Built-in antenna and method for improving antenna efficiency
    41.
    发明授权
    Built-in antenna and method for improving antenna efficiency 有权
    内置天线和提高天线效率的方法

    公开(公告)号:US08786500B2

    公开(公告)日:2014-07-22

    申请号:US13204032

    申请日:2011-08-05

    CPC classification number: H01Q1/243 H01Q5/371 H01Q5/378 H01Q9/42 Y10T29/49018

    Abstract: A built-in antenna of a portable terminal and a method of forming the same are provided. The built-in antenna includes a first conductor having a specific length and used for a ground, a second conductor disposed with a specific distance in parallel to the first conductor to couple with the first conductor and used for power feeding, and a separating element disposed between the first conductor and the second conductor to separate the first and second conductors. Accordingly, the built-in antenna may exhibit a smooth radiation property even if a metal construction is used in a device and thus may implement robustness improvement of the device and make the device slim and have an attractive outer appearance. In addition, a method of improving antenna efficiency may prevent deterioration of the radiation property of the antenna radiator of the related art by using simple processing, and the metal construction may be used as a radiator.

    Abstract translation: 提供了便携式终端的内置天线及其形成方法。 内置天线包括具有特定长度并用于地面的第一导体,与第一导体平行设置的具有特定距离的第二导体,以与第一导体耦合并用于馈电,以及分离元件设置 在第一导体和第二导体之间,以分离第一和第二导体。 因此,即使在设备中使用金属结构,内置天线也可以呈现平滑的辐射特性,因此可以实现设备的鲁棒性改善并且使设备变得苗条并且具有有吸引力的外观。 此外,通过使用简单的处理,提高天线效率的方法可以防止现有技术的天线辐射体的辐射特性的劣化,并且金属结构可以用作散热器。

    Apparatus having conveyor and method of transferring substrate using the same
    42.
    发明授权
    Apparatus having conveyor and method of transferring substrate using the same 有权
    具有传送带和使用其传送基板的方法的设备

    公开(公告)号:US08545159B2

    公开(公告)日:2013-10-01

    申请号:US10956389

    申请日:2004-10-01

    CPC classification number: B65G49/064 B65G49/067 B65G2249/02

    Abstract: An apparatus for a liquid crystal display device includes: a process chamber for treating a substrate; a load-lock chamber having an interior conveyor; and a transfer chamber connected to the process chamber and the at least one load-lock chamber, the transfer chamber having a substrate-transferring means.

    Abstract translation: 一种液晶显示装置的装置,包括:处理基板的处理室; 具有内部输送机的装载锁定室; 以及连接到所述处理室和所述至少一个装载锁定室的传送室,所述传送室具有基板传送装置。

    PRODUCTION METHOD AND PRODUCTION DEVICE FOR A COMPOSITE METAL POWDER USING THE GAS SPRAYING METHOD
    45.
    发明申请
    PRODUCTION METHOD AND PRODUCTION DEVICE FOR A COMPOSITE METAL POWDER USING THE GAS SPRAYING METHOD 有权
    使用气体喷射方法的复合金属粉末的生产方法和生产装置

    公开(公告)号:US20120244034A1

    公开(公告)日:2012-09-27

    申请号:US13378756

    申请日:2009-12-16

    CPC classification number: C22C1/1042 B22F2009/0816

    Abstract: Disclosed herein are a method and an apparatus for preparing a metal composite powder by using gas spraying. The method of preparing a metal composite powder by using gas spraying includes introducing a matrix phase in a chamber, including a reinforcing phase in the chamber, melting the introduced matrix phase to form a melt, adding the reinforcing phase in the melt, stirring the melt with the added reinforcing phase to form a melt mixture, atomizing the melt mixture together with a gas to form a metal composite powder containing the reinforcing phase, and collecting the metal composite powder formed.

    Abstract translation: 本文公开了通过使用气体喷射来制备金属复合粉末的方法和装置。 通过使用气体喷射制备金属复合粉末的方法包括在室中引入基质相,包括在室中的增强相,熔化引入的基质相以形成熔体,将增强相加入熔体中,搅拌熔体 加入增强相以形成熔融混合物,将熔融混合物与气体一起雾化以形成含有增强相的金属复合粉末,并收集所形成的金属复合粉末。

    Method of manufacturing nitride semiconductor substrates having a base substrate with parallel trenches
    46.
    发明授权
    Method of manufacturing nitride semiconductor substrates having a base substrate with parallel trenches 有权
    制造具有平行沟槽的基底衬底的氮化物半导体衬底的方法

    公开(公告)号:US08138003B2

    公开(公告)日:2012-03-20

    申请号:US13031425

    申请日:2011-02-21

    Abstract: The present invention relates to a nitride semiconductor substrate such as gallium nitride substrate and a method for manufacturing the same. The present invention forms a plurality of trenches on a lower surface of a base substrate that are configured to absorb or reduce stresses applied larger when growing a nitride semiconductor film on the base substrate from a central portion of the base substrate towards a peripheral portion. That is, the present invention forms the trenches on the lower surface of the base substrate such that pitches get smaller or widths or depths get larger from the central portion of the base substrate towards the peripheral portion.

    Abstract translation: 氮化镓半导体衬底及其制造方法技术领域本发明涉及氮化镓衬底等氮化物半导体衬底及其制造方法。 本发明在基底基板的下表面上形成多个沟槽,该多个沟槽被配置为当从基底基板的中心部分向周边部分生长氮化物半导体膜时,吸收或减小施加更大的应力。 也就是说,本发明在基底基板的下表面上形成沟槽,使得间距变得较小,或者宽度或深度从基底基板的中心部朝向周边部分变大。

    ETCHING SYSTEM AND METHOD OF CONTROLLING ETCHING PROCESS CONDITION
    47.
    发明申请
    ETCHING SYSTEM AND METHOD OF CONTROLLING ETCHING PROCESS CONDITION 有权
    蚀刻系统和控制蚀刻工艺条件的方法

    公开(公告)号:US20120055908A1

    公开(公告)日:2012-03-08

    申请号:US13220084

    申请日:2011-08-29

    Abstract: Provided is an etching system and a method of controlling etching process condition. The etching system includes a light source that irradiates incident light into a target wafer, a light intensity measuring unit that measures light intensity according to the wavelength of interference light generated by interference between reflected light beams from the target wafer, a signal processor that detects a time point at which an extreme value in the intensity is generated when the intensity of interference light varies according to the wavelength, and a controller that compares the extreme value generating time point detected from the signal processor with a reference time point corresponding to the extreme value generating time point and controls a process condition according to the comparison result.

    Abstract translation: 提供了蚀刻系统和控制蚀刻工艺条件的方法。 蚀刻系统包括将入射光照射到目标晶片中的光源,光强度测量单元,其根据由来自目标晶片的反射光之间的干涉产生的干涉光的波长来测量光强度;信号处理器,其检测 当干扰光的强度根据波长变化时产生强度极值的时间点,以及将从信号处理器检测的极值产生时间点与对应于极值的参考时间点进行比较的控制器 产生时间点,并根据比较结果控制过程条件。

    STRUCTURE OF ENGINE MOUNT FOR VEHICLE
    48.
    发明申请
    STRUCTURE OF ENGINE MOUNT FOR VEHICLE 有权
    发动机结构用于车辆

    公开(公告)号:US20120048638A1

    公开(公告)日:2012-03-01

    申请号:US13191879

    申请日:2011-07-27

    CPC classification number: B60K5/1241 B60K5/04 B60K17/24 B62D21/11

    Abstract: A structure of an engine mount is provided for a vehicle in which an engine is disposed in the front of the vehicle, a front wheel is driven, and the engine is integrally coupled with a transmission to be seated horizontally on a vehicle body in a transverse mounting direction. The structure may include a driveshaft coupled to receive the driving force of the engine through the transmission and penetrate a center bearing through a bearing bracket fixed to the engine, a subframe as a plate shape coupled to the vehicle body in a rear lower part of the engine and coupled to a lower part of the transmission through a main roll rod mounted on the front, and a sub-roll rod having one end connected to the subframe and the other end connected to the bearing bracket.

    Abstract translation: 发动机支架的结构为发动机设置在车辆的前部而被驱动的车辆提供,并且发动机与变速器一体地联接,以使车身横向放置在横向 安装方向。 该结构可以包括被连接以通过传动装置接收发动机的驱动力的驱动轴,并通过固定在发动机上的轴承架穿过中心轴承,将副车架作为联接到车身的板形在后部的下部 发动机,并且通过安装在前部的主辊杆耦合到变速器的下部;以及副辊杆,其一端连接到副车架,另一端连接到轴承座。

    Method of manufacturing nitride semiconductor device
    49.
    发明授权
    Method of manufacturing nitride semiconductor device 有权
    氮化物半导体器件的制造方法

    公开(公告)号:US08124497B2

    公开(公告)日:2012-02-28

    申请号:US12955222

    申请日:2010-11-29

    Abstract: A method of manufacturing a nitride semiconductor device is disclosed. The method includes forming a gallium nitride (GaN) epitaxial layer on a first support substrate, forming a second support substrate on the GaN epitaxial layer, forming a passivation layer on a surface of the other region except for the first support substrate, etching the first support substrate by using the passivation layer as a mask, and removing the passivation layer and thereby exposing the second support substrate and the GaN epitaxial layer.

    Abstract translation: 公开了一种制造氮化物半导体器件的方法。 该方法包括在第一支撑衬底上形成氮化镓(GaN)外延层,在GaN外延层上形成第二支撑衬底,在除第一支撑衬底之外的另一个区域的表面上形成钝化层,蚀刻第一衬底 通过使用钝化层作为掩模来支撑衬底,以及去除钝化层,从而暴露第二支撑衬底和GaN外延层。

Patent Agency Ranking