Far-field scanning apparatus and method for rapid measurement of light source characteristics with high dynamic range
    31.
    发明授权
    Far-field scanning apparatus and method for rapid measurement of light source characteristics with high dynamic range 失效
    用于快速测量高动态范围光源特性的远场扫描装置和方法

    公开(公告)号:US06788398B1

    公开(公告)日:2004-09-07

    申请号:US09699253

    申请日:2000-10-27

    Abstract: A method and apparatus for rapid measurements of far-field radiation profiles having a large dynamic range from an optical source is disclosed. Some embodiments of the apparatus include a collector coupled to a rotating hub so that the rotation of an entrance to the collector defines a plane, a detector coupled to receive light captured at the entrance to the collector, and detector electronics having a programmable gain coupled to receive a signal from the detector, Some embodiments may include a rotatable entrance mirror for reflecting light from the optical source into the plane of the entrance of the collector. In some embodiments, the optical source is fixed relative to the plane of the entrance of the collector. In some embodiments, the optical source is rotatable in the plane defined by the entrance of the collector. In some embodiments, the source can be an optical fiber. In some embodiments, the source can be a material irradiated by a laser. In order to obtain a large dynamic range, far-field data from the optical source is taken at a number of gain settings of the detector electronics and a compiled far-field radiation profile is constructed. Characterizing parameters for the optical source, such as fiber parameters for an optical fiber, can be calculated based on the compiled far-field radiation profile.

    Abstract translation: 公开了一种用于快速测量具有来自光源的大动态范围的远场辐射分布的方法和装置。 该装置的一些实施例包括耦合到旋转毂的收集器,使得入射到收集器的旋转限定了一个平面,耦合到接收在集电极的入口处捕获的光的检测器,以及耦合到 接收来自检测器的信号。一些实施例可以包括可旋转的入射镜,用于将来自光源的光反射到收集器入口的平面内。 在一些实施例中,光源相对于收集器入口的平面是固定的。 在一些实施例中,光源可在由收集器的入口限定的平面内旋转。 在一些实施例中,源可以是光纤。 在一些实施例中,源可以是由激光照射的材料。 为了获得大的动态范围,在检测器电子设备的多个增益设置下获取来自光源的远场数据,并且构建了编译的远场辐射轮廓。 可以基于编译的远场辐射轮廓来计算光源的特征参数,例如光纤的光纤参数。

    Technique for measuring modal power distribution between an optical source and a multimode fiber
    32.
    发明授权
    Technique for measuring modal power distribution between an optical source and a multimode fiber 有权
    用于测量光源和多模光纤之间的模态功率分布的技术

    公开(公告)号:US06788397B1

    公开(公告)日:2004-09-07

    申请号:US09514137

    申请日:2000-02-28

    CPC classification number: G01M11/33

    Abstract: A technique for measuring the modal power distribution of an optical source (for example, a laser) launching pulses into a multimode fiber involves a characterization of the multimode fiber itself in terms of its differential modal delay. A reverse differential mode delay measurement is then performed to characterize the interaction of the optical source with the multimode fiber. By knowing these characteristics, the modal power distribution of the source into the fiber can then be determined by using a reconstruction algorithm.

    Abstract translation: 用于测量光源(例如,激光器)向多模光纤发射脉冲的模态功率分布的技术涉及多模光纤本身的差分模态延迟的表征。 然后执行反向差分模式延迟测量以表征光源与多模光纤的相互作用。 通过了解这些特性,可以通过使用重建算法来确定源到光纤中的模态功率分布。

    Optical bit rate detector
    33.
    发明授权
    Optical bit rate detector 有权
    光比特率检测器

    公开(公告)号:US06765665B2

    公开(公告)日:2004-07-20

    申请号:US10274804

    申请日:2002-10-21

    CPC classification number: H04B10/0795 G01J1/18

    Abstract: The invention relates to a simple and relatively inexpensive way of determining the optical bit rate of an optical signal, which is based on the fact that different percentages of the signal will be transmitted through a narrow-band optical filter depending on the bit rate. Increasing the bit rate of an optical signal results in a broadening of the channel spectrum, therefore, if the optical filter is designed with a passband thinner than all (or all but one) of the channel widths, then signals with different bit rates will have distinctive amounts of transmitted light relative to the amount of input light. In the preferred embodiment the optical signal is divided into two sub-beams by a beam splitter, and one of the sub-beams is passed through the optical filter. The power of filtered sub-beam is compared to the power of the unfiltered sub-beam to provide a ratio, which is compared to one or more predetermined values indicative of the bit rate. The optical filter is preferably a Fabry-Perot etalon with a periodic response tuned to the ITU grid.

    Abstract translation: 本发明涉及一种确定光信号的光比特率的简单且相对便宜的方法,其基于根据比特率将信号的不同百分比通过窄带滤光器传输的事实。 增加光信号的比特率导致信道频谱的扩大,因此,如果光滤波器被设计成具有比通道宽度的全部(或全部除外)通道更薄的通带),则具有不同比特率的信号将具有 相对于输入光量的透射光的特征量。 在优选实施例中,光信号由分束器分成两个子光束,其中一个子光束通过滤光器。 将滤波后的子波束的功率与未滤波的子波束的功率进行比较,以提供与指示比特率的一个或多个预定值进行比较的比率。 光滤波器优选地是法布里 - 珀罗标准具,具有调谐到国际电联电网的周期性响应。

    Method and apparatus for elimination of high energy ion from EUV radiating device
    34.
    发明授权
    Method and apparatus for elimination of high energy ion from EUV radiating device 有权
    从EUV辐射装置中消除高能离子的方法和装置

    公开(公告)号:US06724004B2

    公开(公告)日:2004-04-20

    申请号:US10279854

    申请日:2002-10-25

    Inventor: Hidehiko Yashiro

    CPC classification number: H05G2/001 B82Y10/00 G03F7/70033 G03F7/70916

    Abstract: A method for the elimination of high-energy ion in an EUV light-radiating device includes irradiating a first target with a first exciting laser to produce a laser-produced plasma EUV light source and causing a high-energy ion generated simultaneously with EUV light to collide against plasma produced by irradiating a second target with a second laser to separate the high-energy ion from the orbit of the EUV light. An apparatus for the elimination of a high-energy ion in an EUV light-radiating device includes a device for irradiating a first target with a first exciting laser to produce a plasma EUV light source and induce emission of EUV light, a device for irradiating a second target with a second laser to produce plasma, and a device for causing a high-energy ion generated simultaneously with the EUV light to be delayed by difference between an ion flight time and plasma expansion time for ion elimination and collide against the plasma to separate the high-energy ion from the orbit of the EUV light.

    Abstract translation: 一种在EUV光辐射装置中消除高能离子的方法包括用第一激光激光器照射第一靶,以产生激光产生的等离子体EUV光源,并使与EUV光同时产生的高能离子 与通过用第二激光器照射第二靶标而产生的等离子体相撞,以将高能离子与EUV光的轨道分离。 用于消除EUV光辐射装置中的高能离子的装置包括用于用第一激光激光器照射第一靶的装置,以产生等离子体EUV光源并诱发EUV光的发射,用于照射 用第二激光器产生等离子体的第二靶,以及用于使与EUV光同时产生的高能离子的装置由离子飞行时间和离子消除的等离子体膨胀时间之间的差异延迟,并与等离子体碰撞以分离 来自EUV光源轨道的高能离子。

    Arrangement for determining the position of a light source
    35.
    发明授权
    Arrangement for determining the position of a light source 失效
    用于确定光源的位置的布置

    公开(公告)号:US06717662B2

    公开(公告)日:2004-04-06

    申请号:US09983094

    申请日:2001-10-23

    CPC classification number: G01S3/784 G01J1/0266 G01S3/781

    Abstract: An arrangement for determining the position of a light source includes a light-sensitive detector device and an arrangement for casting a shadow onto part of the light of the light source shining onto the detector device. The shadowing arrangement is formed by at least one rotationally symmetrical body.

    Abstract translation: 用于确定光源的位置的装置包括光敏检测器装置和用于将光照射到检测器装置上的光源的一部分上投射阴影的装置。 阴影布置由至少一个旋转对称的主体形成。

    System for monitoring and testing of light sources
    36.
    发明授权
    System for monitoring and testing of light sources 有权
    光源监测和测试系统

    公开(公告)号:US06717660B1

    公开(公告)日:2004-04-06

    申请号:US09629352

    申请日:2000-08-01

    CPC classification number: H05B37/034

    Abstract: A light monitoring system provides a sensing unit coupled to a luminaire. The sensing unit monitors both the input and the output of the luminaire for both current and voltage. In this manner, a variety of problems with the luminaire can be detected by the sensor and this information can be passed to monitoring equipment that is either hard-wired or remotely coupled to the sensing unit.

    Abstract translation: 光监测系统提供耦合到照明器的感测单元。 感测单元监视电流和电压两者的输入和输出。 以这种方式,可以通过传感器检测到照明器的各种问题,并且该信息可以被传递到硬接线或远程耦合到感测单元的监视设备。

    Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method
    37.
    发明授权
    Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method 失效
    波面像差测量装置,波面像差测量方法以及通过该装置和方法制造的投影透镜

    公开(公告)号:US06693704B1

    公开(公告)日:2004-02-17

    申请号:US09670013

    申请日:2000-09-26

    CPC classification number: G01M11/0257 G01J9/00 G01M11/0285 G03F7/706

    Abstract: A method and apparatus for measuring a wave front aberration of a projection lens with high precision and a related calibration method. The apparatus includes: either a light source and an element producing a first point source in combination with the light source or a first point source generating part; a magnifying projection optical system projecting and magnifying a point image of the first point source projected by a test object; a detector detecting the magnified point image projected and magnified by the magnifying projection optical system; a supporting member supporting the magnifying projection optical system and the detector; a calculating part calculating a wave front aberration; and either a second point source producing element or a second point source generating part.

    Abstract translation: 用于以高精度测量投影透镜的波前像差的方法和装置以及相关的校准方法。 该装置包括:光源和产生与光源或第一点源产生部分组合的第一点光源的元件; 放大投影光学系统,投影并放大由被测对象投影的第一点源的点图像; 检测器,其检测由放大投影光学系统投影和放大的放大点图像; 支撑放大投影光学系统和检测器的支撑构件; 计算波前像差的计算部分; 以及第二点源产生元件或第二点源生成部件。

    Laser beam multimeter
    38.
    发明授权
    Laser beam multimeter 失效
    激光束万用表

    公开(公告)号:US06678042B2

    公开(公告)日:2004-01-13

    申请号:US10135572

    申请日:2002-05-01

    CPC classification number: G01J1/4257

    Abstract: The objective of the present invention is providing a method and a simple instrument that can be used on a routine basis to accurately and quickly measure the focus position, waist radius, divergence, quality, power and power density of a laser beam. The measurement is performed by scanning a thin film of a nonlinear optical material in the focal region along the propagation direction of the beam and registering the variation of the on-axis intensity of the laser beam by a photodetector.

    Abstract translation: 本发明的目的是提供一种可以常规使用的方法和简单的仪器,以准确和快速地测量激光束的焦点位置,腰围,发散度,质量,功率和功率密度。 通过沿着光束的传播方向扫描焦点区域中的非线性光学材料的薄膜并通过光电检测器记录激光束的轴上强度的变化来进行测量。

    High temperature EUV source nozzle
    39.
    发明授权

    公开(公告)号:US06657213B2

    公开(公告)日:2003-12-02

    申请号:US09848677

    申请日:2001-05-03

    CPC classification number: H05G2/003 H05G2/006

    Abstract: A nozzle (46) for a laser-plasma EUV radiation source that provides thermal isolation between the nozzle body (48) and the target material flowing therethrough. A target delivery tube (72) is provided that extends through the nozzle body (48). The delivery tube (72) has an expansion aperture (80) positioned behind an exit collimator (50) of the nozzle body (48). The delivery tube (72) is made of a low thermal conductivity material, such as stainless steel, and is in limited contact with the nozzle body (48) so that heating of the nozzle body (48) from the plasma does not heat the liquid target material being delivered through the delivery tube (72). The expansion aperture (80) has a smaller diameter than the exit collimator (50).

    Methods and apparatus for determining blur of an optical system

    公开(公告)号:US06654106B2

    公开(公告)日:2003-11-25

    申请号:US10037141

    申请日:2002-01-02

    Applicant: Koichi Kamijo

    Inventor: Koichi Kamijo

    CPC classification number: H01J37/263

    Abstract: Methods are disclosed for quantifying blur, of a beam of an optical medium, exhibited by an optical system through which the beam of the optical medium passes. An embodiment of the method includes the step of determining, in an image plane of the optical system, respective destination positions of a number (N) of rays of the optical medium originating according to a probability distribution from respective points in an object plane of the optical system. The destination positions are projected onto an axis in a direction, in the image plane, in which blur is to be quantified. Respective coordinates of each of the destination positions on the axis are determined and the determined coordinates are ranked. Blur is calculated from a profile of the ranked coordinates.

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