公开(公告)号：US20090231513A1

公开(公告)日：2009-09-17

申请号：US12088478

申请日：2006-07-19

Applicant: Yuuki Ohta ,  Tetsuya Hamada ,  Noriyuki Ohashi

Inventor： Yuuki Ohta ,  Tetsuya Hamada ,  Noriyuki Ohashi

IPC: G02F1/13357 ,  F21V7/04

CPC classification number: G02B6/0068 ,  G02B6/0055 ,  G02B6/0073 ,  G02B6/0088

Abstract: An illuminating device achieves higher brightness by improving the utilization efficiency of light from a light source in an illuminating device for emitting plane-shaped light. The backlight device includes a light guide member, and LED units facing side surfaces of the light guide member, and propagates light that is emitted by the LEDs and made incident to the side surfaces in the light guide member so as to emit plane-shaped light from a first main surface of the light guide member. The backlight device includes an insulating reflective member placed outside a second main surface of the light guide member facing the first main surface, and a metal reflective sheet laminated on the insulating reflective sheet on the side opposite to the light guide member.

Abstract translation: 通过提高发光面照明装置中的光源的光的利用效率，照明装置实现更高的亮度。 背光装置包括导光构件和面向导光构件的侧表面的LED单元，并且传播由LED发射并入射到导光构件的侧表面的光，以便发射平面形状的光 从导光构件的第一主表面。 背光源装置包括位于导光构件的面向第一主表面的第二主表面外侧的绝缘反射构件，以及层叠在与导光构件相反的一侧的绝缘反射片上的金属反射片。

公开(公告)号：US20090201669A1

公开(公告)日：2009-08-13

申请号：US12304270

申请日：2007-02-06

Applicant: Tetsuya Hamada

Inventor： Tetsuya Hamada

IPC: G09F13/04 ,  G09G3/32

CPC classification number: G02F1/133603 ,  G02F1/133621 ,  G02F2001/133612 ,  H05B33/086

Abstract: In a backlight device, two-channel LED modules including 4-light-emitting diodes connected in series and resistive elements connected in series to the respective LED module are provided. The resistor elements provide voltage drops to the corresponding LED modules, and thereby set output voltages to the respective LED modules in a predetermined voltage range.

Abstract translation: 在背光装置中，提供了包括串联连接的4个发光二极管和与各个LED模块串联连接的电阻元件的双通道LED模块。 电阻元件向相应的LED模块提供电压降，从而在预定的电压范围内将输出电压设置到相应的LED模块。

公开(公告)号：US20090104961A1

公开(公告)日：2009-04-23

申请号：US12285942

申请日：2008-10-16

Applicant: Tetsuya Hamada ,  Mitsuru Todaiji ,  Kenji Uchida ,  Miyako Suzuki ,  Takeshi Hisajima ,  Keita Yoshino ,  Nobushiro Yamasaki

Inventor： Tetsuya Hamada ,  Mitsuru Todaiji ,  Kenji Uchida ,  Miyako Suzuki ,  Takeshi Hisajima ,  Keita Yoshino ,  Nobushiro Yamasaki

IPC: A63F9/24

CPC classification number: G07F17/3211 ,  G07F17/32 ,  G07F17/322

Abstract: A game program configured to cause a game apparatus to operate to implement as: a means that generates an image simulating a dealer and a play field; a means for determining a bet number of a particular gaming value; a means that executes a gambling type game in which a predetermined number of gaming values have been bet between the player and the dealer when input information on the bet number has been provided; a means for giving a chip to the dealer; a means that stores the chips corresponding to the dealer in association with each other, based on the input information; a means that determines a favorable-impression rank corresponding to the stored chip and controls a behavior of the dealer in response to the rank; and a means that pays back a gaming value when it is judged that the player has won in the gambling type game.

Abstract translation: 一种游戏程序，被配置为使游戏装置操作以实现为：产生模拟经销商和游戏场的图像的装置; 用于确定特定游戏价值的投注数的手段; 当提供关于投注号码的输入信息时，执行其中已经在玩家和经销商之间下注了预定数量的游戏值的赌博类型游戏的手段; 向经销商提供芯片的方法; 基于所述输入信息，相互关联地存储与所述经销商对应的芯片的装置; 确定与存储的芯片相对应的有利印象等级的手段，并且响应于等级控制经销商的行为; 并且当判断玩家在赌博型游戏中赢得时，可以回报游戏价值。

公开(公告)号：US20090067158A1

公开(公告)日：2009-03-12

申请号：US12293096

申请日：2006-11-02

Applicant: Tetsuya Hamada

Inventor： Tetsuya Hamada

IPC: G02F1/13357

CPC classification number: G02F1/133603 ,  G02F1/133605 ,  G02F1/133608 ,  G02F2001/133601 ,  H05B33/0803

Abstract: In a direct backlight, a substrate on which LEDs are provided includes a plurality of module substrates. Each module substrates can be reduced in warping or deformation after a blanking process. In addition, each module substrate can be formed thin since bending due to its own weight is small. Consequently, the substrate as a whole and the backlight can be formed thin.

Abstract translation: 在直接背光源中，设置有LED的基板包括多个模块基板。 在消隐过程之后，每个模块基板可以减少翘曲或变形。 此外，每个模块基板可以形成为薄的，因为其自重的弯曲小。 因此，可以将基板整体和背光源形成得较薄。

公开(公告)号：US20080033154A1

公开(公告)日：2008-02-07

申请号：US11629517

申请日：2005-06-02

Applicant: Yoshihisa Inoue ,  Setsuko Funaki ,  Tetsuya Hamada ,  Yoshihiro Yamamoto ,  Isao Hara ,  Takaomi Hayashi ,  Miyuki Konno ,  Shinobu Aoki

Inventor： Yoshihisa Inoue ,  Setsuko Funaki ,  Tetsuya Hamada ,  Yoshihiro Yamamoto ,  Isao Hara ,  Takaomi Hayashi ,  Miyuki Konno ,  Shinobu Aoki

IPC: C07D307/02 ,  C07H5/06

CPC classification number: C07D307/14

Abstract: A 3-aminomethyltetrahydrofuran derivative is produced by preparing a 3-cyanotetrahydrofuran derivative in a high yield from a malic acid derivative, and reducing the cyano group of the 3-cyanotetrahydrofuran derivative. The process can produce the 3-cyanotetrahydrofuran derivative in a high yield from inexpensive industrial materials.

Abstract translation: 通过从苹果酸衍生物制备高收率的3-氰基四氢呋喃衍生物，并还原3-氰基四氢呋喃衍生物的氰基，制备3-氨基甲基四氢呋喃衍生物。 该方法可以从廉价的工业材料以高产率生产3-氰基四氢呋喃衍生物。

公开(公告)号：US20070190437A1

公开(公告)日：2007-08-16

申请号：US11670108

申请日：2007-02-01

Applicant: Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

Inventor： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

IPC: G03C5/00

CPC classification number: G03F7/70925 ,  G03F7/168 ,  G03F7/7075 ,  G03F7/70916 ,  G03F7/70991 ,  G11B5/8404 ,  G11B7/261 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a blush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

Abstract translation: 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及 一个接口块。 曝光装置被布置成与基板处理装置中的界面块相邻。 曝光装置通过浸渍方法使基板进行曝光处理。 在清洁/干燥处理块中的边缘清洁单元中，腮红与旋转基板的端部抵接，从而清洁曝光处理之前的基板的边缘。 此时，校正基板被清洁的位置。

公开(公告)号：US20070177870A1

公开(公告)日：2007-08-02

申请号：US11627726

申请日：2007-01-26

Applicant: Tetsuya Hamada

Inventor： Tetsuya Hamada

IPC: G03D5/00

CPC classification number: H01L21/67178 ,  H01L21/67051 ,  H01L21/67742 ,  H01L21/67748

Abstract: A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a placement/bake unit. A substrate that has been subjected to exposure processing in the exposure device is subjected to cleaning and drying processing in a second cleaning/drying processing unit, and is then transported to a placement/heating unit. In the placement/heating unit, the substrate is subjected to post-exposure bake processing.

Abstract translation: 基板处理装置包括接口块。 曝光装置设置在接口块附近。 接口块包括放置/烘烤单元。 在曝光装置中经受曝光处理的基板在第二清洗/干燥处理单元中进行清洗和干燥处理，然后被运送到放置/加热单元。 在放置/加热单元中，对基板进行曝光后烘烤处理。

公开(公告)号：US20070172233A1

公开(公告)日：2007-07-26

申请号：US11623231

申请日：2007-01-15

Applicant: Tetsuya Hamada

Inventor： Tetsuya Hamada

IPC: G03D5/00

CPC classification number: G03D3/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67225

Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a substrate replacement group. The substrate replacement group has a stack of three cleaning/drying processing units. The cleaning/drying processing unit subjects the substrate after exposure processing to cleaning and drying processing.

Abstract translation: 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 接口块包括基板更换组。 基板更换组具有三个清洁/干燥处理单元的堆叠。 清洁/干燥处理单元在曝光处理之后对基板进行清洁和干燥处理。

公开(公告)号：US07163331B2

公开(公告)日：2007-01-16

申请号：US10641720

申请日：2003-08-15

Applicant: Toshihiro Suzuki ,  Tetsuya Hamada ,  Mari Sugawara ,  Tetsuya Kobayashi ,  Keiji Hayashi

Inventor： Toshihiro Suzuki ,  Tetsuya Hamada ,  Mari Sugawara ,  Tetsuya Kobayashi ,  Keiji Hayashi

IPC: F21V7/04 ,  F21V8/00

CPC classification number: G02B6/0028 ,  G02B6/00 ,  G02B6/003 ,  G02B6/0038 ,  G02B6/0056 ,  G02F1/133615

Abstract: A lighting unit and a liquid crystal display device which can improve the efficiency of usable light. The lighting unit includes a light source, a light guide plate, and a truncated pyramid located between the light guide plate and the light source. The truncated pyramid has a base, a top smaller than the base, and a slope linking the base and the top. The light source is placed in close contact with the top of the truncated pyramid, and the light guide plate is placed in close contact with the base of the truncated pyramid. Light is propagated from a light emitting part of the light source to the light guide plate without passing through any air layer. Also, an unnecessary light removing structure is provided in the light guide plate near the incidence surface thereof.

Abstract translation: 照明单元和能够提高可用光效率的液晶显示装置。 照明单元包括光源，导光板和位于导光板和光源之间的截头棱锥。 截头棱锥具有基部，顶部小于基部，以及连接基部和顶部的斜面。 光源被放置成与截顶的金字塔的顶部紧密接触，并且导光板被放置成与截顶金字塔的基部紧密接触。 光从光源的发光部分传播到导光板，而不通过任何空气层。 而且，在导光板的入射面附近设有不必要的光去除结构。

公开(公告)号：US20060120716A1

公开(公告)日：2006-06-08

申请号：US11294268

申请日：2005-12-05

Applicant: Tetsuya Hamada

Inventor： Tetsuya Hamada

IPC: G03D5/00

CPC classification number: H01L21/67225 ,  G03F7/168 ,  G03F7/2006 ,  H01L21/67748

Abstract: When a first substrate transferred outwardly from an indexer cell is the last substrate prior to reticle change in an exposure apparatus, the outward transfer of a second substrate to be processed subsequently to the first substrate from the indexer cell is temporarily stopped. After a lapse of time corresponding to reticle replacement time, the outward substrate transfer is restarted, and the second substrate is transferred outwardly from the indexer cell. For the exposure apparatus, the second substrate subjected to a resist coating process is received at the instant when the reticle replacement is completed after the completion of the exposure process of the first substrate. This provides a constant time interval between the completion of the resist coating process of substrates and the execution of the exposure process thereof without the decrease in processing efficiency. As a result, a uniform processing history for the substrates is achieved to further improve the line width uniformity of a pattern.