公开(公告)号：US20150064374A1

公开(公告)日：2015-03-05

申请号：US14471830

申请日：2014-08-28

Applicant: CORNING INCORPORATED

Inventor： Anurag Jain ,  Michael M. Laurin ,  Christianus Johannes Jacobus Maas ,  Michael John Moore ,  Charlie W. Wood

IPC: B32B17/10 ,  B32B37/18

CPC classification number: B32B17/10036 ,  B32B17/10018 ,  B32B17/10091 ,  B32B17/10119 ,  B32B17/10137 ,  B32B17/10678 ,  B32B17/10752 ,  B32B17/10761 ,  B32B17/1077 ,  B32B17/10779 ,  B32B17/10788 ,  B32B17/10798 ,  B32B37/18 ,  B32B2367/00 ,  B32B2369/00 ,  B32B2383/00 ,  E06B3/66 ,  Y10T156/10 ,  Y10T428/24868 ,  Y10T428/24926 ,  Y10T428/2495 ,  Y10T428/24967 ,  Y10T428/31507 ,  Y10T428/31663 ,  B32B17/10

Abstract: A laminate structure having a first chemically strengthened glass layer, a second chemically strengthened glass layer, and a polymer interlayer structure intermediate the first and second glass layers. The polymer interlayer structure can include a first polymeric layer adjacent to the first glass layer, a second polymeric layer adjacent to the second glass layer, and a polymeric rigid core intermediate the first and second polymeric layers.

Abstract translation: 一种具有第一化学强化玻璃层，第二化学强化玻璃层和在第一和第二玻璃层之间中间的聚合物夹层结构的层压结构。 聚合物夹层结构可以包括与第一玻璃层相邻的第一聚合物层，与第二玻璃层相邻的第二聚合物层和在第一和第二聚合物层之间的聚合物刚性核心。

公开(公告)号：US20130331006A1

公开(公告)日：2013-12-12

申请号：US13965820

申请日：2013-08-13

Applicant: CORNING INCORPORATED

Inventor： Gregory Eisenstock ,  Anurag Jain

IPC: B24B37/04

CPC classification number: B24B37/042 ,  B24B37/20 ,  B24B37/30 ,  B24B41/047 ,  H01L21/02024

Abstract: Methods and apparatus provide for a conformable polishing head for uniformly polishing a workpiece. The polishing head includes an elastic polishing pad mounted on an elastic membrane that seals a cavity in the polishing head. The cavity is pressurized to expand the membrane and press the polishing pad down on the top surface of the workpiece, such that the polishing pad conforms to the surface and applies a substantially uniform pressure distribution across the workpiece and thereby uniformly removes material across high and low spots on the workpiece.

Abstract translation: 方法和装置提供了用于均匀抛光工件的一致的抛光头。 抛光头包括安装在弹性膜上的弹性抛光垫，其密封抛光头中的空腔。 空腔被加压以膨胀膜并将抛光垫向下压在工件的顶部表面上，使得抛光垫符合表面并且在整个工件上施加基本均匀的压力分布，从而均匀地去除高低的材料 工件上的斑点。