公开(公告)号：US20050102833A1

公开(公告)日：2005-05-19

申请号：US10715978

申请日：2003-11-17

Applicant: Thomas Hantschel ,  David Fork ,  Dirk De Bruyker ,  Chinnwen Shih ,  Jeng Lu ,  Christopher Chua ,  Raj Apte ,  Brent Krusor

Inventor： Thomas Hantschel ,  David Fork ,  Dirk De Bruyker ,  Chinnwen Shih ,  Jeng Lu ,  Christopher Chua ,  Raj Apte ,  Brent Krusor

IPC: G01R1/067 ,  G01R3/00 ,  H05K3/40 ,  H05K1/00

CPC classification number: G01R1/06744 ,  G01R1/06727 ,  G01R3/00 ,  H05K3/4092 ,  Y10T29/49204 ,  Y10T29/49208 ,  Y10T29/49218 ,  Y10T29/49222

Abstract: Spring structures are subjected to pre-release and post-release annealing to tune their tip height to match a specified target. Post-release annealing increases tip height, and pre-release annealing decreases tip height. The amount of tuning is related to the annealing temperature and/or time. Annealing schedules are determined for a pre-fabricated cache of unreleased spring structures such that finished spring structures having a variety of target heights can be economically produced by releasing/annealing the cache according to associated annealing schedules. Selective annealing is performed using lasers and heat absorbing/reflecting materials. Localized annealing is used to generate various spring structure shapes. Both stress-engineered and strain-engineered spring structures are tuned by annealing.

Abstract translation: 弹簧结构经受预释放和后释放退火以调节其尖端高度以匹配指定的靶。 后释放退火增加尖端高度，并且预释放退火使尖端高度降低。 调谐量与退火温度和/或时间有关。 对于未发布的弹簧结构的预制缓存来确定退火计划，使得可以通过根据相关联的退火计划释放/退火高速缓存来经济地产生具有各种目标高度的成品弹簧结构。 使用激光和吸热/反射材料进行选择性退火。 定位退火用于产生各种弹簧结构形状。 应力设计和应变工程弹簧结构都通过退火进行调整。

公开(公告)号：US20050006829A1

公开(公告)日：2005-01-13

申请号：US10615653

申请日：2003-07-08

Applicant: Eugene Chow ,  David Fork ,  Thomas Hantschel ,  Koenraad Van Schuylenbergh ,  Christopher Chua

Inventor： Eugene Chow ,  David Fork ,  Thomas Hantschel ,  Koenraad Van Schuylenbergh ,  Christopher Chua

IPC: F16F1/02 ,  H01L27/148 ,  F16F1/00 ,  F16F9/00 ,  H01L29/768

CPC classification number: F16F1/027

Abstract: Lithographically defined and etched spring structures are produced by various methods such that they avoid the formation of a plated metal wedge on an underside of the spring structure after release. A post is utilized to offset the spring from an underlying substrate by a distance greater than the thickness of the plated metal. A trench is etched into the substrate below the spring to provide clearance during deflection of the spring. Another spring includes a knee (bend) that provides the necessary clearance during deflection. A plating process is limited to the upper side of another spring. A released spring is used as a shadow mask for patterning resist that prevents wedge formation during plating. Various tip arrangements are disclosed that can be utilized with each spring structure

Abstract translation: 通过各种方法制造光刻定义和蚀刻的弹簧结构，使得它们在释放之后避免在弹簧结构的下侧上形成电镀金属楔。 使用柱子将弹簧从下面的衬底偏移大于电镀金属的厚度的距离。 在弹簧下方的衬底中蚀刻沟槽，以在弹簧偏转期间提供间隙。 另一个弹簧包括在偏转期间提供必要的间隙的膝盖（弯头）。 电镀工艺限于另一弹簧的上侧。 释放的弹簧用作用于图案化抗蚀剂的荫罩，其防止电镀期间的楔形成。 公开了可以与每个弹簧结构一起使用的各种尖端装置