Abstract:
A method for inter-processor communication in a mobile terminal is disclosed. The method of inter-processor communication for a mobile terminal having a first processor, a second processor, and a shared memory includes determining, by the first processor, the size of data to be sent to the second processor, comparing the determined size of the data with the size of one of multiple buffer areas in the shared memory to be used for transmission, rearranging the shared memory according to the data size when the size of the data is greater than the size of the buffer area to be used, and sending the data to the second processor through the rearranged shared memory. It is possible to increase data transfer rates between processors when inter-processor communication is performed through a shared memory in a mobile terminal having multiple processors.
Abstract:
A method of forming a polysilicon film includes: forming an amorphous silicon film on a substrate; adsorbing a metal catalyst on the amorphous silicon film, crystallizing the amorphous silicon film through heat treatment to form the polysilicon film, the polysilicon film including a grain internal region and a grain boundary where the metal catalyst remains, providing an etchant having different oxidation selectivities with respect to the grain internal region and the grain boundary, and etching a surface of the polysilicon film by the etchant to remove the metal catalyst remaining on the grain boundary.
Abstract:
A substrate including a thin film transistor, the substrate including an active layer disposed on the substrate, the active layer including a channel area and source and drain areas, a gate electrode disposed on the active layer, the channel area corresponding to the gate electrode, a gate insulating layer interposed between the active layer and the gate electrode, an interlayer insulating layer disposed to cover the active layer and the gate electrode, the interlayer insulating layer having first and second contact holes partially exposing the active layer, source and drain electrodes disposed on the interlayer insulating layer, the source and drain areas corresponding to the source and drain electrodes, and ohmic contact layers, the ohmic contact layers being interposed between the interlayer insulating layer and the source and drain electrodes, and contacting the source and drain areas through the first and second contact holes.
Abstract:
A thin film transistor includes: a substrate; a semiconductor layer disposed on the substrate, and including a channel region, source and drain regions, and edge regions having a first impurity formed at edges of the source and drain regions, and optionally, in the channel region; a gate insulating layer insulating the semiconductor layer; a gate electrode insulated from the semiconductor layer by the gate insulating layer; and source and drain electrodes electrically connected to the semiconductor layer.
Abstract:
An apparatus and a method of optimizing queries through scheduling User Defined Operators (UDOs) in a Data Stream Management System (DSMS), are provided. The apparatus includes a query optimizer configured to receive queries, each of the queries including the UDOs and data streams subject to respective operations of the UDOs, and group the data streams and UDOs into scheduling units, each of the scheduling units including one of the data streams and one of the UDOs. The apparatus further includes a scheduler configured to schedule an execution order in which the scheduling units are executed.
Abstract:
A thin film transistor and a method of fabricating the same include: a semiconductor layer having a grain boundary disposed in a crystal growth direction and having a variation in height of a top surface of 15 nm or less formed by a thin beam directional crystallization method. Also, an organic light emitting diode (OLED) display device comprising the thin film transistor is provided and has excellent characteristics fabricated by a simple process. Also, a flat panel display device and a method of fabricating the same are provided and include: a polycrystalline silicon layer in a pixel region; and a polycrystalline silicon layer in a peripheral region formed by the thin beam directional crystallization method. Also, a semiconductor device and a method of fabricating the same include: an intrinsic region of a semiconductor layer in the photodiode region formed by the thin beam directional crystallization method.
Abstract:
A method of manufacturing a thin film transistor (TFT), a TFT manufactured by the method, a method of manufacturing an organic light-emitting display apparatus that includes the TFT, a display including the TFT. By including a buffer layer below and an insulating layer above a silicon layer for the TFT, the silicon layer can be crystallized without being exposed to air, so that contamination can be prevented. Also, due to the overlying insulating layer, the silicon layer can be patterned without directly contacting photoresist. The result is a TFT with uniform and improved electrical characteristics, and an improved display apparatus.
Abstract:
A separated target apparatus includes a base plate; and a plurality of source units including a plurality of separated targets that are adhered on one surface of the base plate and that form a regular array, and a plurality of magnets that are adhered on the other surface of the base plate and that make a pair with the plurality of separated targets. The plurality of source units are arrayed in parallel at an angle between a first direction that is a direction of the regular array and a second direction that is perpendicular to the first direction. Sputtering is performed by using the separated target apparatus having the aforementioned structure.
Abstract:
A dual standby mode mobile terminal having a single smart card slot and communication mode control method thereof is provided for enabling the mobile terminal to operate in dual standby mode with a single smart card. A dual standby mode mobile terminal includes a first control unit for controlling a first communication mode, a second control unit for controlling a second communication mode, a removable dual mode smart card containing first and second communication mode data, and a buffer for loading the first and second communication mode data. A communication mode control method for the dual standby mode mobile terminal includes loading the first and second communication mode data in the buffer from the dual mode smart card under the control of the first control unit, detecting an event requiring communication mode data provided by the dual mode smart card, determining whether the communication data are any of the first and second communication mode data loaded in the buffer, and executing the event using the communication mode data loaded in the buffer. The dual standby mode mobile terminal and communication mode control method thereof enables the mobile terminal to stand by in two different communication modes (e.g. GSM and CDMA modes) with a single smart card.
Abstract:
A polycrystalline silicon layer, a flat panel display using the polycrystalline silicon layer, and a method of fabricating the same are provided. The polycrystalline silicon layer is formed by crystallizing a seed region of an amorphous silicon layer using a super grain silicon (SGS) crystallization technique. The crystallinity of the seed region spread into a crystallization region beyond the seed region. The crystallization region is formed into a semiconductor layer that can be incorporated to make a thin film transistor to drive flat panel displays. The semiconductor layer made by the method of the present invention provides uniform growth of grain boundaries, and characteristics of a thin film transistor made of the semiconductor layer are improved.