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    ELECTROCHEMICAL POLYMER PEN LITHOGRAPHY
    31.
    发明申请
    ELECTROCHEMICAL POLYMER PEN LITHOGRAPHY 有权

    公开(公告)号：US20220236641A1

    公开(公告)日：2022-07-28

    申请号：US17585316

    申请日：2022-01-26

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Rustin Golnabi ,  Eun Bi Oh ,  David Alan

    IPC: G03F7/00 ,  B29C33/38

    Abstract: Disclosed herein is a massively parallel patterning tool for the deposition of single metals or metal alloys with size and composition control. Methods of the disclosure use a hydrogel array of pyramidal pen tips as a medium for localized electrodeposition, in conjunction with a scanning probe lithography platform and a three-electrode cell. This versatile technique can be used for high-throughput 3D printing, biomolecule patterning, or screening of catalyst nanoparticles or thin films.

    POLYMER-ASSISTED SYNTHESIS OF NANOPARTICLES
    34.
    发明申请
    POLYMER-ASSISTED SYNTHESIS OF NANOPARTICLES 审中-公开

    公开(公告)号：US20200310248A1

    公开(公告)日：2020-10-01

    申请号：US16832453

    申请日：2020-03-27

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Pengcheng Chen ,  Yuan Liu ,  Jingshan Du

    IPC: G03F7/00 ,  C09D11/102 ,  C08K5/56 ,  C08G65/48

    Abstract: A method of preparing a metal nanoparticle can include depositing an ink on a substrate using nanolithography to form a polymer reactor, wherein the ink comprises at least one metalloporphyrin functionalized polymer comprising a metal ion, porphyrin, and a polyethylene oxide polymer; and thermally annealing the polymer nanoreactor under conditions sufficient to form the nanoparticle. The thermal annealing can include a first stage that includes annealing the polymer nanoreactor at a temperature of about 100° C. to about 350° C. for a time sufficient to aggregate the metal ions in the polymer reactor, and a second stage that includes annealing the aggregated polymer nanoreactor at a temperature of about 500° C. to about 600° C. for a time sufficient to reduce the metal ion and decompose a polymer component of the polymer nanoreactor to thereby form the metal nanoparticle.

    Polymer pen lithography
    36.
    发明授权
    Polymer pen lithography 有权

    公开(公告)号：US10474029B2

    公开(公告)日：2019-11-12

    申请号：US16257143

    申请日：2019-01-25

    Applicant: NORTHWESTERN UNIVERSITY

    Inventor： Chad A. Mirkin ,  Fengwei Huo ,  Zijian Zheng ,  Gengfeng Zheng

    IPC: G03F7/00 ,  B82Y40/00 ,  B82Y10/00 ,  B82Y30/00

    Abstract: The disclosure relates to methods of printing indicia on a substrate using a tip array comprised of elastomeric, compressible polymers. The tip array can be prepared using conventional photolithographic methods and can be tailored to have any desired number and/or arrangement of tips. Numerous copies (e.g., greater than 15,000, or greater than 11 million) of a pattern can be made in a parallel fashion in as little as 40 minutes.

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