公开(公告)号：US20080192359A1

公开(公告)日：2008-08-14

申请号：US11911904

申请日：2006-04-26

Applicant: Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

Inventor： Alexander Sohmer ,  Aurelian Dodoc ,  Heiko Feldmann ,  Wilhelm Ulrich ,  Gerhard Furter ,  Rafael Egger ,  Artur Hogele ,  Michael Raum

IPC: G02B27/18

CPC classification number: G03F7/70075 ,  G02B17/0892 ,  G02B27/0043

Abstract: An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62). The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666′) that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

Abstract translation: 微光刻曝光设备（10）的照明系统（12）包括用于将光瞳平面（54）变换成场平面（62）的冷凝器（601; 602; 603; 604; 605; 606）。 冷凝器具有透镜组（L 14，L 15，L 16，L 17; L 24，L 25，L 26，L 27，L 28; L 34，L 35，L 36，L 37; L 44，L 45，L 46; L 53，L 54，L 55）。 这些透镜被布置为使得在轴上场点（72）上由聚光器（601; 602; 603; 604; 605）聚焦的光束（70）会聚在透镜组的每个透镜内。 透镜组的至少一个透镜（L 15，L 16，L 17; L 25，L 26; L 34，L 44，L 45; L 54）具有凹面。 照明系统还可以包括至少部分校正冷凝器（601; 602; 603; 604; 605; 606）的残余光瞳像差的场停止物镜（66; 666,666'）。

公开(公告)号：US20080117400A1

公开(公告)日：2008-05-22

申请号：US11747630

申请日：2007-05-11

Applicant: Hans-Juergen Rostalski ,  Heiko Feldmann ,  Wilhelm Ulrich

Inventor： Hans-Juergen Rostalski ,  Heiko Feldmann ,  Wilhelm Ulrich

IPC: G03B27/54 ,  G02B17/08

CPC classification number: G03F7/70225 ,  G02B17/0892 ,  G03F7/70275

Abstract: A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth Δλ>10 pm around a central operating wavelength λ>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate. The projection objective is a catadioptric projection objective having at least one concave mirror arranged in a region of a pupil surface of the projection objective, and a negative group having at least one negative lens arranged in direct proximity to the concave mirror in a region near the pupil surface, where a marginal ray height (MRH) of the imaging is greater than a chief ray height (CRH).

Abstract translation: 一种投影曝光装置，用于曝光布置在投影物镜的图像表面的区域中的辐射敏感基板，其具有布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像 具有用于从围绕中心工作波长λ> 200nm的带宽为10mPa的波长带发射紫外光的光源; 照明系统，用于接收来自光源的光并将照射辐射引导到掩模的图案上; 以及用于将掩模的结构成像到感光基板上的投影物镜。 投影物镜是一个反射折射投影物镜，它具有至少一个凹面镜，该凹面镜布置在投影物镜的光瞳表面的区域中，以及一个负极组，具有至少一个负透镜， 瞳孔表面，其中成像的边缘射线高度（MRH）大于主射线高度（CRH）。

公开(公告)号：US09360775B2

公开(公告)日：2016-06-07

申请号：US13364565

申请日：2012-02-02

Applicant: Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

Inventor： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Abstract translation: 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

公开(公告)号：US08982325B2

公开(公告)日：2015-03-17

申请号：US13333350

申请日：2011-12-21

Applicant: Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

Inventor： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

IPC: G03F7/20

CPC classification number: G03F7/70308 ,  G03F7/70216 ,  G03F7/70566

Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

Abstract translation: 本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。 微光刻投影曝光装置包括照明系统和投影物镜。 照明系统可以照亮布置在投影物镜的物平面中的掩模。 掩模可以具有待成像的结构。 该方法可以包括用光照射照明系统的光瞳平面。 该方法还可以包括在投影物镜的平面内修改通过该平面的光的相位，幅度和/或极化。 可以以相互不同的方式对至少两个衍射级进行修改。 与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

公开(公告)号：US08837041B2

公开(公告)日：2014-09-16

申请号：US13302147

申请日：2011-11-22

Applicant: Hans-Juergen Mann ,  Heiko Feldmann

Inventor： Hans-Juergen Mann ,  Heiko Feldmann

IPC: G02B17/00 ,  G02B17/06

CPC classification number: G02B17/0663

Abstract: A magnifying imaging optical system is disclosed that has precisely three mirrors, which image an object field in an object plane into an image field in an image plane. A ratio between a transverse dimension of the image field and a transverse dimension measured in the same direction of a useful face of the last mirror before the image field is greater than 3. In a further aspect, the magnifying imaging optical system is disclosed that has at least three mirrors, which image an object field in an object plane in an image field in an image plane. A first mirror in the beam path after the object field is concave, a second mirror is also concave and a third mirror is convex. An angle of incidence of imaging beams on the last mirror before the image field is less than 15°.

Abstract translation: 公开了一种放大成像光学系统，其具有精确的三个反射镜，其将物平面中的物场映像成图像平面中的图像场。 图像场的横向尺寸与在图像场大于3之前的最后一个反射镜的有用面的相同方向上测量的横向尺寸之间的比。在另一方面，公开了放大成像光学系统，其具有 至少三个镜子，其在图像平面中的图像场中对物体平面中的物体场进行成像。 在物场之后的光束路径中的第一镜是凹的，第二镜也是凹的，第三镜是凸的。 在图像场之前的最后一个镜子上的成像光束的入射角小于15°。

公开(公告)号：US08711472B2

公开(公告)日：2014-04-29

申请号：US12568306

申请日：2009-09-28

Applicant: Hans-Juergen Mann ,  Heiko Feldmann

Inventor： Hans-Juergen Mann ,  Heiko Feldmann

IPC: G02B21/04

CPC classification number: G02B17/0631 ,  G02B21/04

Abstract: The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane via at least one imaging ray having an imaging ray path. The first optical element group comprises a first optical element with a reflective first optical surface in the imaging ray path and a second optical element with a reflective second optical surface in the imaging ray path, wherein the first optical surface is concave. The second optical element group comprises a third optical element with a concave reflective third optical surface in the imaging ray path and a fourth optical element with a convex reflective fourth optical surface in the imaging ray path without light passage aperture.

Abstract translation: 本发明涉及具有第一光学元件组和第二光学元件组的特别是显微镜的光学成像装置，其中第一光学元件组和第二光学元件组在图像平面上形成图像 经由具有成像光线路径的至少一个成像射线的物体平面的物体点。 第一光学元件组包括在成像光线路径中具有反射第一光学表面的第一光学元件和在成像光线路径中具有反射第二光学表面的第二光学元件，其中第一光学表面是凹形的。 第二光学元件组包括在成像光线路径中具有凹入反射第三光学表面的第三光学元件和在成像光线路径中具有凸起的反射第四光学表面的第四光学元件，而没有光通过孔。

公开(公告)号：US08674329B2

公开(公告)日：2014-03-18

申请号：US13805960

申请日：2011-06-24

Applicant: Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

Inventor： Michael Budach ,  Tristan Bret ,  Klaus Edinger ,  Thorsten Hofmann ,  Heiko Feldmann ,  Johannes Ruoff

IPC: G21K5/04

CPC classification number: G01N21/95 ,  B82Y10/00 ,  B82Y40/00 ,  C23C14/48 ,  G03B27/68 ,  G03F1/24 ,  G03F1/72 ,  G03F1/74 ,  G03F1/84 ,  G03F7/705 ,  G03F7/7065 ,  G06F17/5009 ,  G06T7/0002 ,  G21K5/00

Abstract: The invention relates to a method for analyzing a defect of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range (EUV mask) comprising the steps of: (a) generating at least one focus stack relating to the defect using an EUV mask inspection tool, (b) determining a surface configuration of the EUV mask at a position of the defect, (c) providing model structures having the determined surface configuration which have different phase errors and generating the respective focus stacks, and (d) determining a three dimensional error structure of the EUV mask defect by comparing the at least one generated focus stack of the defect and the generated focus stacks of the model structures.

Abstract translation: 本发明涉及一种用于分析用于极紫外（EUV）波长范围（EUV掩模）的光刻掩模的缺陷的方法，包括以下步骤：（a）使用EUV掩模检查产生与缺陷有关的至少一个焦点叠层 工具，（b）在缺陷的位置确定EUV掩模的表面结构，（c）提供具有确定的表面配置的模型结构，其具有不同的相位误差并产生相应的焦点堆叠，以及（d）确定三维 通过比较所述缺陷的至少一个生成的焦点堆栈和所产生的模型结构的焦点堆栈，来确定EUV掩模缺陷的三维误差结构。

公开(公告)号：US20130335552A1

公开(公告)日：2013-12-19

申请号：US13994797

申请日：2011-12-08

Applicant: Heiko Feldmann ,  Michael Totzeck

Inventor： Heiko Feldmann ,  Michael Totzeck

IPC: H04N7/18

CPC classification number: H04N7/18 ,  G03F1/84

Abstract: The invention relates to a method for mask inspection and to a mask inspection installation. A method according to the invention involves a lighting system lighting a mask with a lighting beam pencil, and said mask being observed with an observation beam pencil which is directed onto a sensor arrangement, wherein the light hitting the sensor arrangement is evaluated in order to check the mapping effect of the mask. The lighting system produces a spot of light with limited refraction on the mask, and during the evaluation of the light hitting the sensor arrangement a finite component of the light setting out from the mask to produce the observation beam pencil is disregarded.

Abstract translation: 本发明涉及一种面罩检查方法和面罩检查装置。 根据本发明的方法涉及用照明光束笔照亮面罩的照明系统，并且用指向传感器装置的观察光束笔观察所述面罩，其中评估传感器装置的光以便检查 掩模的映射效果。 照明系统在掩模上产生具有有限折射的光点，并且在评估传感器装置的光的评估期间忽略从掩模设置以产​​生观察光束笔的光的有限分量。

公开(公告)号：US08325426B2

公开(公告)日：2012-12-04

申请号：US13156819

申请日：2011-06-09

Applicant: Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

Inventor： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC: G02B15/14

CPC classification number: G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

Abstract translation: 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US08310752B2

公开(公告)日：2012-11-13

申请号：US12413981

申请日：2009-03-30

Applicant: Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

Inventor： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

IPC: G02B17/00

CPC classification number: G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

Abstract translation: 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。