公开(公告)号：US20220221788A1

公开(公告)日：2022-07-14

申请号：US17227065

申请日：2021-04-09

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Jinxin FU

IPC: G03F7/00 ,  G02B27/01 ,  G02B6/124 ,  G02B6/136

Abstract: Embodiments described herein provide for methods of forming optical device structures having continuously increasing or decreasing duty cycles. One embodiment includes a device. The device includes a plurality of optical device structures. Each optical device structure of the plurality of optical device structures includes a plurality of discrete zones. Each discrete zone of the plurality of discrete zones has a critical dimension. The device further includes a plurality of transition zones disposed between two discrete zones of the plurality of discrete zones. The critical dimension of each transition zone of the plurality of transition zones continuously increases or decreases across a length of each optical device structure of the plurality of optical device structures.

公开(公告)号：US20220164972A1

公开(公告)日：2022-05-26

申请号：US17534167

申请日：2021-11-23

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yangyang SUN ,  Ludovic GODET

IPC: G06T7/521 ,  G06T1/00

Abstract: Embodiments herein provide for a method of determining an optical device modulation transfer function (MTF). The method described herein includes projecting a baseline image of a pattern from a light engine to a detector. The baseline image is analyzed to determine a baseline function. A baseline fast Fourier transform (FFT) or a baseline MTF of the baseline function is obtained. The method further includes projecting an image of the pattern from the light engine to one or more optical devices. The pattern is outcoupled from the one or more optical devices to the detector. The image is analyzed to determine a function. A function FFT or a function MTF is obtained corresponding to the image. An optical device MTF of the one or more optical devices is determined by comparing the baseline FFT and the function FFT determined by analyzing the image or by comparing the baseline MTF and the function MTF determined by analyzing the image.

公开(公告)号：US20220163423A1

公开(公告)日：2022-05-26

申请号：US17456240

申请日：2021-11-23

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G02B27/30 ,  G02B19/00 ,  H04N5/225 ,  G06T7/00

Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

公开(公告)号：US20220122241A1

公开(公告)日：2022-04-21

申请号：US17492958

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G06T7/00 ,  G02B26/10 ,  G02B26/08 ,  G01B11/26 ,  H04N5/247 ,  H04N5/225 ,  H04N5/235 ,  G06T7/90 ,  G06T7/80

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or more second metrics including a display leakage metric.

公开(公告)号：US20220121030A1

公开(公告)日：2022-04-21

申请号：US17492826

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G02B27/01 ,  G01J1/42

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.

公开(公告)号：US20220120700A1

公开(公告)日：2022-04-21

申请号：US17492857

申请日：2021-10-04

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01N21/958

Abstract: Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.

公开(公告)号：US20200270746A1

公开(公告)日：2020-08-27

申请号：US16395005

申请日：2019-04-25

Applicant: Applied Materials, Inc.

Inventor： Tapashree ROY ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Ludovic GODET ,  Jinxin FU

IPC: C23C16/02 ,  C23C16/40

Abstract: A method and apparatus for creating a flat optical structure is disclosed. The method includes etching at least one trench in a substrate, placing a dielectric material in at least one trench in the substrate and encapsulating the top of the substrate with a film.

公开(公告)号：US20190256967A1

公开(公告)日：2019-08-22

申请号：US16258766

申请日：2019-01-28

Applicant: Applied Materials, Inc.

Inventor： Karl ARMSTRONG ,  Jinxin FU

IPC: C23C14/08 ,  C23C14/34 ,  C23C14/58

Abstract: Embodiments described herein provide methods of forming amorphous or nano-crystalline ceramic films. The methods include depositing a ceramic layer on a substrate using a physical vapor deposition (PVD) process, discontinuing the PVD process when the ceramic layer has a predetermined layer thickness, sputter etching the ceramic layer for a predetermined period of time, and repeating the depositing the ceramic layer using the PVD process, the discontinuing the PVD process, and the sputter etching the ceramic layer until a ceramic film with a predetermined film thickness is formed.

公开(公告)号：US20250068087A1

公开(公告)日：2025-02-27

申请号：US18803041

申请日：2024-08-13

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Sihui HE

IPC: G03F7/00

Abstract: Embodiments of the present disclosure generally relate to metrology systems and metrology methods to measure waveguides for image quality standards. In at least one embodiment, an optical device metrology system includes a stage, a body, and a light engine positioned within the body and mounted above the stage. The light engine includes, a light source, a fold mirror angled relative to the light source, the fold mirror is configured to turn a light beam toward the stage, one or more lenses or arrays positioned between the fold mirror and the stage, and a projection lens positioned between the one or more lenses or arrays and the stage. The system further includes, a first detector positioned within the body and mounted above the stage adjacent to the light engine configured to receive the projected light beam projected upwardly from the stage.

公开(公告)号：US20240385075A1

公开(公告)日：2024-11-21

申请号：US18667513

申请日：2024-05-17

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Kazuya DAITO ,  Ludovic GODET

IPC: G01M11/02 ,  G02B19/00 ,  G02B27/30 ,  G06T7/00 ,  H04N23/56

Abstract: Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.