公开(公告)号：US07848031B2

公开(公告)日：2010-12-07

申请号：US11795598

申请日：2006-01-20

Applicant: Jochen Hetzler ,  Susanne Beder ,  Heiko Feldmann

Inventor： Jochen Hetzler ,  Susanne Beder ,  Heiko Feldmann

IPC: G02B3/02

CPC classification number: G01B9/021 ,  G01B9/02039 ,  G01B11/2441

Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

Abstract translation: 一种制造光学元件（5）的方法包括使用将测量光（23a）引导到光学表面上的干涉仪1a来测试光学元件的光学表面（3），其中测量光穿过两个连续的全息图（44,48） 设置在光学表面上游的测量光束的光束路径中。

公开(公告)号：US20100290024A1

公开(公告)日：2010-11-18

申请号：US12836176

申请日：2010-07-14

Applicant: Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

Inventor： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC: G03B27/32

CPC classification number: G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

Abstract: The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract translation: 本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配有第一操纵器 （ml，Mn），用于使透镜主动变形，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜在 除了第一个镜头。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US07800732B2

公开(公告)日：2010-09-21

申请号：US12643637

申请日：2009-12-21

Applicant: Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

Inventor： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC classification number: G03F7/70333 ,  G03F9/7026

Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

Abstract translation: 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

公开(公告)号：US20100201959A1

公开(公告)日：2010-08-12

申请号：US12723496

申请日：2010-03-12

Applicant: Helmut Beierl ,  Heiko Feldmann ,  Jochen Hetzler ,  Michael Totzeck

Inventor： Helmut Beierl ,  Heiko Feldmann ,  Jochen Hetzler ,  Michael Totzeck

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G02B1/02 ,  G02B21/33 ,  G03F7/70941

Abstract: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.

Abstract translation: 用于微光刻的投影物镜包括至少一个具有设置在物平面和像平面之间的光学元件的光学组件。 光学组件包括靠近图像平面设置的至少一个光学终端元件。 第一浸没液体设置在光学终端元件的图像取向表面上。 第二浸没液体设置在光学终端元件的物体取向表面上。 面向对象的表面包括用于成像光进入端子元件的第一表面部分，并且图像取向表面包括用于成像光从终端元件退出的第二表面部分。

公开(公告)号：US20100157266A1

公开(公告)日：2010-06-24

申请号：US12643637

申请日：2009-12-21

Applicant: Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

Inventor： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

IPC: G03B27/42

CPC classification number: G03F7/70333 ,  G03F9/7026

Abstract: A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

Abstract translation: 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

公开(公告)号：US20100128240A1

公开(公告)日：2010-05-27

申请号：US12621239

申请日：2009-11-18

Applicant: Alexander Epple ,  Heiko Feldmann ,  Hans-Juergen Rostalski

Inventor： Alexander Epple ,  Heiko Feldmann ,  Hans-Juergen Rostalski

IPC: G02B17/08 ,  G02B3/00 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70216 ,  G02B13/143 ,  G02B13/146 ,  G02B17/08 ,  G02B17/0892 ,  G02B27/0012 ,  G02B27/0025 ,  G03B27/54 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70375 ,  G03F7/706

Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ, includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation  ∑ i = 1 N  Δ   n i  ( s i - d i )  λ 0  NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

Abstract translation: 具有多个光学元件的目标，该多个光学元件布置成将物体的物体表面中的物体的图案成像到图像侧数值孔径NA> 0.8的物镜的图像表面区域中的图像场，其中电磁辐射来自 围绕波长λ的波长带包括数目N的度数光学元件，每个折射光学元件i由具有归一化光学色散＆Dgr; ni = ni（λ0）-ni（λ0+1μm）的透明材料制成，用于 从波长λ0的1 pm的波长变化。 目标满足关系Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。

公开(公告)号：US07697211B2

公开(公告)日：2010-04-13

申请号：US12257156

申请日：2008-10-23

Applicant: David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

Inventor： David R. Shafer ,  Aurelian Dodoc ,  Johannes Zellner ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Holger Walter ,  Ulrich Loering ,  Daniel Kraehmer ,  Gerhard Fuerter

IPC: G02B27/30

CPC classification number: G02B13/143 ,  G02B13/26 ,  G03F7/70241

Abstract: The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

Abstract translation: 本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台 。 在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。 用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位 到所述透镜系统的光轴。

公开(公告)号：US20090073398A1

公开(公告)日：2009-03-19

申请号：US12210514

申请日：2008-09-15

Applicant: Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

Inventor： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

IPC: G03B27/52 ,  G03B27/72

CPC classification number: G03F7/70308 ,  G03F7/70216 ,  G03F7/70566

Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

Abstract translation: 本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。 微光刻投影曝光装置包括照明系统和投影物镜。 照明系统可以照亮布置在投影物镜的物平面中的掩模。 掩模可以具有待成像的结构。 该方法可以包括用光照射照明系统的光瞳平面。 该方法还可以包括在投影物镜的平面中修改通过该平面的光的相位，幅度和/或极化。 可以以相互不同的方式对至少两个衍射级进行修改。 与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

公开(公告)号：US20080310029A1

公开(公告)日：2008-12-18

申请号：US11915191

申请日：2006-05-24

Applicant: Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

Inventor： Olaf Conradi ,  Heiko Feldmann ,  Gerald Richter ,  Sascha Bleidistel ,  Andreas Frommeyer ,  Toralf Gruner ,  Wolfgang Hummel

IPC: G02B17/08 ,  G02B27/18

CPC classification number: G02B27/0068 ,  G02B3/0081 ,  G02B26/0825 ,  G03F7/7015 ,  G03F7/70266 ,  G03F7/70558 ,  Y10S359/90

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract translation: 本发明涉及一种用于改善微光刻投影物镜（50）的成像特性的方法，其中投影物镜在物体之间具有多个透镜（L1，L2，L3，L4，L5，L6，L7，L8） 平面和图像平面，多个透镜的第一透镜被分配用于主动变形透镜的第一操纵器（ml，Mn），第一透镜被变形以至少部分地校正像差，至少一个第二透镜 多个透镜还被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。 此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

公开(公告)号：US20080273248A1

公开(公告)日：2008-11-06

申请号：US11420103

申请日：2006-05-24

Applicant: Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

Inventor： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

IPC: G02B3/12

CPC classification number: G02B13/143 ,  G03F7/70341

Abstract: The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

Abstract translation: 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。