公开(公告)号：US20200164401A1

公开(公告)日：2020-05-28

申请号：US16635331

申请日：2018-07-24

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： James N. Dobbs ,  Karl K. Stensvad ,  Eric A. Vandre ,  Daniel H. Carlson ,  Ranjith Divigalpitiya ,  Gerrard A. S. Marra ,  Saurabh Batra ,  Satinder K. Nayar ,  Verlin W. Schelhaas ,  Chrispian E. Shelton ,  Samad Javid

IPC: B05C19/04 ,  B05C1/12 ,  B05D1/28 ,  B05C5/02 ,  B05C1/08

Abstract: A powder-rubbing apparatus comprises: a rotatable rubbing roll having a rotational axis; a substrate path; an oscillating mechanism for oscillating the rotatable rubbing roll along the rotational axis; and a powder coating die comprising an inlet port in fluid communication with an outlet port disposed adjacent to the substrate path. The substrate frictionally contacts the rotatable rubbing roll within a rubbing zone. A dispenser for dispensing gas-borne powder is in fluid communication with the inlet port of the powder coating die. The dispenser is aligned such that at least a portion of a gas-borne powder dispensed from the powder coating die is deposited directly onto at least one of the rotatable rubbing roll or the substrate and conveyed into the rubbing zone. A method of using the powder-rubbing apparatus and a powder-rubbed web preparable thereby are also disclosed.

公开(公告)号：US20190112711A1

公开(公告)日：2019-04-18

申请号：US16090516

申请日：2017-03-24

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： Christopher S. Lyons ,  Bill H. Dodge ,  Joseph C. Spagnola ,  Glen A. Jerry ,  Ameeta R. Goyal ,  Ronald P. Swanson ,  James N. Dobbs

IPC: C23C16/54 ,  C23C16/455 ,  C23C16/02

Abstract: A method is provided. The method may include engaging a first edge region on a first surface of a substrate with a first support roller; engaging a second edge region on the first surface of the substrate with a second support roller; transporting the substrate over the first and the second support rollers; repeating the following sequence of steps to form a thin film on the substrate: (a) exposing the substrate to a first precursor; (b) supplying a reactive species to the substrate after exposing the substrate to the first precursor; and depositing a vapor on the thin film to form a coating on the thin film.