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    METHOD FOR PRODUCTION OF A LAYER HAVING NANOPARTICLES, ON A SUBSTRATE
    42.
    发明申请
    METHOD FOR PRODUCTION OF A LAYER HAVING NANOPARTICLES, ON A SUBSTRATE 有权
    在基材上生产纳米颗粒层的方法

    公开(公告)号：US20090047444A1

    公开(公告)日：2009-02-19

    申请号：US11994845

    申请日：2006-07-03

    Applicant: Rene Jabado ,  Ursus Kruger ,  Daniel Kortvelyessy ,  Volkmar Luthen ,  Ralph Reiche ,  Michael Rindler

    Inventor： Rene Jabado ,  Ursus Kruger ,  Daniel Kortvelyessy ,  Volkmar Luthen ,  Ralph Reiche ,  Michael Rindler

    IPC: B05D1/12 ,  B05C19/04 ,  B05B5/00

    CPC classification number: C23C24/00 ,  C23C26/00

    Abstract: The invention relates to a method for producing a layer (110) having nanoparticles (40), on a substrate (100). The invention is based on the object of specifying a method for producing a layer containing nanoparticles, which method can be carried out particularly easily and nevertheless offers a very wide degree of freedom for the configuration and the composition of the layer to be produced. According to the invention, this object is achieved in that nanoparticles (40) are released and a nanoparticle stream (50) is produced in a first process chamber (10), the nanoparticle stream (50) is passed into a second process chamber (80), and the nanoparticles (40) are deposited on the substrate (100) in the second process chamber (80).

    Abstract translation: 本发明涉及在衬底（100）上制备具有纳米颗粒（40）的层（110）的方法。 本发明是基于指定用于制造含有纳米颗粒的层的方法的目的，该方法可以特别容易地进行，并且对于要生产的层的构造和组成提供非常宽的自由度。 根据本发明，该目的是通过释放纳米颗粒（40）并在第一处理室（10）中产生纳米颗粒流（50），纳米颗粒流（50）进入第二处理室（80） ），并且纳米颗粒（40）沉积在第二处理室（80）中的基板（100）上。

    Method For Removing A Coating From A Component
    43.
    发明申请
    Method For Removing A Coating From A Component 审中-公开
    从组件中去除涂层的方法

    公开(公告)号：US20080277288A1

    公开(公告)日：2008-11-13

    申请号：US11630137

    申请日：2005-06-13

    Applicant: Ursus Kruger ,  Ralph Reiche ,  Raymond Ullrich ,  Gabriele Winkler

    Inventor： Ursus Kruger ,  Ralph Reiche ,  Raymond Ullrich ,  Gabriele Winkler

    IPC: C25F1/00

    CPC classification number: B08B3/12 ,  B08B3/08 ,  C23F1/26 ,  C23F1/44 ,  C23G1/106 ,  C25F5/00

    Abstract: Method for removing coatings which have been applied to components such as turbine blades. After the end of the product life cycle of the turbine blades has been reached, these coatings can be removed to reuse the turbine blades after recoating. The coating, containing in particular chromium oxide compounds is removed via a stripping bath by adding alkanolamine compounds or salts containing such compounds as the inhibitor. These compounds advantageously prevent new chromium oxide compounds from being produced during the stripping of the turbine blades or the chromium oxide compounds present in the coating are removed effectively, so that the chromium oxide compounds cannot have an adverse influence on the removal rate of the stripping process. Advantageously reduced treatment times can thereby be achieved for the stripping process. By adding 2% triethanolamine, the treatment time in hydrochloric acid for example can be reduced to below one hour.

    Abstract translation: 用于去除已经应用于诸如涡轮叶片的部件的涂层的方法。 在达到涡轮叶片的产品生命周期结束后，可以去除这些涂层，以便在重新涂覆之后重新使用涡轮叶片。 通过添加含有抑制剂的化合物的链烷醇胺化合物或盐，通过汽提浴除去含有特别是氧化铬化合物的涂层。 这些化合物有利地防止在汽提叶片期间产生新的氧化铬化合物，或者有效地除去存在于涂层中的氧化铬化合物，使得氧化铬化合物不会对汽提过程的去除速率产生不利影响 。 因此，有利地减少了处理时间，从而可以实现剥离过程。 通过加入2％三乙醇胺，例如在盐酸中的处理时间可以减少到低于1小时。

    Component comprising a masking layer
    45.
    发明申请
    Component comprising a masking layer 审中-公开
    组分包括掩蔽层

    公开(公告)号：US20070292719A1

    公开(公告)日：2007-12-20

    申请号：US11636682

    申请日：2006-12-08

    Applicant: Nigel-Philip Cox ,  Oliver Dernovsek ,  Ralph Reiche

    Inventor： Nigel-Philip Cox ,  Oliver Dernovsek ,  Ralph Reiche

    IPC: B32B9/00

    CPC classification number: C23C16/042 ,  C23C4/01 ,  C23C8/04 ,  C23C10/04 ,  Y10T428/25 ,  Y10T428/31504 ,  Y10T428/31536 ,  Y10T428/31663

    Abstract: Masking layers for components according to the prior art react with the base material of the component and/or are difficult to remove again. The component according to the invention has a masking layer which can very easily be removed following coating of the components, since on the one hand the bonding between the masking layer and the base material of the component is poor, or the masking layer can easily be removed through penetration of a liquid.

    Abstract translation: 根据现有技术的组件的掩模层与部件的基材反应和/或难以再次去除。 根据本发明的组件具有掩模层，其在涂覆组分之后可以非常容易地去除，因为一方面，组分的掩模层和基材之间的粘合性差，或掩蔽层可以容易地 通过渗透液体去除。

    Process for the Plasma Cleaning of a Component
    46.
    发明申请
    Process for the Plasma Cleaning of a Component 有权
    元件等离子体清洗工艺

    公开(公告)号：US20070215174A1

    公开(公告)日：2007-09-20

    申请号：US10591512

    申请日：2005-02-09

    Applicant: Ursus Kruger ,  Ralph Reiche ,  Jan Steinbach

    Inventor： Ursus Kruger ,  Ralph Reiche ,  Jan Steinbach

    IPC: B08B7/00

    CPC classification number: B08B7/00 ,  C23G5/00

    Abstract: Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning in the crack.

    Abstract translation: 通常难以清理裂纹，这通常会导致对组件其他区域的损坏进行清洁。 根据本发明，使用等离子体清洗方法，从而改变电极对部件的压力和/或分离，以便在裂纹中实现等离子体清洁。

    Method for removing a layer area of a component
    49.
    发明申请
    Method for removing a layer area of a component 审中-公开
    去除部件层面积的方法

    公开(公告)号：US20060231123A1

    公开(公告)日：2006-10-19

    申请号：US10531219

    申请日：2003-08-20

    Applicant: Nigel-Philip Cox ,  Uta Maier ,  Michael Ott ,  Ralph Reiche ,  Ronald Zimmer

    Inventor： Nigel-Philip Cox ,  Uta Maier ,  Michael Ott ,  Ralph Reiche ,  Ronald Zimmer

    IPC: B08B3/12 ,  B08B3/00

    CPC classification number: F01D5/005 ,  C23F1/44 ,  C23G1/32

    Abstract: Prior art methods for removing a layer area of a component (stripping) lead to poor results since a removal, for example, ensues in a nonuniform manner. In addition, these prior art methods are time intensive. An inventive method for removing a layer area of a component consists of firstly treating the layer areas to be removed with a salt solution and then with acid, whereby in an intermediate or final step, the component is treated with a complexing agent.

    Abstract translation: 用于去除部件（剥离）的层区域的现有技术方法导致例如由于去除而导致的差的结果，这导致不均匀的方式。 此外，这些现有技术的方法是时间密集的。 用于除去组分的层面积的本发明的方法包括首先用盐溶液处理待除去的层区域，然后用酸处理，由此在中间或最终步骤中，用络合剂处理组分。

    Process for the surface treatment of a component, and apparatus for the surface treatment of a component
    50.
    发明申请
    Process for the surface treatment of a component, and apparatus for the surface treatment of a component 失效
    用于表面处理部件的方法，以及用于表面处理部件的装置

    公开(公告)号：US20060084190A1

    公开(公告)日：2006-04-20

    申请号：US11170662

    申请日：2005-06-29

    Applicant: Ursus Kruger ,  Daniel Kortvelyessy ,  Ralph Reiche ,  Jan Steinbach ,  Gabriele Winkler

    Inventor： Ursus Kruger ,  Daniel Kortvelyessy ,  Ralph Reiche ,  Jan Steinbach ,  Gabriele Winkler

    IPC: H01L21/66

    CPC classification number: C25F7/00 ,  C25D5/18 ,  C25D21/12 ,  C25F5/00

    Abstract: Components which are subject to operating loads can often be passed for refurbishment by means of an acid treatment. The time for which the components remain in the acid has hitherto been determined empirically, which means that individual loads are not taken into account. The process according to the invention for the surface treatment of a component proposes that at least repeatedly a measurement voltage be applied to the component, resulting in the flow of a current, the time profile of which represents the state of the surface treatment and is used to decide upon when to terminate or interrupt the acid treatment.

    Abstract translation: 承受操作负荷的部件经常可以通过酸处理进行翻新。 迄今为止，经验确定了成分保留在酸中的时间，这意味着不考虑单独的负荷。 根据本发明的用于表面处理组件的方法提出至少重复地向组件施加测量电压，导致电流的流动，其时间曲线表示表面处理的状态并被使用 决定何时终止或中断酸处理。

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