公开(公告)号：US20160047730A1

公开(公告)日：2016-02-18

申请号：US14778872

申请日：2014-03-13

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Yoichi TANAKA

IPC: G01N15/06

CPC classification number: G01N15/06 ,  C02F1/008 ,  C02F2101/36 ,  C02F2103/04 ,  C02F2209/006 ,  C02F2209/105 ,  G01N15/0625 ,  G01N35/00712 ,  G01N2001/1006 ,  G01N2015/0053

Abstract: An object of the invention is to provide a technology that can timely collects particulates in sample water even when abnormality is observed in the result obtained by a measurement unit for measuring particulates in sample water. Provided is a particulate-measuring method comprising filtering sample water continuously, even when a measurement unit for measuring particulates in sample water and a filtration unit of filtering the sample water and collecting the particulates for analysis by direct microscopic method are both in operation and abnormality is observed in the result obtained by the measurement unit.

Abstract translation: 本发明的目的是提供即使在通过用于测量样品水中的微粒的测量单元获得的结果中观察到异常的情况下，也能够及时收集样品水中的微粒的技术。 本发明提供一种颗粒测定方法，即使在用于测量样品水的微粒的测量单元和过滤样品水并通过直接显微镜方法收集微粒以进行分析的过程中，也连续地对样品水进行过滤，均处于运行状态，异常是 在由测量单元获得的结果中观察到。

公开(公告)号：US20150336813A1

公开(公告)日：2015-11-26

申请号：US14409891

申请日：2012-07-13

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Nozomu IKUNO

IPC: C02F1/44 ,  B01D63/00 ,  B01D61/08

CPC classification number: C02F1/441 ,  B01D61/022 ,  B01D61/025 ,  B01D61/04 ,  B01D61/08 ,  B01D63/00 ,  B01D2311/04 ,  B01D2311/06 ,  B01D2317/04 ,  C02F1/20 ,  C02F1/32 ,  C02F1/42 ,  C02F1/444 ,  C02F1/52 ,  C02F9/00 ,  C02F2103/04 ,  C02F2103/346 ,  B01D2311/2642 ,  B01D2311/2657 ,  B01D2311/2623 ,  B01D2311/2619

Abstract: Provided is an ultrapure water producing apparatus equipped with fewer reverse osmosis membrane separation units. The ultrapure water producing apparatus includes a primary water purification system 2 and a subsystem 3 configured to treat water treated by the primary water purification system 2. A reverse osmosis membrane separation unit is provided in at least the primary water purification system 2. The reverse osmosis membrane separation unit installed in the primary water purification system 2 is a high-pressure reverse osmosis membrane separation unit installed in a single stage. The high-pressure reverse osmosis membrane separation unit has a standard operating pressure of 5.52 MPa, a pure water flux of 0.5 m3/m2·D or more, and a NaCl rejection of 99.5% or more (32,000 mg/L NaCl).

Abstract translation: 本发明提供一种装有较少的反渗透膜分离装置的超纯水制造装置。 超纯水生成装置包括一次净水系统2和配置成处理由一次净水系统2处理的水的子系统3.至少在一次净水系统2中设置反渗透膜分离单元。反渗透 安装在初级水净化系统2中的膜分离单元是安装在单级中的高压反渗透膜分离单元。 高压反渗透膜分离装置的标准工作压力为5.52MPa，纯水通量为0.5m 3 / m 2·D以上，NaCl排除率为99.5％以上（32,000mg / L NaCl）。

公开(公告)号：US20150306594A1

公开(公告)日：2015-10-29

申请号：US14403009

申请日：2013-05-21

Applicant: KURITA WATER INDUSTRIES LTD. ,  OTSUKA CHEMICAL CO., LTD.

Inventor： Koichi MORI ,  Nobuki ITOI ,  Kumiko HARI

IPC: B01J39/08 ,  B01D15/08 ,  C02F1/28 ,  G21F9/12

CPC classification number: G21F9/12 ,  B01D15/08 ,  B01J20/041 ,  B01J20/06 ,  B01J20/12 ,  B01J20/28004 ,  B01J20/28016 ,  B01J20/2803 ,  B01J20/3007 ,  B01J20/3042 ,  B01J20/3078 ,  B01J39/10 ,  C02F1/281 ,  C02F2101/006 ,  G21F9/02 ,  G21F9/04

Abstract: A radioactive material adsorbent having large adsorption capacity is provided. The radioactive material adsorbent contains a titanate represented by a chemical formula M2Ti2O5 (M: univalent cation). The M2Ti2O5 has a large cation exchange capacity, exhibits thermal stability, exhibits excellent chemical resistance to acids, alkalis, and the like and, therefore is suitable for an adsorbent for a water treatment. The mechanical strength is improved by adding a binder to this titanate and performing forming and firing, so that pulverization due to vibration, impact, and the like applied during transportation and the like, and falling off of primary particles at the time of putting into water can be reduced.

Abstract translation: 提供了具有大吸附能力的放射性物质吸附剂。 放射性物质吸附剂含有由化学式M2Ti2O5（M：单价阳离子）表示的钛酸盐。 M2Ti2O5具有大的阳离子交换能力，显示出热稳定性，对酸，碱等具有优异的耐化学性，因此适用于水处理吸附剂。 通过向该钛酸盐中添加粘合剂进行成形和烧制，可以提高机械强度，从而在运输等期间施加的振动，冲击等的粉碎，以及在投入水时一次粒子的脱落 可以减少

公开(公告)号：US20150279703A1

公开(公告)日：2015-10-01

申请号：US14432818

申请日：2013-09-30

Applicant: Yuichi OGAWA ,  Haruyoshi YAMAKAWA ,  Kurita Water Industries Ltd.

Inventor： Yuichi Ogawa ,  Haruyoshi Yamakawa

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/67051 ,  H01L21/02068 ,  H01L21/28518 ,  H01L21/32134

Abstract: A method and system for cleaning a semiconductor substrate in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance, without damaging Al and a silicide layer, comprising a cleaning portion (2) for cleaning a semiconductor substrate 100 in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance; a delivery portion (30) disposed in the cleaning portion for delivering a cleaning solution to the semiconductor substrate in the cleaning portion to bring the cleaning solution into contact with the semiconductor substrate; a sulfuric acid solution transfer path (5) connected to the delivery portion for transferring a sulfuric acid solution comprising an oxidant to the delivery portion; and an adsorptive inhibitor solution transfer path (11) connected to the delivery portion for transferring a solution comprising an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor solution may be mixed or separately transferred to come into contact with or on the semiconductor substrate.

Abstract translation: 一种用于清洁半导体衬底的方法和系统，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化，而不损坏Al和硅化物层，包括用于清洁半导体衬底的清洁部分（2） 100，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化; 设置在清洁部分中的输送部分（30），用于将清洁溶液输送到清洁部分中的半导体衬底，以使清洗溶液与半导体衬底接触; 连接到输送部分的用于将包含氧化剂的硫酸溶液转移到输送部分的硫酸溶液转移路径（5） 以及连接到输送部分的吸附抑制剂溶液转移路径（11），用于将包含具有任何一种或多种N基，S基和P基极性基团的吸附抑制剂的溶液转移到输送部分。 硫酸溶液和吸附抑制剂溶液可以混合或分开转移以与半导体衬底接触或接触。

公开(公告)号：US20150273362A1

公开(公告)日：2015-10-01

申请号：US14441381

申请日：2013-11-18

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Satoshi Shimizu ,  Mitsuharu Terashima

IPC: B01D21/24 ,  B01D21/00

CPC classification number: B01D21/2405 ,  B01D21/0087 ,  B01D21/06 ,  B01D21/08 ,  B01D21/14 ,  B01D21/24 ,  B01D21/2416 ,  B01D21/286 ,  B01D21/30 ,  B01J4/00 ,  C02F1/006 ,  C02F2001/007

Abstract: Provided are a distributor capable of feeding a liquid in a state of evenly flowing out from an entire opening while avoiding the opening from being blocked by sludge and keeping a pressure loss small, a settling tank that employs the distributor, and a method for operating the settling tank. A distributor 10 being in the form of a rectangular frame and having straight tubular sides 11 to 14 is disposed in a lower space within a settling tank 1. A liquid outlet opening 16 extending in a lengthwise direction of the distributor 10 is formed in a bottom surface of the distributor 10. An open angle θ of the opening 16 with respect to a tube axis is 60 to 180°, and preferably 90 to 150°.

Abstract translation: 提供一种分配器，其能够在从整个开口均匀地流出的状态下供给液体，同时避免开口被污泥阻塞并保持压力损失小，使用分配器的沉降罐，以及操作该方法 沉淀池 呈矩形框架形式并具有直管状侧面11至14的分配器10设置在沉降槽1内的下部空间中。沿着分配器10的长度方向延伸的液体出口16形成在底部 分配器10的表面。开角度＆amp; 开口16相对于管轴为60〜180°，优选为90〜150°。

公开(公告)号：USD728399S1

公开(公告)日：2015-05-05

申请号：US29478601

申请日：2014-01-07

Applicant: DKK-TOA Corporation ,  Kurita Water Industries Ltd.

Designer： Satoshi Takizawa ,  Tetsuya Sato ,  Shuji Sugawara ,  Yuko Konno ,  Shintarou Mori ,  Yukimasa Shimura

公开(公告)号：US20140079377A1

公开(公告)日：2014-03-20

申请号：US14088693

申请日：2013-11-25

Applicant: Kurita Water Industries, Ltd.

Inventor： Minoru UCHIDA ,  Haruyoshi Yamakawa ,  Naoki Matsumoto

IPC: F24H1/12 ,  F24H9/20 ,  F24H9/00

CPC classification number: F24H1/121 ,  F24H1/142 ,  F24H9/0015 ,  F24H9/2028

Abstract: The invention is directed to a liquid heater for rapidly heating a liquid without overheating the liquid. The liquid heater comprises a liquid flow channel having a passage through which liquid flows, a heating part disposed outside the liquid flow channel, a heat reflecting part facing a heat radiating side of the heating part, and a cooling part through which a cooling medium flows adjacent a reverse side of a reflecting surface of the heat reflecting part for cooling the heat reflecting part. Radiant heat not absorbed in the liquid is reflected by the heat reflecting part. The heat reflecting part reflects radiant heat cooled by the cooling part so that the body of the liquid heater and peripheral members are maintained at a temperature not higher than a predetermined temperature to prevent overheating the liquid.

Abstract translation: 本发明涉及一种用于快速加热液体而不使液体过热的液体加热器。 液体加热器包括具有液体流动通道的液体流动通道，设置在液体流动通道外部的加热部分，面向加热部件的散热侧的热反射部分和冷却介质流过的冷却部件 邻近热反射部分的反射表面的反面，用于冷却热反射部分。 液体中没有吸收的辐射热被热反射部反射。 热反射部反射由冷却部冷却的辐射热，使得液体加热器的主体和周边部件保持在不高于预定温度的温度以防止液体过热。

公开(公告)号：US20020125137A1

公开(公告)日：2002-09-12

申请号：US10024291

申请日：2001-12-21

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Shin Sato ,  Takayuki Moribe

IPC: B01D061/48

CPC classification number: B01D61/025 ,  B01D61/48 ,  B01D61/52 ,  B01D61/58 ,  B01J47/08 ,  C02F1/283 ,  C02F1/42 ,  C02F1/444 ,  C02F1/4604 ,  C02F1/4695 ,  C02F9/00 ,  C02F2103/04 ,  C02F2201/46115 ,  Y02A20/131 ,  Y02A20/134

Abstract: An electrodeionization apparatus has an anolyte compartment 17 having an anode 11, a catholyte compartment 18 having a cathode 12, concentrating compartments 15, and desalting compartments 16. The concentrating compartments 15 and the desalting compartments 16 are alternately formed between the anolyte compartment 17 and the catholyte compartment 18 by alternately arranging a plurality of anion-exchange membranes 13 and a plurality of cation-exchange membranes 14. The desalting compartments 16 are filled with ion-exchanger and the concentrating compartments 15 are filled with ion-exchanger, activated carbon, or electric conductor. Electrode water flows into the anolyte compartment 17 and the catholyte compartment 18. Concentrated water is introduced into the concentrating compartments 15. Raw water is fed into the desalting compartment 16 to produce the deionized water from the desalting compartment 16. Water containing silica or boron at a lower concentration than the raw water is introduced into the concentrating compartments 15 as the concentrated water in a direction from a side near an outlet for the deionized water toward a side near an inlet for the raw water of the desalting compartments 16. At least a part of concentrated water flowing out of the concentrating compartments 15 is discharged out of a circulatory system.

Abstract translation: 电去离子装置具有阳极电解液室17，其具有阳极11，具有阴极12的阴极电解液室18，浓缩室15和脱盐室16.浓缩室15和脱盐室16交替地形成在阳极电解液室17和 通过交替布置多个阴离子交换膜13和多个阳离子交换膜14.阴极电解液室18用离子交换器填充脱盐室16，并且浓缩室15填充有离子交换剂，活性炭或 电导体。 电极水流入阳极电解液室17和阴极电解液室18.浓缩的水被引入浓缩室15.原水进入脱盐室16以从脱盐室16产生去离子水。含有二氧化硅或硼的水 比原水较低的浓度作为浓缩水以浓缩水的方式从靠近去离子水的出口的一侧向靠近脱盐室16的原水的入口的一侧引入浓缩室15中。至少 从浓缩室15流出的浓缩水的一部分从循环系统排出。

公开(公告)号：US20020005384A1

公开(公告)日：2002-01-17

申请号：US09947469

申请日：2001-09-07

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Hajime Iseri ,  Yutaka Yoneda ,  Kuniyuki Takahashi

IPC: B01D015/00

CPC classification number: G01N33/1866 ,  C02F1/008 ,  C02F1/50 ,  C02F2103/023 ,  C02F2209/04 ,  G01N17/008

Abstract: According to the method of treating water in a cooling water system, adhesion of fouling is on-line monitored by a compact and inexpensive apparatus and a slime control treatment is intensified according to the result of on-line monitoring. The water treatment is intensified in response to the change of electric potential of a sensor monitoring microbial fouling 11 made of sensitized metallic material. When the electric potential of the sensor exceeds a threshold value, an agent is added through both chemical feeding pumps 15 and 17. When the electric potential lowers to the normal value, the agent is added only through the pump 15.

公开(公告)号：US20250136473A1

公开(公告)日：2025-05-01

申请号：US18836749

申请日：2023-02-02

Applicant: KURITA WATER INDUSTRIES LTD.

Inventor： Kazuki ISHII

IPC: C02F1/26 ,  C02F1/44

Abstract: A method for operating a desalting device having a first desalting device and a second desalting device, includes: a normal operation step, in which a water to be treated is supplied to a first desalting device and separated into a first concentrated water and a first desalted water, and the first concentrated water is supplied to a second desalting device and separated into a second concentrated water and a second desalted water; and a dilute water passing operation step, in which a dilute water having a lower concentration than the first concentrated water is passed through the second desalting device before a corrected permeated water amount of the second desalting device decreases.