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公开(公告)号：US07952084B2
公开(公告)日：2011-05-31
申请号：US12431367
申请日：2009-04-28
Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Martin Jacobus Johan Jak
CPC classification number: G03F7/70916 , G03F7/70033 , G03F7/70058
Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
Abstract translation: 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料被辐射束接触以形成等离子体的位置处的等离子体形成位置，构造和布置成收集在等离子体形成部位处形成的极紫外辐射并形成极紫外辐射的收集器 光束和污染屏障。 污染屏障包括至少部分地位于等离子体形成位置和集电器之间的多个箔，以及可操作地连接到多个箔的可旋转底座。 可旋转底座构造成允许辐射束通过污染屏障到等离子体形成部位。
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32.发明申请METHOD FOR REMOVING A DEPOSITION ON AN UNCAPPED MULTILAYER MIRROR OF A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效在地平面设备的未映射多层镜面上移除沉积物的方法，光刻设备和器件制造方法公开(公告)号：US20110117504A1
公开(公告)日：2011-05-19
申请号：US12997149
申请日：2009-06-09
Applicant: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
Inventor： Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
CPC classification number: G03F7/70925
Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.
Abstract translation: 一种用于去除装置的无盖多层反射镜上的沉积的方法。 该方法包括在装置的至少一部分中提供包括H2，D2和DH中的一种或多种的气体，以及选自烃化合物和/或硅烷化合物的一种或多种另外的化合物; 从气体产生氢和/或氘自由基和一种或多种另外的化合物的基团; 并且使具有沉积的未封盖的多层反射镜与至少部分氢和/或氘基和一种或多种另外的化合物的基团接触以除去至少部分沉积物。
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公开(公告)号：US07696492B2
公开(公告)日：2010-04-13
申请号：US11637936
申请日：2006-12-13
Applicant: Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
Inventor： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC classification number: G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
Abstract translation: 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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34.发明申请Optical Element, Lithographic Apparatus Including Such an Optical Element, Device Manufacturing Method, and Device Manufactured Thereby 有权光学元件，包括这种光学元件的光刻设备，器件制造方法和由此制造的器件公开(公告)号：US20100002216A1
公开(公告)日：2010-01-07
申请号：US12495043
申请日：2009-06-30
CPC classification number: G03F7/70958 , G03F7/70575
Abstract: Spectral purity of a radiation beam of a first wavelength may be improved by providing an optical element that includes a structure having at least first layer including a first material, which structure is configured to be substantially reflective for a radiation of the first wavelength and substantially transparent or absorptive for a radiation of a second wavelength, a second layer including a second material, the second layer being configured to be substantially reflective, absorptive or scattering for the radiation of the second wavelength, and vacuum between the first layer and the second layer, wherein the first layer is located upstream in the optical path of incoming radiation with respect to the second layer.
Abstract translation: 可以通过提供一种光学元件来改善第一波长的辐射束的光谱纯度，所述光学元件包括具有至少包括第一材料的第一层的结构，该结构被配置为对于第一波长的辐射基本上是反射的，并且基本上透明 或吸收第二波长的辐射，第二层包括第二材料，第二层被配置为对于第二波长的辐射是基本反射的，吸收的或散射的，以及第一层和第二层之间的真空， 其中所述第一层位于相对于所述第二层的入射辐射的光路中的上游。
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公开(公告)号：US20090284725A1
公开(公告)日：2009-11-19
申请号：US12466185
申请日：2009-05-14
CPC classification number: G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
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Patent Agency Ranking
公开(公告)号：US20090272916A1
公开(公告)日：2009-11-05
申请号：US12431367
申请日：2009-04-28
CPC classification number: G03F7/70916 , G03F7/70033 , G03F7/70058
Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
Abstract translation: 辐射源被配置成产生极紫外辐射。 辐射源包括位于燃料被辐射束接触以形成等离子体的位置处的等离子体形成位置，构造和布置成收集在等离子体形成部位处形成的极紫外辐射并形成极紫外辐射的收集器 光束和污染屏障。 污染屏障包括至少部分地位于等离子体形成位置和集电器之间的多个箔，以及可操作地连接到多个箔的可旋转底座。 可旋转底座构造成允许辐射束通过污染屏障到等离子体形成部位。
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37.发明申请Method for removal of a deposition from an optical element, lithographic apparatus, and method for manufacturing a device 审中-公开从光学元件去除沉积物的方法，光刻设备以及用于制造器件的方法公开(公告)号：US20090025750A1
公开(公告)日：2009-01-29
申请号：US11878436
申请日：2007-07-24
CPC classification number: G03F7/70925 , B08B7/00 , G03F7/70916
Abstract: A method of removing a deposition from an optical element of an apparatus. The method includes providing a hydrogen comprising gas in at least a part of the apparatus, providing nitrogen radicals in the part of the apparatus for generating hydrogen radicals from the hydrogen comprising gas, and contacting the optical element with at least part of the hydrogen radicals to removal the deposition.
Abstract translation: 一种从装置的光学元件去除沉积物的方法。 该方法包括在装置的至少一部分中提供包含气体的氢气，在装置的部分中提供氮自由基，用于从含氢气体产生氢自由基，并将光学元件与至少部分氢原子接触， 去除沉积物。
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公开(公告)号：US20090021705A1
公开(公告)日：2009-01-22
申请号：US11826525
申请日：2007-07-16
IPC: G03B27/52
CPC classification number: G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70883 , G03F7/70983
Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.
Abstract translation: 防碎系统被构造和布置成防止从辐射源发出的碎屑通过来自辐射源的辐射传播到光刻设备内或在光刻设备内。 碎片防止系统包括限定来自辐射源的辐射的最大发射角的孔，以及具有辐射透射率的第一碎片屏障。 第一个碎片障碍物包括一个可旋转的箔片陷阱。 碎片防止系统还包括具有辐射透射率的第二碎片屏障。 第一碎片屏障配置成覆盖发射角的一部分，并且第二碎片屏障构造为覆盖发射角的另一部分。
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39.发明申请公开(公告)号：US20090001288A1
公开(公告)日：2009-01-01
申请号：US11819707
申请日：2007-06-28
Applicant: Edwin Johan Buis , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
Inventor： Edwin Johan Buis , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer
IPC: G03F7/20
CPC classification number: G03F7/70916
Abstract: A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
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40.发明申请公开(公告)号：US20080291406A1
公开(公告)日：2008-11-27
申请号：US11802258
申请日：2007-05-21
IPC: G03B27/42
CPC classification number: G03B27/42 , G03F7/70175 , G03F7/70916
Abstract: An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.
Abstract translation: 公开了一种包括辐射反射器和污染物屏障的组件。 污染物屏障布置成接收来自辐射源的辐射并将该辐射反射到辐射反射器，并且辐射反射器布置成将从污染物屏障接收的辐射反射回污染物屏障。
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