公开(公告)号：US10145832B2

公开(公告)日：2018-12-04

申请号：US14388396

申请日：2013-02-27

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Kotaro Fukuzawa ,  Tetsuo Koga ,  Kazuki Hayashi ,  Tetsuro Fukase

IPC: G01N33/18 ,  G01N11/00 ,  G01N27/06 ,  G01N21/00 ,  B63J4/00 ,  G01N27/26 ,  C02F1/00 ,  C02F1/76 ,  C02F103/00

Abstract: A state of a ballast water treatment system of a ship detected by a variety of sensors is monitored by transmitting it to a control means provided with a data storage/transmission means. The control means transmits from a satellite communication means to a satellite communication means on the receiving side via a communication satellite, and a host computer receives it. The host computer analyzes and monitors information from the various sensors S1 to S6 and sends back an optimal operation state, which is received by the satellite communication means on the ship side via the communication satellite, and the control means maintains an operation of the ballast water treatment system based on instructions from the host computer. According to the remote monitoring device for a ballast water treatment system as above, the ballast water treatment system can be monitored and controlled from remote.

公开(公告)号：US20180257066A1

公开(公告)日：2018-09-13

申请号：US15760507

申请日：2016-09-12

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Toshimasa KATO ,  Shigeyuki HOSHI

IPC: B01J39/04 ,  B01J41/04 ,  B01J47/12 ,  C02F1/42 ,  C02F1/62

CPC classification number: B01J39/04 ,  B01J41/04 ,  B01J47/12 ,  C02F1/42 ,  C02F1/444 ,  C02F1/62 ,  C02F2101/20 ,  C02F2103/04 ,  H01L21/02052 ,  H01L21/67057

Abstract: The present invention reduces adhesion of trace metals in ultrapure water for cleaning products, and inhibits the metal contamination of an object to be cleaned. Provided is a metal contamination inhibitor that contains a polymer having an ion-exchange group, such as a polystyrene sulfonate having a molecular weight of at least 100,000. Trace metals in ultrapure water are adsorbed through an ion-exchange reaction of the polymer having the ion-exchange group, and can thus be inhibited from adhering to products. Also provided is a method for cleaning a product with ultrapure water to which the metal contamination inhibitor has been added. Preferably, the ultrapure water to which the metal contamination inhibitor has been added flows through a separation membrane module, and the products are cleaned with permeated water.

公开(公告)号：US20180236409A1

公开(公告)日：2018-08-23

申请号：US15554616

申请日：2016-02-17

Applicant: KURITA WATER INDUSTRIES LTD. ,  NATIONAL UNIVERSITY CORPORATION KOBE UNIVERSITY

Inventor： Akihiro FUJII ,  Takahiro KAWAKATSU ,  Hideto MATSUYAMA ,  Daisuke SAEKI ,  Fumiya SAKO

IPC: B01D67/00 ,  B01D71/02 ,  B01D71/06 ,  B01D69/12 ,  C02F1/44

CPC classification number: B01D67/0088 ,  B01D61/025 ,  B01D61/027 ,  B01D61/145 ,  B01D61/147 ,  B01D67/0093 ,  B01D69/02 ,  B01D69/12 ,  B01D71/025 ,  B01D71/06 ,  B01D2325/24 ,  C02F1/44

Abstract: To provide a permselective membrane that includes a coating layer constituted by a phospholipid bilayer, the coating layer being capable of withstanding the pressure applied during a water treatment and being resistant to detachment and a method for producing the permselective membrane. A permselective membrane comprising a membrane main body having permselectivity and a coating layer disposed on a surface of the membrane main body, the coating layer including a phospholipid bilayer including a channel substance, wherein the phospholipid bilayer includes phospholipids that are a first phospholipid including an acyl group constituted by a fatty acid including an unsaturated fatty acid and a second phospholipid including two acyl groups each constituted by a fatty acid that is a saturated fatty acid having 16 to 24 carbon atoms.

公开(公告)号：US10041924B2

公开(公告)日：2018-08-07

申请号：US15304762

申请日：2015-04-01

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Shintarou Mori ,  Yukimasa Shimura

IPC: G01N33/18 ,  G01N21/59 ,  G01N27/06

CPC classification number: G01N33/1853 ,  G01N21/59 ,  G01N27/06 ,  G01N33/182

Abstract: Provided are a concentration-factor measurement device and method for accurately calculating a concentration factor of circulating water, and a method for measuring a water-quality index value of the circulating water. The concentration-factor measurement device includes a light-absorbance measurement unit (1) for measuring absorbance by irradiating each of cells (12A-12C) with light, and an electrode measurement unit (2) equipped with electrodes (16, 17) that are inserted into a water sample in a container (20). For each item of water quality, the device calculates a concentration factor on the basis of a measured value measured when the water sample (W) is the circulating water, and a measured value measured when the water sample (W) is makeup water. A plurality of concentration factors are calculated on the basis of the measured values for plural items of water quality. Hence an accurate concentration factor can be obtained.

公开(公告)号：US20180200678A1

公开(公告)日：2018-07-19

申请号：US15743949

申请日：2016-03-23

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Kazuki ISHII ,  Takahiro KAWAKATSU

IPC: B01D65/02 ,  B01D71/56 ,  B01D61/02 ,  C11D1/02 ,  C11D3/20 ,  C11D3/37

CPC classification number: B01D65/02 ,  B01D61/025 ,  B01D71/56 ,  B01D2321/164 ,  B01D2321/168 ,  C02F1/441 ,  C02F5/10 ,  C02F5/12 ,  C02F2103/08 ,  C11D1/02 ,  C11D3/044 ,  C11D3/2086 ,  C11D3/37 ,  C11D7/06 ,  C11D7/265 ,  C11D11/0041 ,  Y02A20/131

Abstract: An agent for cleaning an RO membrane, which includes an aldonic acid and/or a salt of an aldonic acid, removes effectively foulants that cannot be sufficiently removed with conventional cleaning agents when an RO membrane used for water treatment. In a method for cleaning an RO membrane with the cleaning agent or the cleaning liquid, while the detachment and hydrolysis effects are achieved by performing cleaning under alkaline conditions, chelation of heavy metals is caused by the aldonic acid and/or the salt of an aldonic acid. When an anionic surfactant is used in combination with the aldonic acid and/or the salt of an aldonic acid, the anionic surfactant causes the detachment of foulants. When a polyol having a molecular weight of 1000 or less is used in combination with the aldonic acid and/or the salt of an aldonic acid, the polyol causes wetting and swelling of foulants.

公开(公告)号：US10026628B2

公开(公告)日：2018-07-17

申请号：US14432818

申请日：2013-09-30

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Yuichi Ogawa ,  Haruyoshi Yamakawa

IPC: C23G1/02 ,  H01L21/67 ,  H01L21/02 ,  H01L21/3213 ,  H01L21/285

CPC classification number: H01L21/67051 ,  H01L21/02068 ,  H01L21/28518 ,  H01L21/32134

Abstract: The present invention relates to a method and a system for cleaning a semiconductor substrate wherein Al is at last partially exposed on a silicon substrate and silicided with a metallic substance without damaging the Al and a silicide layer. A cleaning portion cleans the aforementioned semiconductor substrate. A delivery portion, disposed on the cleaning portion, delivers a solution to the semiconductor substrate. A sulfuric acid solution transfer path connected onto the delivery portion transfers a sulfuric acid solution and an adsorptive inhibitor solution transfer path connected to the delivery path transfers an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor may be mixed or separately transferred to come into contact with the semiconductor substrate.

公开(公告)号：US20180162754A1

公开(公告)日：2018-06-14

申请号：US15577575

申请日：2015-06-11

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Yukitaka MATSUMOTO ,  Hideki KOBAYASHI

IPC: C02F1/461

CPC classification number: C02F1/46109 ,  C02F1/025 ,  C02F1/46104 ,  C02F1/4672 ,  C02F2001/46128 ,  C02F2001/46147 ,  C02F2001/46152 ,  C02F2001/46171 ,  C02F2101/30 ,  C02F2201/4611 ,  C02F2301/066

Abstract: Provided is an electrolysis apparatus with which the liquid that is to be treated can be continuously electrolyzed with high efficiency under high-temperature and high-pressure conditions. The electrolysis apparatus includes a cylindrical container main body including an inner peripheral surface serving as a cathode surface, an anode plate disposed in the container main body along an axis thereof, and end members attached to the respective ends of the container main body with nuts interposed therebetween, respectively. The end members are provided with nozzles, respectively, through which the liquid is passed. The end member is provided with a power supply rod connected to the anode plate which is inserted in the end member. Bipolar electrode plates are disposed in the container main body so as to be parallel to the anode plate. Insulators support the sides of the anode plate and the sides of the bipolar electrode plates.

公开(公告)号：US20170356891A1

公开(公告)日：2017-12-14

申请号：US15540807

申请日：2016-01-06

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hiroshi MORITA ,  Yuichi OGAWA ,  Yuya SASAKI

IPC: G01N31/12 ,  B08B3/08 ,  B08B3/14 ,  H01L21/67

CPC classification number: G01N31/12 ,  B08B3/08 ,  B08B3/10 ,  B08B3/12 ,  B08B3/14 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/67276

Abstract: To measure the concentration of an oxidant in an oxidative cleaning liquid used in a process of cleaning an electronic material in a simple, easy, consistent, and accurate manner without being affected by impurities included in the cleaning liquid, such as metals. A method for measuring the concentration of an oxidant in a sample liquid used as a cleaning liquid in a process of cleaning an electronic material includes decomposing at least part of an oxidant included in the sample liquid by heating or the like; measuring the amount of oxygen gas generated by decomposition of the oxidant; and determining the concentration of the oxidant in the sample liquid on the basis of the amount of the oxygen gas.

公开(公告)号：US20170327396A1

公开(公告)日：2017-11-16

申请号：US15536510

申请日：2015-12-18

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Nozomu IKUNO

IPC: C02F9/00 ,  B01D19/00 ,  B01D61/02 ,  B01D61/08 ,  B01D15/36 ,  C02F101/30 ,  C02F1/20 ,  C02F1/42 ,  C02F1/44 ,  C02F103/04 ,  C02F1/32

Abstract: The present invention provides an apparatus and method for producing ultrapure water of extremely high purity that sufficiently meets the requirement for its quality at low production cost with reduced footprint. The apparatus for producing ultrapure water includes a pretreatment system, a primary water purification system, and a subsystem, wherein the primary water purification system includes a high-pressure reverse osmotic membrane separation unit, a degassing unit, an ultraviolet oxidation unit, and an ion-exchange unit in this order.

公开(公告)号：US20170267550A1

公开(公告)日：2017-09-21

申请号：US15615233

申请日：2017-06-06

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Nozomu IKUNO

IPC: C02F1/44 ,  B01D61/02 ,  B01D61/04 ,  B01D61/08 ,  B01D63/00 ,  C02F9/00 ,  C02F1/20 ,  C02F1/32 ,  C02F1/42 ,  C02F1/52 ,  C02F103/04 ,  C02F103/34

CPC classification number: C02F1/441 ,  B01D61/022 ,  B01D61/025 ,  B01D61/04 ,  B01D61/08 ,  B01D61/145 ,  B01D63/00 ,  B01D2311/04 ,  B01D2311/06 ,  B01D2311/2619 ,  B01D2311/2623 ,  B01D2311/2642 ,  B01D2311/2657 ,  B01D2317/04 ,  C02F1/001 ,  C02F1/20 ,  C02F1/32 ,  C02F1/42 ,  C02F1/444 ,  C02F1/52 ,  C02F9/00 ,  C02F2103/04 ,  C02F2103/346 ,  B01D2311/2649 ,  B01D2311/2653 ,  B01D2311/2634 ,  B01D2311/10

Abstract: A method for producing ultrapure water includes supplying raw water (industrial water, tap water, well water, or used ultrapure water discharged from semiconductor plants) to a pretreatment system for treating the raw water to produce water, supplying the water to a primary water purification system having a reverse osmosis membrane separation unit to produce a primarily purified water, and supplying the primarily purified water to a secondary purification system to produce ultrapure water.