公开(公告)号：US20100090372A1

公开(公告)日：2010-04-15

申请号：US12449024

申请日：2007-11-19

Applicant: Kiyoshi Ishikawa ,  Atsushi Sawano ,  Kazumasa Wakiya

Inventor： Kiyoshi Ishikawa ,  Atsushi Sawano ,  Kazumasa Wakiya

IPC: B29C61/02 ,  C09D133/00 ,  C09D139/06

CPC classification number: G03F7/40 ,  H01L21/0273

Abstract: Provided are a coating formation agent for pattern micro-fabrication, and a method for forming a micropattern using the same, which enables: suppression and/or control of variation of the micro-fabrication size without being accompanied by defect generation following the micro-fabrication process even in ultramicro-fabrication particularly on the order of no greater than 120 nm, or a micro-fabrication process of a resist pattern with an increased aspect ratio; maintainance of a favorable resist pattern configuration after the micro-fabrication process while keeping the desired micro-fabrication size; and also avoidance of defects resulting from development of bacteria and the like after application of the coating formation agent for pattern micro-fabrication. The coating formation agent for pattern micro-fabrication of the present invention is a coating formation agent used for forming a micropattern by coating on a substrate having a photoresist pattern, the coating formation agent including: as component (a), a water soluble polymer; and, as component (b), at least one selected from quaternary ammonium hydroxide, alicyclic ammonium hydroxide and morpholinium hydroxide.

Abstract translation: 提供了用于图案微制造的涂层形成剂以及使用其形成微图案的方法，其能够：抑制和/或控制微制造尺寸的变化，而不伴随着微制造后的缺陷产生 即使在超微制造中，特别是不大于120nm的量级，或具有增加的纵横比的抗蚀剂图案的微制造工艺， 在保持所需的微观制造尺寸的同时，在微细制造工艺之后维持良好的抗蚀剂图案构造; 并且还避免了在施加用于图案微加工的涂层形成剂之后由于细菌等的发展而导致的缺陷。 本发明的图案微观制造用涂料形成剂是通过在具有光致抗蚀剂图案的基材上涂布形成微图案而形成的涂料形成剂，该涂料形成剂包括：作为组分（a），水溶性聚合物; 和作为组分（b）的至少一种选自季铵氢氧化物，脂环族氢氧化铵和氢氧化氢鎓。

公开(公告)号：US20090080479A1

公开(公告)日：2009-03-26

申请号：US12116431

申请日：2008-05-07

Applicant: Yuan-Yu Jau ,  Kiyoshi Ishikawa ,  William Happer

Inventor： Yuan-Yu Jau ,  Kiyoshi Ishikawa ,  William Happer

IPC: H03B17/00

CPC classification number: G04F5/14

Abstract: A polarization gain medium such as an emitting laser diode provides the optical pumping. An atomic vapor cell is positioned in the laser cavity providing spontaneous push-pull optical pumping inside the laser cavity. This causes the laser beam to be modulated at hyperfine-resonance frequency. A clock signal is obtained from electrical modulation across the laser diode.

Abstract translation: 诸如发射激光二极管的偏振增益介质提供光泵浦。 原子蒸汽池位于激光腔中，提供激光腔内的自发推挽光泵浦。 这导致激光束以超精细共振频率被调制。 通过激光二极管的电调制获得时钟信号。

公开(公告)号：US20050086119A1

公开(公告)日：2005-04-21

申请号：US10501526

申请日：2003-01-14

Applicant: Tsuyoshi Komuro ,  Fumio Tanaka ,  Masaru Eshima ,  Kiyoshi Ishikawa ,  Yoshihiro Hirata ,  Hidekazu Imatani

Inventor： Tsuyoshi Komuro ,  Fumio Tanaka ,  Masaru Eshima ,  Kiyoshi Ishikawa ,  Yoshihiro Hirata ,  Hidekazu Imatani

IPC: G06Q30/00 ,  H04N7/173 ,  G06F17/60

CPC classification number: H04N21/2407 ,  G06Q30/02 ,  G06Q30/0601 ,  H04N7/173 ,  H04N21/2547 ,  H04N21/812 ,  H04N21/854

Abstract: A method for creating a content with higher advertising function, and an appropriate device for distributing such content are disclosed. A user's PC (100) logs on to a PVad service server (200) and makes a request for distribution of a PVad (a promotion video including an advertisement element). The PVad service server (200) distributes the PVad requested. A PVad is stored by correlating with a PV-ID that is to identify an artist etc. incorporated in a promotion video, and an ad-ID that is to identify an advertised subject incorporated in the promotion video. The PVad service server (200) stores distribution logs for the PVad on a PVad view log counter database (400). An advertiser's PC (600) makes a request for a view data. The PVad service server (200) retrieves a view log from the PVad view log counter database (400) based on an ad-ID, and sends the view log retrieved as a “view data for advertiser”.

Abstract translation: 公开了一种用于创建具有较高广告功能的内容的方法，以及用于分发这样的内容的适当的设备。 用户的PC（100）登录到PVad服务器（200）并且发出PVad分发请求（包括广告元素的促销视频）。 PVad服务器（200）分发所请求的PVad。 通过与包含在促销视频中的艺术家等的PV-ID相关联的PVad和用于识别在促销视频中并入的广告主题的ad-ID来存储PVad。 PVad服务服务器（200）在PVad视图日志计数器数据库（400）上存储PVad的分发日志。 广告客户的PC（600）提出查看数据的请求。 PVad服务服务器（200）基于ad-ID从PVad视图日志计数器数据库（400）检索视图日志，并发送作为“广告商的查看数据”检索的查看日志。

公开(公告)号：US6153354A

公开(公告)日：2000-11-28

申请号：US391195

申请日：1999-09-07

Applicant: Yasuhiko Katsumata ,  Kiyoshi Ishikawa ,  Katsumi Oomori

Inventor： Yasuhiko Katsumata ,  Kiyoshi Ishikawa ,  Katsumi Oomori

IPC: H01L21/027 ,  G03F7/004 ,  G03F7/031 ,  G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  Y10S430/127

Abstract: An electron beam negative working resist composition is diclosed including: (A) an alkali-soluble resin, (B) an acid-crosslinkable substance, (C) an acid generating agent, and (D) a sensitizing substance, the sensitizing substance (D) being a substance which serves to accumulate electrons or energy through electron beam exposure and to reemit the accumulated electrons or energy into a resist film. Thus, the electron beam negative working resist composition can achieve a desired high sensitivity.

Abstract translation: 电子束负性抗蚀剂组合物被包围，包括：（A）碱溶性树脂，（B）酸交联物质，（C）酸产生剂和（D）敏化物质，敏化物质（D ）是用于通过电子束曝光积聚电子或能量并将累积的电子或能量再次存入抗蚀剂膜的物质。 因此，电子束负性抗蚀剂组合物可以实现期望的高灵敏度。

公开(公告)号：US6087068A

公开(公告)日：2000-07-11

申请号：US271899

申请日：1999-03-18

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko

IPC: G03F7/11 ,  C09K3/00 ,  G03F7/09 ,  H01L21/027

CPC classification number: G03F7/091

Abstract: Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photo-resist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.

Abstract translation: 提出了一种新颖的底涂层组合物，用于形成底涂层和介于光致抗蚀剂层之间的底涂层，其目的是减少光抗蚀剂图案曝光中光在基板表面上的反射的不利影响 在干蚀刻处理中，在图案化的抗蚀剂层和底涂层之间的蚀刻速率方面，层间相对紫外光没有不希望的层之间的混合现象和开槽以及大的选择比。 底涂层组合物包含（A）紫外线吸收剂，其为在芳基上具有至少一个未取代或烷基取代的氨基的二苯甲酮化合物或芳族偶氮甲碱化合物，（B）优选三聚氰胺化合物的交联剂，其具有 至少两个羟甲基或分子中的氮原子以重量比（A）：（B））键合在1：1至1:10范围内的烷氧基甲基。

公开(公告)号：US5845105A

公开(公告)日：1998-12-01

申请号：US551307

申请日：1995-11-01

Applicant: Tatsuya Kunikiyo ,  Katsumi Eikyu ,  Kenichiro Sonoda ,  Masato Fujinaga ,  Kiyoshi Ishikawa ,  Norihiko Kotani

Inventor： Tatsuya Kunikiyo ,  Katsumi Eikyu ,  Kenichiro Sonoda ,  Masato Fujinaga ,  Kiyoshi Ishikawa ,  Norihiko Kotani

IPC: H01L21/02 ,  G06F17/50 ,  H01L21/00 ,  H01L27/02 ,  G06F9/455

CPC classification number: G06F17/5045 ,  H01L27/0207

Abstract: A method of manufacturing a semiconductor device wherein the device is manufactured according to extracted process parameters. The process parameters are extracted as a set of optimum process parameters which satisfy an intended specification using process functions. The process functions describe a characteristic of the semiconductor device, and are determined using experimental values and/or simulated values. The process parameters may then be transmitted online to a factory.

Abstract translation: 一种制造半导体器件的方法，其中根据提取的工艺参数制造器件。 过程参数被提取为使用过程功能满足期望规格的一组最佳过程参数。 过程功能描述了半导体器件的特性，并且使用实验值和/或模拟值来确定。 然后可以将工艺参数在线传输到工厂。

公开(公告)号：US5756255A

公开(公告)日：1998-05-26

申请号：US747567

申请日：1996-11-12

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Toshimasa Nakayama

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Toshimasa Nakayama

IPC: G03F7/004 ,  G03F7/09 ,  G03F7/11 ,  G03F7/26 ,  H01L21/027 ,  G03C1/825

CPC classification number: G03F7/091 ,  Y10S430/117 ,  Y10S430/124

Abstract: Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.

Abstract translation: 提出了通过介于基板表面和光致抗蚀剂层之间用于光致抗蚀剂层的光刻图案中的新颖的底涂层组合物，以减少来自基板表面的反射光的不利影响。 本发明的底漆组合物包含（a）被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物和（b）多羟基二苯甲酮化合物，二苯基砜化合物或二苯基亚砜化合物，任选地与（c） （甲基）丙烯酸酯的不溶性树脂。

公开(公告)号：US5700625A

公开(公告)日：1997-12-23

申请号：US630621

申请日：1996-04-10

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Fumitake Kaneko

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Fumitake Kaneko

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/038

Abstract: Disclosed is a novel chemical-sensitization type negative-working photoresist composition capable of exhibiting high sensitivity to actinic rays and giving a patterned resist layer with high resolution and excellently orthogonal cross sectional profile of the patterned resist layer without occurrence of microbridges. The composition comprises (a) a poly(hydroxystyrene)-based resin; (b) a compound capable of releasing an acid by the irradiation with actinic rays such as tris(2,3-dibromopropyl) isocyanurate; and (c) a crosslinking agent such as a urea resin and melamine resin, each in a specified weight proportion, the poly(hydroxystyrene)-based resin as the component (a) having such a dispersion of the molecular weight distribution that the ratio of the weight-average molecular weight M.sub.w to the number-average molecular weight M.sub.n does not exceed 1.4 and being substantially free from low molecular weight fractions including unpolymerized monomer and oligomers having a molecular weight smaller than 1000.

Abstract translation: 公开了一种新型化学增感型负性光致抗蚀剂组合物，其能够对光化射线表现出高灵敏度，并且提供了图案化抗蚀剂层的高分辨率和非常正交的截面轮廓的图案化抗蚀剂层，而不会发生微桥。 组合物包含（a）聚（羟基苯乙烯）类树脂; （b）能够通过光化射线如三（2,3-二溴丙基）异氰脲酸酯的照射而释放酸的化合物; 和（c）以规定重量比例的交联剂如尿素树脂和三聚氰胺树脂，作为组分（a）的聚（羟基苯乙烯）基树脂具有这样的分子量分布： 重均分子量Mw与数均分子量Mn不超过1.4，基本上不含低分子量级分，包括分子量小于1000的未聚合单体和低聚物。

公开(公告)号：US08865395B2

公开(公告)日：2014-10-21

申请号：US13489862

申请日：2012-06-06

Applicant: Tsuyoshi Nakamura ,  Kiyoshi Ishikawa

Inventor： Tsuyoshi Nakamura ,  Kiyoshi Ishikawa

IPC: G03F7/40 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: H01L21/0273 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405

Abstract: A method of forming a resist pattern, comprising: a step of forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of acid and an acid-generator component (B) which generates acid upon exposure; a step of subjecting the resist film to exposure; a step of patterning the resist film by a negative-tone development using a developing solution containing the organic solvent to form a resist pattern; a step of applying a coating material to the resist pattern, thereby forming a coating film; a step of performing a thermal treatment at a temperature lower than the softening point of the resist pattern, thereby heat shrinking the coating film to narrow an interval between the resist pattern; and a step of removing the coating film.

Abstract translation: 一种形成抗蚀剂图案的方法，包括：使用含有在酸和酸产生剂成分的作用下在有机溶剂中显示降低的溶解度的碱成分（A）的抗蚀剂组合物在基材上形成抗蚀剂膜的步骤（ B）暴露时产生酸; 使抗蚀剂膜曝光的步骤; 使用含有有机溶剂的显影液形成抗蚀剂图案的负色发展图案化抗蚀剂膜的步骤; 将涂料施加到抗蚀剂图案上，从而形成涂膜的步骤; 在低于抗蚀剂图案的软化点的温度下进行热处理的步骤，从而使涂膜热收缩以缩小抗蚀剂图案之间的间隔; 以及除去涂膜的工序。

公开(公告)号：US08456161B2

公开(公告)日：2013-06-04

申请号：US12439846

申请日：2007-09-05

Applicant: William Happer ,  Kiyoshi Ishikawa ,  Brian Patton ,  Yuan-Yu Jau

Inventor： William Happer ,  Kiyoshi Ishikawa ,  Brian Patton ,  Yuan-Yu Jau

IPC: G01V3/00

CPC classification number: G01R33/282 ,  G01N24/081 ,  G01R33/4641 ,  G01R33/5601

Abstract: The present invention relates to a method and system for polarizing a solid compound of interest via spin transfer from an optically-pumped alkali vapor. In one embodiment, the method provides a cell which contains a solid compound as well as pure alkali metal and some amount of buffer gas. The cell is heated to vaporize some of the pure alkali. Resonant laser light is passed through the cell to polarize the atomic vapor, a process known as “optical pumping.” Optical pumping can transfer order from photons to atoms, causing a buildup of vapor atoms in one angular momentum state. This vapor polarization is then transferred through the surface of the solid compound in order to polarize the nuclei in the bulk of the compound. This can produce nuclear polarizations in the sample many times larger than the limit set by thermal equilibrium. The method can be used in nuclear magnetic resonance (NMR) or magnetic resonance imaging (MRI).

Abstract translation: 本发明涉及一种通过旋光转移从光泵浦的碱蒸气偏振感兴趣的固体化合物的方法和系统。 在一个实施方案中，该方法提供了含有固体化合物以及纯碱金属和一定量缓冲气体的电池。 将电解槽加热以蒸发一些纯碱。 谐振激光通过电池以使原子蒸气偏振，称为“光泵”。 光泵浦可以将光子从原子转移到原子，引起蒸气原子在一个角动量状态的积聚。 然后将该蒸气极化转移通过固体化合物的表面，以使化合物的主体中的核极化。 这可以在样品中产生比通过热平衡设定的极限多许多倍的核极化。 该方法可用于核磁共振（NMR）或磁共振成像（MRI）。