公开(公告)号：US07524609B2

公开(公告)日：2009-04-28

申请号：US11716054

申请日：2007-03-09

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03F7/004 ,  G03F7/30 ,  C07C69/62 ,  C07C309/29

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122

Abstract: A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: Z—A—X—B—R—(Y)n  (I) wherein Z represents an organic acid group; A represents a divalent linking group; X represents a divalent linking group having a hetero atom; B represents an oxygen atom or —N(Rx)—; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted with Y, and when B represents —N(Rx)—, R and Rx may be bonded to each other to form a cyclic structure; Y represents —COOH or —CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and n represents an integer of from 1 to 3.

Abstract translation: 一种光敏组合物，其包含（A）在用光化射线或辐射照射时能够产生由式（I）表示的有机酸的化合物：<？在线公式描述=“在线式”末端=“铅 “？”ZAXBR-（Y）n（I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z表示有机酸基团; A表示二价连接基团; X表示具有杂原子的二价连接基团; B表示氧原子或-N（Rx） - ; Rx表示氢原子或一价有机基团; R表示被Y取代的一价有机基团，当B表示-N（Rx） - 时，R和Rx可以彼此键合形成环状结构; Y表示-COOH或-CHO，当存在多个Y时，多个Y可以相同或不同; n表示1〜3的整数。

公开(公告)号：US07341817B2

公开(公告)日：2008-03-11

申请号：US10993094

申请日：2004-11-22

Applicant: Kenji Wada ,  Kunihiko Kodama

Inventor： Kenji Wada ,  Kunihiko Kodama

IPC: G03F7/004 ,  G03F7/30

CPC classification number: C07C381/12 ,  C07C309/39 ,  C07C309/42 ,  C07C323/66 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122

Abstract: A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

Abstract translation: 一种光敏组合物，其包含能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 能够在用光化射线或辐射照射时能够产生特定磺酸的化合物; 以及使用光敏组合物的图案形成方法，其包含在用光化射线或辐射照射时能够产生特定磺酸的化合物。

公开(公告)号：US20080031799A1

公开(公告)日：2008-02-07

申请号：US11631312

申请日：2005-07-07

Applicant: Toshiaki Fukuyama ,  Kenji Wada

Inventor： Toshiaki Fukuyama ,  Kenji Wada

IPC: C01B33/037

CPC classification number: C01B33/037

Abstract: In order to provide silicon for solar batteries inexpensively by efficient refining and without lowering the refining rate, the present invention is directed to a method for refining molten silicon containing an impurity element. According to one aspect, the method includes the steps of: bringing a refine gas containing a component that reacts with the impurity element into contact with the molten silicone, thereby removing a product containing the impurity element from the molten silicon; and bringing a process gas, having small reactivity with the molten silicon, with the molten silicon, thereby removing a product generated by reaction of the molten silicon and the refine gas.

Abstract translation: 为了通过有效的精炼提供廉价的太阳能电池的硅并且不降低精炼速度，本发明涉及一种用于精炼含有杂质元素的熔融硅的方法。 根据一个方面，所述方法包括以下步骤：使含有与所述杂质元素反应的成分的精炼气体与所述熔融硅酮接触，从而从所述熔融硅除去含有所述杂质元素的物质; 并且将与熔融硅反应性小的工艺气体与熔融硅反应，从而除去由熔融硅与精炼气体反应产生的产物。

公开(公告)号：US20070141828A1

公开(公告)日：2007-06-21

申请号：US11707022

申请日：2007-02-16

Applicant: Tsuyoshi Shintate ,  Toshiaki Mikoshiba ,  Kenji Wada ,  Kazuaki Sakurada ,  Jun Yamada

Inventor： Tsuyoshi Shintate ,  Toshiaki Mikoshiba ,  Kenji Wada ,  Kazuaki Sakurada ,  Jun Yamada

IPC: H01L21/4763

CPC classification number: H05K3/4664 ,  H05K3/125 ,  H05K2203/013 ,  Y10S257/921

Abstract: There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.

公开(公告)号：US20070115326A1

公开(公告)日：2007-05-24

申请号：US11602187

申请日：2006-11-21

Applicant: Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

Inventor： Kazuhiro Yokoi ,  Ippei Nakamura ,  Kenji Wada

IPC: C08F2/50 ,  B41J2/14

CPC classification number: B41C1/1066 ,  C09D11/101 ,  C09D11/322

Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.

Abstract translation: 本发明提供油墨组合物，喷墨记录方法，印刷材料，平版印刷版的制造方法和平版印刷版。 本发明的油墨组合物含有阳离子聚合性化合物，用辐射线照射时产生酸的化合物，以及在用放射线照射时产生具有碱性氮原子的有机酸化合物的鎓盐化合物。

公开(公告)号：US20060166135A1

公开(公告)日：2006-07-27

申请号：US11335679

申请日：2006-01-20

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03C1/76

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0382

Abstract: A photosensitive composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the photosensitive composition, and a pattern forming method using the photosensitive composition, are provided, which are a photosensitive composition excellent in the sensitivity, resolution and pattern profile, assured of large exposure latitude and small pitch dependency, and improved in the sensitivity and dissolution contrast at the exposure with EUV light, a pattern forming method using the photosensitive composition, and a compound useful for the photosensitive composition.

Abstract translation: 用于半导体（例如IC）的制造中的光敏组合物，在液晶，热敏头等的电路基板的制造中或在其它光制造工艺中，用于感光组合物的化合物和图案 提供了使用感光性组合物的成膜方法，它们是灵敏度，分辨率和图案轮廓优异的感光组合物，确保了大的曝光宽容度和小的间距依赖性，并且在用EUV光曝光时提高了灵敏度和溶解度对比度， 使用该感光性组合物的图案形成方法和可用于感光性组合物的化合物。

公开(公告)号：US07074632B2

公开(公告)日：2006-07-11

申请号：US10759266

申请日：2004-01-20

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: H01L21/00

CPC classification number: H01L27/14683 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/48 ,  H01L24/73 ,  H01L27/14618 ,  H01L27/1462 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L27/14636 ,  H01L27/14687 ,  H01L31/0203 ,  H01L31/18 ,  H01L33/382 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01057 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/15312 ,  H01L2924/16195 ,  H01L2924/3025 ,  H01L2933/0016 ,  Y10S257/911 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/85399 ,  H01L2224/05599 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.

公开(公告)号：US20060040208A1

公开(公告)日：2006-02-23

申请号：US11206220

申请日：2005-08-18

Applicant: Shinji Tarutani ,  Hyou Takahashi ,  Kenji Wada

Inventor： Shinji Tarutani ,  Hyou Takahashi ,  Kenji Wada

IPC: G03C1/76

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392

Abstract: A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.

Abstract translation: 一种化学放大抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影剂中的溶解度的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有 氟原子和羟基，pKa值为4〜15，和（D）溶剂，以及使用其的图案形成方法。

公开(公告)号：US20050272244A1

公开(公告)日：2005-12-08

申请号：US11113097

申请日：2005-04-25

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: H01L21/288 ,  B41J2/01 ,  H01L21/20 ,  H01L21/3205 ,  H01L21/44 ,  H01L21/56 ,  H01L21/60 ,  H01L23/485 ,  H01L23/52

CPC classification number: H01L24/03 ,  H01L21/288 ,  H01L21/563 ,  H01L24/11 ,  H01L24/13 ,  H01L24/81 ,  H01L2224/03505 ,  H01L2224/0401 ,  H01L2224/1147 ,  H01L2224/13023 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2224/94 ,  H01L2924/0001 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/07811 ,  H01L2924/14 ,  H01L2924/3025 ,  H01L2224/11 ,  H01L2924/00

Abstract: The present invention aims to provide a mounting technology that prevents unnecessary consumption of materials. A method for manufacturing a circuit element includes the steps of: setting a semiconductor element on a stage so that a metal pad of the semiconductor element faces a head; changing positions of the head relative to the semiconductor element; dispensing a liquid conductive material from a nozzle so that the conductive material is coated on the metal pad when the nozzle reaches a position corresponding to the metal pad; and either activating or drying the coated conductive material in order to obtain a UBM layer on the metal pad.

Abstract translation: 本发明旨在提供一种防止不必要的材料消耗的安装技术。 一种制造电路元件的方法包括以下步骤：将半导体元件设置在台上，使得半导体元件的金属焊盘面向头部; 改变头部相对于半导体元件的位置; 从喷嘴分配液体导电材料，使得当喷嘴到达对应于金属垫的位置时，导电材料被涂覆在金属垫上; 并且激活或干燥涂覆的导电材料以便在金属垫上获得UBM层。

公开(公告)号：US20050139148A1

公开(公告)日：2005-06-30

申请号：US10503304

申请日：2003-02-03

Applicant: Hiroyasu Fujiwara ,  Ryotatsu Otsuka ,  Kenji Wada ,  Toshiaki Fukuyama

Inventor： Hiroyasu Fujiwara ,  Ryotatsu Otsuka ,  Kenji Wada ,  Toshiaki Fukuyama

IPC: C01B33/037 ,  C30B15/00 ,  C30B21/06 ,  C30B27/02 ,  C30B28/10 ,  C30B30/04

CPC classification number: C01B33/037

Abstract: Method capable of preparing silicon having purity of about 6N applied to a solar cell efficiently at a low cost. Raw silicon containing boron and a slag are melted and a shaft is rotated by a rotating/driving mechanism for stirring the molten silicon. The molten slag is dispersed in the molten silicon, thereby accelerating the boron removal reaction. It is further effective to use a slag containing at least 45 percent by mass of silicon oxide or to blow gas mixed with water vapor into the molten silicon for refining reaction.

Abstract translation: 能够以低成本高效率地制造纯度约为6N的硅的方法。 含有硼和渣的原料硅熔化，并通过用于搅拌熔融硅的旋转/驱动机构旋转轴。 熔融渣分散在熔融硅中，从而加速脱硼反应。 使用含有至少45质量％的氧化硅的炉渣或者将与水蒸气混合的气体吹入熔融硅中以进行精制反应是进一步有效的。