Guard ring design enabling in-line testing of silicon bridges for semiconductor packages

    公开(公告)号:US10418312B2

    公开(公告)日:2019-09-17

    申请号:US15749465

    申请日:2015-10-29

    Abstract: Guard ring designs enabling in-line testing of silicon bridges for semiconductor packages, and the resulting silicon bridges and semiconductor packages, are described. In an example, a semiconductor structure includes a substrate having an insulating layer disposed thereon. A metallization structure is disposed on the insulating layer. The metallization structure includes conductive routing disposed in a dielectric material stack. The semiconductor structure also includes a first metal guard ring disposed in the dielectric material stack and surrounding the conductive routing. The first metal guard ring includes a plurality of individual guard ring segments. The semiconductor structure also includes a second metal guard ring disposed in the dielectric material stack and surrounding the first metal guard ring. Electrical testing features are disposed in the dielectric material stack, between the first metal guard ring and the second metal guard ring.

    Alternative surfaces for conductive pad layers of silicon bridges for semiconductor packages

    公开(公告)号:US12243812B2

    公开(公告)日:2025-03-04

    申请号:US18386913

    申请日:2023-11-03

    Abstract: Alternative surfaces for conductive pad layers of silicon bridges for semiconductor packages, and the resulting silicon bridges and semiconductor packages, are described. In an example, a semiconductor structure includes a substrate having a lower insulating layer disposed thereon. The substrate has a perimeter. A metallization structure is disposed on the lower insulating layer. The metallization structure includes conductive routing disposed in a dielectric material stack. First and second pluralities of conductive pads are disposed in a plane above the metallization structure. Conductive routing of the metallization structure electrically connects the first plurality of conductive pads with the second plurality of conductive pads. An upper insulating layer is disposed on the first and second pluralities of conductive pads. The upper insulating layer has a perimeter substantially the same as the perimeter of the substrate.

    LAYER SELECTION FOR ROUTING HIGH-SPEED SIGNALS IN SUBSTRATES

    公开(公告)号:US20240006286A1

    公开(公告)日:2024-01-04

    申请号:US17856795

    申请日:2022-07-01

    Abstract: A substrate comprising a core structure between a first metallization stack and a second metallization stack. A hardware interface is at a side of the second metallization stack. A first interconnect comprises both a first via portion, and a first trace portion which extends from the first via portion in a first routing layer of the first metallization stack. The first via portion extends from the hardware interface, through both the second metallization stack and the core structure, to the first routing layer. A second interconnect comprises both a second via portion, and a second trace portion which extends from the second via portion in the first routing layer. The second via portion extends from the hardware interface, through both the second metallization stack and the core structure, to the first routing layer. A first multi-layer insulator structure adjoins respective sides of the first and second trace portions.

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