公开(公告)号：US4398824A

公开(公告)日：1983-08-16

申请号：US254486

申请日：1981-04-15

Applicant: Martin Feldman ,  Alan D. White ,  Donald L. White

Inventor： Martin Feldman ,  Alan D. White ,  Donald L. White

IPC: H01L21/68 ,  G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/27

CPC classification number: G03F9/7088 ,  G03F9/7076

Abstract: The present invention is a method and apparatus for aligning a semiconductor wafer to be patterned by a step-and-repeat photolithographic system. The inventive alignment technique, which is able to compensate for local wafer tilt and/or nonuniform photoresist thickness, is applicable to semiconductor wafers which have, on a surface portion, one or more Fresnel zone plate alignment marks.

Abstract translation: 本发明是用于通过步进重复光刻系统对准待图案化的半导体晶片的方法和装置。 能够补偿局部晶片倾斜和/或不均匀光致抗蚀剂厚度的本发明的对准技术适用于在表面部分上具有一个或多个菲涅尔区域板对准标记的半导体晶片。

公开(公告)号：US4026653A

公开(公告)日：1977-05-31

申请号：US576099

申请日：1975-05-09

Applicant: Jacob Appelbaum ,  Martin Feldman

Inventor： Jacob Appelbaum ,  Martin Feldman

IPC: G03F7/20 ,  G03B27/02

CPC classification number: G03F7/70691 ,  G03F7/2041

Abstract: A predetermined small spacing or gap between a semiconductor wafer and a mask is defined by projecting a cushion of air through a central mask aperture toward the wafer. The wafer is supported on a sponge rubber member which is designed, along with the air flow paths, to maintain a uniform small separation as is desirable in the photolithographic printing of semiconductor mask patterns.

Abstract translation: 半导体晶片和掩模之间的预定的小的间隔或间隙通过将空气缓冲垫通过中心掩模孔朝向晶片来定义。 晶片被支撑在与气流通道一起设计的海绵橡胶构件上，以保持在半导体掩模图案的光刻印刷中所期望的均匀的小的间隔。

公开(公告)号：US3943529A

公开(公告)日：1976-03-09

申请号：US547555

申请日：1975-02-06

Applicant: Martin Feldman ,  Joseph Michael Moran

Inventor： Martin Feldman ,  Joseph Michael Moran

IPC: B23K26/08 ,  G09G3/02 ,  H01S3/098 ,  G01D9/42 ,  H04N3/00 ,  B23K9/00

CPC classification number: G09G3/02 ,  B23K26/0838 ,  B23K2201/007

Abstract: In pattern generating apparatus of the type employing a reciprocating laser beam for scanning a substrate surface, three scan lines are formed simultaneously. During reciprocation in one direction, the beam is deflected upwardly at an angle of arccot (1/3) with respect to the reciprocating direction, and during reciprocation in the opposite direction, the beam is deflected downwardly at an angle of arccot (1/3).

Abstract translation: 在采用往复激光束扫描衬底表面的图案生成装置中，同时形成三条扫描线。 在一个方向往复运动时，梁相对于往复方向以弧形（1/3）的角度向上偏转，并且在相反方向的往复运动期间，梁以弧形的角度向下偏转（1/3 ）。