公开(公告)号：US07354168B2

公开(公告)日：2008-04-08

申请号：US10848210

申请日：2004-05-18

Applicant: Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann ,  Jurgen Faltus ,  Berndt Warm ,  Stefan Dornheim

Inventor： Hubert Holderer ,  Andreas Heisler ,  Wolfgang Singer ,  Markus Weiss ,  Andreas Seifert ,  Frank Melzer ,  Heinz Mann ,  Jurgen Faltus ,  Berndt Warm ,  Stefan Dornheim

IPC: G02B5/09 ,  G02B7/182

CPC classification number: G03F7/70075 ,  G02B5/09 ,  G02B7/1821 ,  G02B7/1824 ,  G02B7/198 ,  G02B26/0833 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/702

Abstract: A facet mirror (10) is provided with a number of mirror facets (11), in which the mirror facets (11) respectively have a spherical or conical facet body (17) with a reflecting surface (12). The side of the facet body (17) averted from the reflecting surface (12) is mounted in a bearing device (15).

Abstract translation: 小面反射镜（10）设置有多个镜面（11），其中镜面（11）分别具有带有反射表面（12）的球形或圆锥形小面体（17）。 从反射面（12）避开的小面体（17）的一侧安装在轴承装置（15）中。

公开(公告)号：US20070283591A1

公开(公告)日：2007-12-13

申请号：US11796475

申请日：2007-04-27

Applicant: Wolfgang Singer ,  Joachim Hainz ,  Joachim Wietzorrek ,  Markus Weiss

Inventor： Wolfgang Singer ,  Joachim Hainz ,  Joachim Wietzorrek ,  Markus Weiss

IPC: F26B3/34

CPC classification number: G02B27/0006 ,  G02B17/0657 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G03F7/70925 ,  G03F7/70975

Abstract: There is provided, a system that includes (a) a source of light having a wavelength of less than or equal to about 193 nm, (b) an optical element having a region for directing the light, (c) an arrangement for cleaning the region, and (d) a chamber to accommodate the region during the cleaning.

Abstract translation: 提供了一种系统，其包括（a）波长小于或等于约193nm的光源，（b）具有用于引导光的区域的光学元件，（c）用于清洁 区域，以及（d）在清洁期间容纳该区域的室。

公开(公告)号：US07246909B2

公开(公告)日：2007-07-24

申请号：US10936317

申请日：2004-09-08

Applicant: Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

Inventor： Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  G02B7/1824 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70825

Abstract: In a method for the production of a facetted mirror 24 having a plurality of mirror facets 12 and 12′, which have mirror surfaces 15 and are fitted into reception bores 22, 22′ of a support plate 16, the mirror facets 12, 12′ are made in a first method step. At least one of the mirror facets is fitted into the associated reception bore of the support plate in a second method step, after which the ACTUAL position of the optical axis of at least one mirror surface of an associated mirror facet 12, 12′ fitted into the support plate is respectively determined in a third step and compared with a SET position of a predetermined optical axis. Knowing the measured values determined for the at least one mirror facet 12, 12′ in the third method step, reprocessing of the mirror facet and/or of the reception bore is subsequently carried out in a further method step if there is an angular deviation between the ACTUAL position and the SET position.

Abstract translation: 在制造具有多个镜面12和12'的分面镜24的方法中，其具有镜面15并被装配到支撑板16的接收孔22,22'中，镜面12,12' 在第一方法步骤中制成。 在第二方法步骤中，至少一个镜面被安装到支撑板的相关联的接收孔中，之后将相关联的镜面12,12'的至少一个镜面的光轴的ACTUAL位置嵌入 分别在第三步骤中确定支撑板并与预定光轴的SET位置进行比较。 了解在第三方法步骤中对于至少一个镜面12,12'确定的测量值，随后在另外的方法步骤中进行镜面和/或接收孔的再处理，如果在第二方法步骤之间存在角度偏差 ACTUAL位置和SET位置。

公开(公告)号：US07244954B2

公开(公告)日：2007-07-17

申请号：US11243403

申请日：2005-10-04

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Jochen Wietzorrek ,  Frank Melzer ,  Johannes Wangler

IPC: G02B27/10

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B5/09 ,  G02B17/006 ,  G02B19/0014 ,  G02B19/0019 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70108 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70825 ,  G21K2201/065 ,  G21K2201/067

Abstract: There is provided a collector for illumination systems for light having a wavelength ≦193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract translation: 提供了一种用于具有波长<= 193nm的光的照明系统的收集器。 收集器包括（a）第一反射镜壳体，其围绕公共旋转轴线邻近第二反射镜壳体并位于其内部，其中第一和第二反射镜壳体旋转对称，以及（b）区域中的部件 在第一和第二镜壳之间。 收集器用于经由物体侧孔口接收来自光源的光并且用于照射图像侧平面中的区域，并且该区域不被光使用。

公开(公告)号：US07172055B2

公开(公告)日：2007-02-06

申请号：US11287775

申请日：2005-11-28

Applicant: Werner Engel ,  Markus Weiss

Inventor： Werner Engel ,  Markus Weiss

IPC: B66B1/34

CPC classification number: B66B5/0087 ,  B66B25/006

Abstract: A method and a device for maintenance of an elevator or escalator installation includes an interface for connection of a controller of the installation with a display and control unit for display of operating parameters or for input of control commands and data, and connection equipment for creating a data connection with a maintenance center. Data and parameters stored in the maintenance center can be transferred to the display and control unit by the data connection after an identification check. A fault log with a specification of operating faults and/or a specification of the replacement parts coming into question for rectification of the operating faults can be produced, which is transferred by the data connection from the display and control unit to the maintenance center, can be produced for example to cause ordering of missing replacement parts.

Abstract translation: 用于维护电梯或自动扶梯安装的方法和设备包括用于连接设备的控制器与显示器和控制单元的接口，用于显示操作参数或用于输入控制命令和数据，以及连接设备，用于创建 与维护中心的数据连接。 存储在维护中心的数据和参数可以在识别检查后通过数据连接传输到显示和控制单元。 可以产生具有操作故障规格的故障日志和/或用于整改操作故障的替换部件的规格，其通过数据连接从显示器和控制单元传送到维护中心，可以 例如生产缺少更换零件的订购。

公开(公告)号：US07116394B2

公开(公告)日：2006-10-03

申请号：US10738976

申请日：2003-12-19

Applicant: Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

Inventor： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70916 ,  B08B6/00 ,  B08B7/0035 ,  G03F7/70925

Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

Abstract translation: 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。 清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。

公开(公告)号：US20050274897A1

公开(公告)日：2005-12-15

申请号：US11091238

申请日：2005-03-28

Applicant: Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

Inventor： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

IPC: G03F7/20 ,  G01J1/42

CPC classification number: G03F7/7085 ,  G03F7/70141 ,  G03F7/70558

Abstract: There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Abstract translation: 提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及 （b）位于或靠近平面的传感器，用于检测使用区域外的光。

公开(公告)号：US06912077B2

公开(公告)日：2005-06-28

申请号：US10708183

申请日：2004-02-13

Applicant: Markus Weiss ,  Ulrich Haag

Inventor： Markus Weiss ,  Ulrich Haag

IPC: G03F7/20 ,  G02B26/08

CPC classification number: G03F7/70308 ,  G03F7/70258 ,  G03F7/70891

Abstract: An optical system, for example a projection exposure apparatus for microlithography, has at least one optical element with an optical surface. A correction radiation device is provided that includes at least one correction radiation source for emitting correction radiation. A scanning device has at least one scanning mirror that is irradiated by the correction radiation and driven in such a way that a defined portion of the optical surface of the optical element is scanned with the correction radiation. This results in a correction of imaging characteristics of the optical element by means of heat which is supplied to the optical element by the correction radiation.

Abstract translation: 光学系统，例如用于微光刻的投影曝光装置，具有至少一个具有光学表面的光学元件。 提供了一种校正辐射装置，其包括用于发射校正辐射的至少一个校正辐射源。 扫描装置具有至少一个由校正辐射照射的扫描镜，并以这样一种方式驱动，使得光学元件的光学表面的限定部分用校正辐射扫描。 这导致通过校正辐射提供给光学元件的热量校正光学元件的成像特性。

公开(公告)号：US20110079737A1

公开(公告)日：2011-04-07

申请号：US12969115

申请日：2010-12-15

Applicant: Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

Inventor： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC: G01J3/10

CPC classification number: G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

Abstract translation: 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US07614857B2

公开(公告)日：2009-11-10

申请号：US10495462

申请日：2002-11-15

Applicant: Rudolf Marcel Fuechslin ,  Markus Weiss ,  Rudolf Duenkl ,  Peter Fritz Mejer ,  Thomas Neff ,  Erich Paul Stoll ,  Andreas Suter

Inventor： Rudolf Marcel Fuechslin ,  Markus Weiss ,  Rudolf Duenkl ,  Peter Fritz Mejer ,  Thomas Neff ,  Erich Paul Stoll ,  Andreas Suter

IPC: F04B7/00

CPC classification number: A61M39/223 ,  A61M5/14 ,  A61M5/142 ,  A61M5/14216 ,  A61M5/1456 ,  A61M2005/1402 ,  A61M2005/14264 ,  Y10T137/86871

Abstract: The invention relates to a medical pump device comprising a rotary valve (13) having preferably only one rectilinear channel (20) which respectively connects the inlet (4) and the outlet (7) of the pump device, or connects the inlet to a pump chamber (15), or said pump chamber to the outlet, upon rotation of the rotary element (19) of the valve. The invention enables a medical pump device to be especially easily produced, said pump device being preferably inserted between an infusion syringe driver or an infusion container and a catheter, and being used to supply small quantities of liquid in an accurately dosed manner.

Abstract translation: 本发明涉及一种医疗泵装置，其包括旋转阀（13），其优选地仅具有一个直接通道（20），其分别连接泵装置的入口（4）和出口（7），或将入口连接到泵 （15）或所述泵室在所述旋转元件（19）旋转时到所述出口。 本发明能够特别容易地制造医疗泵装置，所述泵装置优选地插入在注射器驱动器或输注容器和导管之间，并且用于以精确计量的方式供应少量的液体。