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公开(公告)号：US10983431B2
公开(公告)日：2021-04-20
申请号：US16667956
申请日：2019-10-30
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand Vles , Erik Achilles Abegg , Aage Bendiksen , Derk Servatius Gertruda Brouns , Pradeep K. Govil , Paul Janssen , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Mária Péter , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , James Norman Wiley
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US10935673B2
公开(公告)日：2021-03-02
申请号：US16344661
申请日：2017-10-02
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof
Abstract: A radiation analysis system comprising a target comprising two marks which are separated from each other, the target being configured to undergo thermal expansion when illuminated with radiation; a position measurement system configured to measure a change in the separation of the marks; and a processor configured to determine a power of the radiation using the measured change in separation of the marks.
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公开(公告)号：US10928735B2
公开(公告)日：2021-02-23
申请号：US16698868
申请日：2019-11-27
Applicant: ASML Netherlands B.V.
Abstract: A patterning device for use with a lithographic apparatus, the device comprising an absorber portion configured to absorb incident radiation and to reflect a portion of incident radiation, the absorber portion comprising a first layer and a second layer, the first layer of the absorber portion comprising a first material that is different from a second material of the second layer of the absorber portion; a reflector portion arranged beneath the absorber portion, the reflector portion being configured to reflect incident radiation; and a phase tune portion arranged between the reflector portion and the absorber portion, the phase tune portion being configured to induce a phase shift between the radiation reflected by the reflector portion and the portion of radiation reflected by the absorber portion such that the radiation reflected by the reflector portion destructively interferes with the portion of radiation reflected by the absorber portion.
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公开(公告)号：US20210026258A1
公开(公告)日：2021-01-28
申请号：US16982650
申请日：2019-03-11
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
Abstract: A component of a lithographic apparatus, the component having a contaminant trap surface provided with recesses configured to trap contaminant particles and to reduce specular reflection of DUV radiation. The recesses can have at least one dimension less than or equal to about 2 gm, desirably less than 1 gm.
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公开(公告)号：US10678139B2
公开(公告)日：2020-06-09
申请号：US16245400
申请日：2019-01-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catherinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerkhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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Patent Agency Ranking
公开(公告)号：US20200096880A1
公开(公告)日：2020-03-26
申请号：US16571956
申请日：2019-09-16
Applicant: ASML Netherlands B.V.
Inventor： Andrey NIKIPELOV , Vadim Yevgenyevich Banine , Christian Gerardus Norbertus Cloin , Edwin Te Sligte , Marcus Adrianus Van De Kerkhof , Ferdinandus Martinus Jozef Henri Van De Weterring
IPC: G03F7/20
Abstract: A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
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公开(公告)号：US10088755B2
公开(公告)日：2018-10-02
申请号：US15627054
申请日：2017-06-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Siebe Landheer , Marcel Beckers , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Franciscus Johannes Joseph Janssen
Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
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公开(公告)号：US09568841B2
公开(公告)日：2017-02-14
申请号：US15080258
申请日：2016-03-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
CPC classification number: G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Abstract translation: 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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49.发明授权Inspection apparatus to detect a target located within a pattern for lithography 有权用于检测位于用于光刻的图案内的目标的检查装置公开(公告)号：US09529278B2
公开(公告)日：2016-12-27
申请号：US15056410
申请日：2016-02-29
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof
IPC: G03F7/20 , G01N21/21 , G01N21/956 , G01N21/95
CPC classification number: G03F7/70633 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/10 , G03F7/70616
Abstract: A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.
Abstract translation: 系统检测位于模式内的目标。 它通过对周围图案的接收信号进行滤波而在瞳孔平面中工作。 一种方法包括用辐射照射目标和周围模式，检测由目标和周围模式反射的辐射，并基于检测到的辐射形成第一组数据，去除对应于目标的第一组数据的部分 以形成减少的数据，通过删除的部分内插减少的数据的剩余部分以形成产品数据，以及从第一组数据中减去产品数据以形成目标数据。
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公开(公告)号：US09280065B2
公开(公告)日：2016-03-08
申请号：US14664007
申请日：2015-03-20
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof
IPC: G03F7/20 , G01N21/21 , G01N21/95 , G01N21/956
CPC classification number: G03F7/70633 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/10 , G03F7/70616
Abstract: A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.
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