够在用光化射线或辐射照射时能够产生特定有机酸的化合物; 使用该感光性组合物的图案形成方法; 和特定的有机酸。

公开(公告)号：US07709547B2

公开(公告)日：2010-05-04

申请号：US11602187

申请日：2006-11-21

Applicant: Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

Inventor： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

IPC: C08F2/50 ,  C08F2/46 ,  C08J3/28

CPC classification number: B41C1/1066 ,  C09D11/101 ,  C09D11/322

Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.

Abstract translation: 本发明提供油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版。 本发明的油墨组合物含有阳离子聚合性化合物，用辐射线照射时产生酸的化合物，以及在用放射线照射时产生具有碱性氮原子的有机酸化合物的鎓盐化合物。

公开(公告)号：US20100040975A1

公开(公告)日：2010-02-18

申请号：US12523232

申请日：2008-01-28

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0758 ,  G03F7/2041

Abstract: A positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under action of an acid; and (C) a compound capable of decomposing under action of an acid to generate an acid.

Abstract translation: 正型抗蚀剂组合物包括：（A）在用光化射线或辐射照射时能够产生酸的化合物; （B）在酸的作用下在碱性显影剂中的溶解度增加的树脂; 和（C）能够在酸作用下分解以产生酸的化合物。

公开(公告)号：US20090250182A1

公开(公告)日：2009-10-08

申请号：US12084087

申请日：2006-10-23

Applicant: Masaki Teramoto ,  Shinji Kobayashi ,  Kenji Wada

Inventor： Masaki Teramoto ,  Shinji Kobayashi ,  Kenji Wada

IPC: D21H23/04

CPC classification number: D21H17/53 ,  D21H21/06 ,  D21H23/04

Abstract: A papermaking method according to this invention is carried out using a paper machine provided with a head box (3) including a cell-structure manifold (30). An aqueous solution (M) containing 0.03 to 0.4 wt % of viscous agent is added to a material pulp slurry (S), and the obtained mixed pulp slurry (MS) is introduced into the manifold (30).

Abstract translation: 根据本发明的造纸方法使用具有包括电池结构歧管（30）的头箱（3）的造纸机进行。 将含有0.03〜0.4重量％的粘性剂的水溶液（M）加入到浆料浆料（S）中，将得到的混合纸浆（MS）引入歧管30。