公开(公告)号：US20120144955A1

公开(公告)日：2012-06-14

申请号：US13210479

申请日：2011-08-16

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: C22B1/04 ,  B65B3/00

CPC classification number: C21B5/008 ,  C21B5/001 ,  C21B5/023 ,  C21B5/026 ,  C21C7/0056 ,  C22B7/001 ,  C22B7/02 ,  F27B1/20 ,  F27D3/0025 ,  F27D3/0027 ,  F27D3/0033 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S75/961 ,  Y10S75/962

Abstract: A metallurgical process involves providing an ingredient enclosure and placing a plurality of granules of a first material in the ingredient enclosure. The first material contains a first ingredient in a metallurgical process. A metallurgical process furnace having a chamber in which ingredients for the metallurgical process are added is provided and the ingredient enclosure and the first material are added to the chamber. The chamber is heated after the addition of the ingredient enclosure and the first material to the chamber, although it may also be heated prior to such addition. In one form, the granules comprise mill scale and the metallurgical process furnace is a blast furnace.

Abstract translation: 冶金过程涉及提供配料外壳并将多个第一材料颗粒放置在配料外壳中。 第一种材料包含冶金工艺中的第一种成分。 提供了一种具有其中添加有用于冶金工艺的成分的室的冶金工艺炉，并且将成分封壳和第一材料添加到室中。 在将配料外壳和第一种材料添加到腔室之后，将腔室加热，尽管也可以在加入之前加热该腔室。 在一种形式中，颗粒包括氧化皮，冶金工艺炉是高炉。

公开(公告)号：US07998242B2

公开(公告)日：2011-08-16

申请号：US12720493

申请日：2010-03-09

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: C21B3/02 ,  C21B5/00 ,  C22B7/02

CPC classification number: C21B5/008 ,  C21B5/001 ,  C21B5/023 ,  C21B5/026 ,  C21C7/0056 ,  C22B7/001 ,  C22B7/02 ,  F27B1/20 ,  F27D3/0025 ,  F27D3/0027 ,  F27D3/0033 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S75/961 ,  Y10S75/962

Abstract: A metallurgical process involves providing an ingredient enclosure and placing a plurality of granules of a first material in the ingredient enclosure. The first material contains a first ingredient in a metallurgical process. A metallurgical process furnace having a chamber in which ingredients for the metallurgical process are added is provided and the ingredient enclosure and the first material are added to the chamber. The chamber is heated after the addition of the ingredient enclosure and the first material to the chamber, although it may also be heated prior to such addition. In one form, the granules comprise mill scale and the metallurgical process furnace is a blast furnace.

公开(公告)号：US07931732B2

公开(公告)日：2011-04-26

申请号：US12657337

申请日：2010-01-19

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: C21C7/00

CPC classification number: C21B5/008 ,  C21B5/001 ,  C21B5/023 ,  C21B5/026 ,  C21C7/0056 ,  C22B7/001 ,  C22B7/02 ,  F27B1/20 ,  F27D3/0025 ,  F27D3/0027 ,  F27D3/0033 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S75/961 ,  Y10S75/962

Abstract: A metallurgical process involves providing an ingredient enclosure and placing a plurality of granules of a first material in the ingredient enclosure. The first material contains a first ingredient in a metallurgical process. A metallurgical process furnace having a chamber in which ingredients for the metallurgical process are added is provided and the ingredient enclosure and the first material are added to the chamber. The chamber is heated after the addition of the ingredient enclosure and the first material to the chamber, although it may also be heated prior to such addition. In one form, the granules comprise mill scale and the metallurgical process furnace is a blast furnace.

Abstract translation: 冶金过程涉及提供配料外壳并将多个第一材料颗粒放置在配料外壳中。 第一种材料包含冶金工艺中的第一种成分。 提供了一种具有其中添加有用于冶金工艺的成分的室的冶金工艺炉，并且将成分封壳和第一材料添加到室中。 在将配料外壳和第一种材料添加到腔室之后，将腔室加热，尽管也可以在加入之前加热该腔室。 在一种形式中，颗粒包括氧化皮，冶金工艺炉是高炉。

公开(公告)号：US20100122607A1

公开(公告)日：2010-05-20

申请号：US12657337

申请日：2010-01-19

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: C22B9/00

CPC classification number: C21B5/008 ,  C21B5/001 ,  C21B5/023 ,  C21B5/026 ,  C21C7/0056 ,  C22B7/001 ,  C22B7/02 ,  F27B1/20 ,  F27D3/0025 ,  F27D3/0027 ,  F27D3/0033 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S75/961 ,  Y10S75/962

Abstract: A metallurgical process involves providing an ingredient enclosure and placing a plurality of granules of a first material in the ingredient enclosure. The first material contains a first ingredient in a metallurgical process. A metallurgical process furnace having a chamber in which ingredients for the metallurgical process are added is provided and the ingredient enclosure and the first material are added to the chamber. The chamber is heated after the addition of the ingredient enclosure and the first material to the chamber, although it may also be heated prior to such addition. In one form, the granules comprise mill scale and the metallurgical process furnace is a blast furnace.

公开(公告)号：US07377438B2

公开(公告)日：2008-05-27

申请号：US11784615

申请日：2007-04-10

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: G02B26/10

CPC classification number: G06K7/10861 ,  G06K7/14 ,  G06K7/1491 ,  G06K19/06009

Abstract: A signal processing means (40) outputs a signal (41) representing a number when a combination of at least two imagers (11), (12) detects a spatial arrangement of a plurality of code portions of a coded data source (60)—where the spatial arrangement of the plurality of code portions represents the number, and where imager combinations can comprise spatial, temporal, and light property combinations.

Abstract translation: 信号处理装置（40）当至少两个成像器（11），（12）的组合检测到编码数据源（60）的多个代码部分的空间布置时，输出表示数字的信号（41） 其中多个代码部分的空间排列表示数字，并且其中成像器组合可以包括空间，时间和轻质量组合。

公开(公告)号：US20070001665A1

公开(公告)日：2007-01-04

申请号：US10555949

申请日：2004-05-06

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: G01B7/14 ,  G01B7/30 ,  H01F5/00

CPC classification number: A61N5/1049 ,  A61N5/107 ,  A61N2005/1051

Abstract: A position control product uses a signal from an electomagnetic field sensor 11 to cause a positioning sub-system 31 to keep at least a first target coordinate 121 in a preplanned relationship with at least a first reference coordinate 111, the product being especially useful in radiation oncology where it is important to keep a target volume 71 in a body 81 in a preplanned relationship with a radiation beam, the product being useful also in other cases where the position of a reference coordinate relative to a target coordinate can not be determined by other means.

Abstract translation: 位置控制产品使用来自电磁场传感器11的信号使定位子系统31至少将第一目标坐标121保持在与至少第一参考坐标111的预先计划关系中，该乘积在辐射中特别有用 在与辐射束预先关系的情况下将目标体积71保持在体部81中的重要的肿瘤学，该产品在其中相对于目标坐标的参考坐标的位置不能由其他 手段。

公开(公告)号：US07137711B1

公开(公告)日：2006-11-21

申请号：US10203735

申请日：2000-03-21

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: G02B5/12

CPC classification number: G06F3/0304 ,  G02B5/12 ,  G02B5/124 ,  G06F2203/0331

Abstract: The apparatus uses retro-reflected light, having a fixed component (41) and a variable component (37) varied by a person, from a retro reflector (31) connected to a person to input data (37A) to an information system (13) and does this for each of several persons in the same time interval.

Abstract translation: 该装置使用具有由人改变的固定部件（41）和可变部件（37）的后向反射光，从与人连接的回射反射器（31）向信息系统输入数据（37A） 13），并在同一时间间隔内为几个人中的每一个做这个。

公开(公告)号：US07034803B1

公开(公告)日：2006-04-25

申请号：US10344457

申请日：2000-09-19

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: G09G5/08

CPC classification number: G06F21/84

Abstract: The privacy product—used with an information system which has a data processor (71) signal connected (72) to a display device (81) and has an input device (51, 51A) signal connected (52, 52A) to the data processor with the input device being manipulated (21) by a person to control cursor motions—comprises a computer readable signal bearing medium (11) signal connected (14) to the data processor with the medium having a chaff component (12) which causes the data processor to cause the display device to display (82) a chaff path (31A) which is indistinguishable from the cursor path (31) by a sequent person.

Abstract translation: 该隐私产品与信息系统一起使用，该信息系统具有信号连接（72）到显示装置（81）的数据处理器（71），并具有将信号连接（52,52A）的输入装置（52,52A）连接到显示装置 数据处理器，其中由人操纵输入设备（21）以控制光标运动 - 包括连接到数据处理器的计算机可读信号承载介质（11）信号，所述介质具有谷壳部件（12），其导致 所述数据处理器使所述显示装置显示（82）由后续人不能与所述光标路径（31）区分开的纹路路径（31A）。

公开(公告)号：US5300943A

公开(公告)日：1994-04-05

申请号：US751605

申请日：1991-08-21

Applicant: Thomas Jakobs ,  Wayne D. Jung ,  Richard A. Karlin ,  Leonard Reiffel ,  Raphael K. Tam ,  Timothy T. Tutt ,  Michael F. Dunk

Inventor： Thomas Jakobs ,  Wayne D. Jung ,  Richard A. Karlin ,  Leonard Reiffel ,  Raphael K. Tam ,  Timothy T. Tutt ,  Michael F. Dunk

IPC: G06F1/16 ,  G06F1/18 ,  G06F1/32 ,  G06F3/033 ,  G06F3/041 ,  G06F3/14 ,  G06F3/153 ,  G06F13/00 ,  G06F15/00 ,  G06T11/80 ,  G09F9/00 ,  G09G5/00 ,  H04M1/2745

CPC classification number: G06F3/0488 ,  G06F1/189 ,  G06F3/033 ,  G06F3/0481 ,  G06F3/04845 ,  H04M1/27455

Abstract: A workstation with multiple, functionally related displays clustered under and controlled by a common transparent overlay control device. The position of a hand-held stylus is sensed by the overlay control device and is used as a system input to control system operations, system communications and input, manipulation and editing of images displayed on the displays. Control of certain workstation operations is achieved by directing the stylus towards function symbols which are affixed to the overlay surface. Actuators or other adjustment mechanisms are provided for adjustment of the height and pitch of the workstation for the comfort of the operator. Further, the workstation provides integrated data audio communication over ordinary narrow-band telephone lines or high speed data lines with other linked workstations.

Abstract translation: 具有多个功能相关的显示器的工作站聚集在公共透明覆盖控制设备的下面并由其控制。 手持式笔的位置由覆盖控制装置感测，并用作系统输入，以控制显示在显示器上的图像的系统操作，系统通信和输入，操纵和编辑。 某些工作站操作的控制是通过将触控笔引向固定到覆盖表面的功能符号来实现的。 提供致动器或其他调节机构用于调整工作台的高度和间距以便操作者的舒适度。 此外，工作站通过普通窄带电话线或其他链接工作站的高速数据线提供集成数据音频通信。

公开(公告)号：US07674315B2

公开(公告)日：2010-03-09

申请号：US11151014

申请日：2005-06-12

Applicant: Leonard Reiffel

Inventor： Leonard Reiffel

IPC: C21B3/02 ,  C22B7/02 ,  C21B5/00

CPC classification number: C21B5/008 ,  C21B5/001 ,  C21B5/023 ,  C21B5/026 ,  C21C7/0056 ,  C22B7/001 ,  C22B7/02 ,  F27B1/20 ,  F27D3/0025 ,  F27D3/0027 ,  F27D3/0033 ,  Y02P10/214 ,  Y02P10/216 ,  Y10S75/961 ,  Y10S75/962

Abstract: A metallurgical process involves providing an ingredient enclosure and placing a plurality of granules of a first material in the ingredient enclosure. The first material contains a first ingredient in a metallurgical process. A metallurgical process furnace having a chamber in which ingredients for the metallurgical process are added is provided and the ingredient enclosure and the first material are added to the chamber. The chamber is heated after the addition of the ingredient enclosure and the first material to the chamber, although it may also be heated prior to such addition. In one form, the granules comprise mill scale and the metallurgical process furnace is a blast furnace.

Abstract translation: 冶金过程涉及提供配料外壳并将多个第一材料颗粒放置在配料外壳中。 第一种材料包含冶金工艺中的第一种成分。 提供了一种具有其中添加有用于冶金工艺的成分的室的冶金工艺炉，并且将成分封壳和第一材料添加到室中。 在将配料外壳和第一种材料添加到腔室之后，将腔室加热，尽管也可以在加入之前加热该腔室。 在一种形式中，颗粒包括氧化皮，冶金工艺炉是高炉。