公开(公告)号：US09153544B2

公开(公告)日：2015-10-06

申请号：US14194691

申请日：2014-03-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Jose A. Caparas ,  Pandi C. Marimuthu

IPC: H01L23/60 ,  H01L21/56 ,  H01L23/31 ,  H01L23/538 ,  H01L23/00 ,  H01L21/683 ,  H01L23/498 ,  H01L23/552 ,  H01L25/065 ,  H01L25/10

CPC classification number: H01L23/60 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6836 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/6835 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/32145 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/03

Abstract: A semiconductor wafer has a plurality of semiconductor die separated by a saw street. The wafer is mounted to dicing tape. The wafer is singulated through the saw street to expose side surfaces of the semiconductor die. An ESD protection layer is formed over the semiconductor die and around the exposed side surfaces of the semiconductor die. The ESD protection layer can be a metal layer, encapsulant film, conductive polymer, conductive ink, or insulating layer covered by a metal layer. The ESD protection layer is singulated between the semiconductor die. The semiconductor die covered by the ESD protection layer are mounted to a temporary carrier. An encapsulant is deposited over the ESD protection layer covering the semiconductor die. The carrier is removed. An interconnect structure is formed over the semiconductor die and encapsulant. The ESD protection layer is electrically connected to the interconnect structure to provide an ESD path.

Abstract translation: 半导体晶片具有由锯条隔开的多个半导体管芯。 晶片安装在切割胶带上。 通过锯条将晶片分割，以露出半导体管芯的侧表面。 在半导体管芯上并围绕半导体管芯的暴露的侧表面形成ESD保护层。 ESD保护层可以是由金属层覆盖的金属层，密封剂膜，导电聚合物，导电油墨或绝缘层。 ESD保护层在半导体管芯之间分离。 由ESD保护层覆盖的半导体管芯被安装到临时载体上。 密封剂沉积在覆盖半导体管芯的ESD保护层上。 载体被移除。 在半导体管芯和密封剂上形成互连结构。 ESD保护层电连接到互连结构以提供ESD路径。

公开(公告)号：US20150115394A1

公开(公告)日：2015-04-30

申请号：US14553358

申请日：2014-11-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Nathapong Suthiwongsunthorn

IPC: H01L23/552 ,  H01L23/50 ,  H01L23/48 ,  H01L21/768 ,  H01L23/00

CPC classification number: H01L23/552 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/50 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/48 ,  H01L24/85 ,  H01L25/0657 ,  H01L25/50 ,  H01L2223/6677 ,  H01L2224/0554 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/85 ,  H01L2225/06517 ,  H01L2225/06527 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

Abstract: A semiconductor device has a first semiconductor die with a shielding layer formed over its back surface. The first semiconductor die is mounted to a carrier. A first insulating layer is formed over the shielding layer. A second semiconductor die is mounted over the first semiconductor die separated by the shielding layer and first insulating layer. A second insulating layer is deposited over the first and second semiconductor die. A first interconnect structure is formed over the second semiconductor die and second insulating layer. A second interconnect structure is formed over the first semiconductor die and second insulating layer. The shielding layer is electrically connected to a low-impedance ground point through a bond wire, RDL, or TSV. The second semiconductor die may also have a shielding layer formed on its back surface. The semiconductor die are bonded through the metal-to-metal shielding layers.

Abstract translation: 半导体器件具有形成在其背面上的屏蔽层的第一半导体管芯。 第一半导体管芯安装到载体上。 在屏蔽层上形成第一绝缘层。 第二半导体管芯安装在由屏蔽层和第一绝缘层隔开的第一半导体管芯上。 在第一和第二半导体管芯上沉积第二绝缘层。 在第二半导体管芯和第二绝缘层上形成第一互连结构。 在第一半导体管芯和第二绝缘层上形成第二互连结构。 屏蔽层通过接合线，RDL或TSV电连接到低阻抗接地点。 第二半导体管芯也可以在其背面形成有屏蔽层。 半导体管芯通过金属对金属屏蔽层接合。

公开(公告)号：US20140353846A1

公开(公告)日：2014-12-04

申请号：US14462347

申请日：2014-08-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Linda Pei Ee Chua ,  Byung Tai Do ,  Reza A. Pagaila

IPC: H01L23/538 ,  H01L25/065 ,  H01L21/768 ,  H01L25/00

CPC classification number: H01L25/0657 ,  H01L21/288 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L21/76879 ,  H01L21/76885 ,  H01L21/78 ,  H01L23/13 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/48 ,  H01L23/481 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/52 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/17 ,  H01L24/19 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/50 ,  H01L29/40 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/20 ,  H01L2224/2518 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32502 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48228 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2225/1088 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2224/82 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has conductive pillars formed over a carrier. A first semiconductor die is mounted over the carrier between the conductive pillars. An encapsulant is deposited over the first semiconductor die and carrier and around the conductive pillars. A recess is formed in a first surface of the encapsulant over the first semiconductor die. The recess has sloped or stepped sides. A first interconnect structure is formed over the first surface of the encapsulant. The first interconnect structure follows a contour of the recess in the encapsulant. The carrier is removed. A second interconnect structure is formed over a second surface of the encapsulant and first semiconductor die. The first and second interconnect structures are electrically connected to the conductive pillars. A second semiconductor die is mounted in the recess. A third semiconductor die is mounted over the recess and second semiconductor die.

Abstract translation: 半导体器件具有在载体上形成的导电柱。 第一半导体管芯安装在载体之间的导电柱之间。 密封剂沉积在第一半导体管芯和载体上并且围绕导电柱。 在第一半导体管芯上的密封剂的第一表面中形成凹部。 凹槽有倾斜或阶梯。 在密封剂的第一表面上形成第一互连结构。 第一互连结构遵循密封剂中的凹部的轮廓。 载体被移除。 在密封剂和第一半导体管芯的第二表面上形成第二互连结构。 第一和第二互连结构电连接到导电柱。 第二半导体管芯安装在凹槽中。 第三半导体管芯安装在凹槽和第二半导体管芯上。

公开(公告)号：US20140332986A1

公开(公告)日：2014-11-13

申请号：US14340187

申请日：2014-07-24

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Yaojian Lin

IPC: H01L21/56 ,  H01L21/68 ,  H01L23/28

CPC classification number: H01L21/568 ,  H01L21/561 ,  H01L21/565 ,  H01L21/68 ,  H01L21/6835 ,  H01L23/28 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/81 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16 ,  H01L2224/20 ,  H01L2224/73265 ,  H01L2224/81801 ,  H01L2224/97 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device is made by providing a temporary carrier and providing a semiconductor die having a plurality of bumps formed on its active surface. An adhesive material is deposited as a plurality of islands or bumps on the carrier or active surface of the semiconductor die. The adhesive layer can also be deposited as a continuous layer over the carrier or active surface of the die. The semiconductor die is mounted to the carrier. An encapsulant is deposited over the die and carrier. The adhesive material holds the semiconductor die in place to the carrier while depositing the encapsulant. An interconnect structure is formed over the active surface of the die. The interconnect structure is electrically connected to the bumps of the semiconductor die. The adhesive material can be removed prior to forming the interconnect structure, or the interconnect structure can be formed over the adhesive material.

Abstract translation: 半导体器件通过提供临时载体并提供具有在其有源表面上形成的多个凸起的半导体管芯制成。 粘合剂材料作为半导体管芯的载体或有源表面上的多个岛或凸起沉积。 粘合剂层也可以作为连续层沉积在模具的载体或活性表面上。 半导体管芯安装在载体上。 密封剂沉积在模具和载体上。 粘合剂材料在沉积密封剂的同时将半导体管芯保持在载体上。 在模具的有效表面上形成互连结构。 互连结构电连接到半导体管芯的凸点。 可以在形成互连结构之前去除粘合剂材料，或者可以在粘合剂材料上形成互连结构。

公开(公告)号：US20140217609A1

公开(公告)日：2014-08-07

申请号：US14249307

申请日：2014-04-09

Applicant: STATS ChipPAC, Ltd.

Inventor： Byung Tai Do ,  Reza A. Pagaila

IPC: H01L23/48 ,  H01L21/768

CPC classification number: H01L21/76877 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/19 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/02371 ,  H01L2224/04105 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06551 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/00

Abstract: A semiconductor wafer has a plurality of semiconductor die separated by a peripheral region. A trench is formed in the peripheral region of the wafer. A via is formed on the die. The trench extends to and is continuous with the via. A first conductive layer is deposited in the trench and via to form conductive TSV. The first conductive layer is conformally applied or completely fills the trench and via. The trench has a larger area than the vias which accelerates formation of the first conductive layer. A second conductive layer is deposited over a front surface of the die. The second conductive layer is electrically connected to the first conductive layer. The first and second conductive layers can be formed simultaneously. A portion of a back surface of the wafer is removed to expose the first conductive layer. The die can be electrically interconnected through the TSVs.

Abstract translation: 半导体晶片具有由周边区域分离的多个半导体管芯。 在晶片的周边区域形成沟槽。 在管芯上形成通孔。 沟槽延伸到并且与通孔连续。 第一导电层沉积在沟槽和通孔中以形成导电TSV。 第一导电层被保形地施加或完全填充沟槽和通孔。 沟槽具有比加速第一导电层的形成的通孔更大的面积。 第二导电层沉积在管芯的前表面上。 第二导电层电连接到第一导电层。 第一和第二导电层可以同时形成。 去除晶片的后表面的一部分以露出第一导电层。 模具可以通过TSV进行电气互连。

公开(公告)号：US08790962B2

公开(公告)日：2014-07-29

申请号：US13845329

申请日：2013-03-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Rui Huang ,  Yaojian Lin

IPC: H01L21/44 ,  H01L21/48 ,  H01L21/50

CPC classification number: H01L23/552 ,  H01L21/56 ,  H01L21/565 ,  H01L23/3121 ,  H01L23/3128 ,  H01L24/48 ,  H01L24/73 ,  H01L25/0655 ,  H01L2224/0554 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73207 ,  H01L2224/73265 ,  H01L2224/81005 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15174 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

Abstract: A semiconductor device is made by forming an interconnect structure over a substrate. A semiconductor die is mounted to the interconnect structure. The semiconductor die is electrically connected to the interconnect structure. A ground pad is formed over the interconnect structure. An encapsulant is formed over the semiconductor die and interconnect structure. A shielding cage can be formed over the semiconductor die prior to forming the encapsulant. A shielding layer is formed over the encapsulant after forming the interconnect structure to isolate the semiconductor die with respect to inter-device interference. The shielding layer conforms to a geometry of the encapsulant and electrically connects to the ground pad. The shielding layer can be electrically connected to ground through a conductive pillar. A backside interconnect structure is formed over the interconnect structure, opposite the semiconductor die.

Abstract translation: 通过在衬底上形成互连结构来制造半导体器件。 将半导体管芯安装到互连结构。 半导体管芯与互连结构电连接。 在互连结构上形成接地焊盘。 在半导体管芯和互连结构上形成密封剂。 在形成密封剂之前，可以在半导体管芯上方形成屏蔽笼。 在形成互连结构之后，在密封剂之上形成屏蔽层，以便相对于器件间干扰来隔离半导体管芯。 屏蔽层符合密封剂的几何形状并且电连接到接地垫。 屏蔽层可以通过导电柱电连接到地面。 在互连结构上形成背面互连结构，与半导体管芯相对。

公开(公告)号：US20140203443A1

公开(公告)日：2014-07-24

申请号：US14224931

申请日：2014-03-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Shuangwu Huang

IPC: H01L23/528 ,  H01L23/00

CPC classification number: H01L24/18 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/528 ,  H01L23/5283 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2223/6677 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01061 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/1902 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device is made by providing a sacrificial substrate and depositing an adhesive layer over the sacrificial substrate. A first conductive layer is formed over the adhesive layer. A polymer pillar is formed over the first conductive layer. A second conductive layer is formed over the polymer pillar to create a conductive pillar with inner polymer core. A semiconductor die or component is mounted over the substrate. An encapsulant is deposited over the semiconductor die or component and around the conductive pillar. A first interconnect structure is formed over a first side of the encapsulant. The first interconnect structure is electrically connected to the conductive pillar. The sacrificial substrate and adhesive layers are removed. A second interconnect structure is formed over a second side of the encapsulant opposite the first interconnect structure. The second interconnect structure is electrically connected to the conductive pillar.

Abstract translation: 通过提供牺牲衬底并在牺牲衬底上沉积粘合剂层来制造半导体器件。 在粘合剂层上形成第一导电层。 聚合物柱形成在第一导电层上。 在聚合物柱上方形成第二导电层以产生具有内聚合物芯的导电柱。 半导体管芯或部件安装在衬底上。 密封剂沉积在半导体管芯或部件上并且围绕导电柱。 第一互连结构形成在密封剂的第一侧上。 第一互连结构电连接到导电柱。 去除牺牲基底和粘合剂层。 在与第一互连结构相对的密封剂的第二侧上形成第二互连结构。 第二互连结构电连接到导电柱。

公开(公告)号：US08703610B2

公开(公告)日：2014-04-22

申请号：US13691578

申请日：2012-11-30

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Nathapong Suthiwongsunthorn

IPC: H01L21/44

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/76898 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014

Abstract: A semiconductor wafer has an insulating layer formed over an active surface of the wafer. A conductive layer is formed over the insulating layer. A first via is formed from a back surface of the semiconductor wafer through the semiconductor wafer and insulating layer to the conductive layer. A conductive material is deposited in the first via to form a conductive TSV. An insulating material can be deposited in the first via to form an insulating core within the conductive via. After forming the conductive TSV, a second via is formed around the conductive TSV from the back surface of the semiconductor wafer through the semiconductor wafer and insulating layer to the conductive layer. An insulating material is deposited in the second via to form an insulating annular ring. The conductive via can be recessed within or extend above a surface of the semiconductor die.

Abstract translation: 半导体晶片具有在晶片的有效表面上形成的绝缘层。 在绝缘层上形成导电层。 第一通孔从半导体晶片的背面通过半导体晶片和绝缘层形成到导电层。 导电材料沉积在第一通孔中以形成导电TSV。 可以在第一通孔中沉积绝缘材料，以在导电通孔内形成绝缘芯。 在形成导电TSV之后，通过半导体晶片和绝缘层从导电TSV周围形成第二通孔，从半导体晶片的背表面到导电层。 绝缘材料沉积在第二通孔中以形成绝缘环形环。 导电通孔可以凹入半导体管芯的表面内或延伸到半导体管芯的表面之上。

公开(公告)号：US20140001627A1

公开(公告)日：2014-01-02

申请号：US14017963

申请日：2013-09-04

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Linda Pei Ee Chua

IPC: H01L23/36 ,  H01L21/56

CPC classification number: H01L25/0657 ,  H01L21/56 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/36 ,  H01L23/3677 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L2223/6677 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/32145 ,  H01L2224/73267 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00

Abstract: A semiconductor device has a first thermally conductive layer formed over a first surface of a semiconductor die. A second surface of the semiconductor die is mounted to a sacrificial carrier. An encapsulant is deposited over the first thermally conductive layer and sacrificial carrier. The encapsulant is planarized to expose the first thermally conductive layer. A first insulating layer is formed over the second surface of the semiconductor die and a first surface of the encapsulant. A portion of the first insulating layer over the second surface of the semiconductor die is removed. A second thermally conductive layer is formed over the second surface of the semiconductor die within the removed portion of the first insulating layer. An electrically conductive layer is formed within the insulating layer around the second thermally conductive layer. A heat sink can be mounted over the first thermally conductive layer.

Abstract translation: 半导体器件具有形成在半导体管芯的第一表面上的第一导热层。 半导体管芯的第二表面安装到牺牲载体上。 密封剂沉积在第一导热层和牺牲载体上。 将密封剂平坦化以暴露第一导热层。 第一绝缘层形成在半导体管芯的第二表面和密封剂的第一表面上。 半导体管芯的第二表面上的第一绝缘层的一部分被去除。 在第一绝缘层的去除部分内的半导体管芯的第二表面上形成第二导热层。 在第二导热层周围的绝缘层内形成导电层。 散热器可以安装在第一导热层上。

公开(公告)号：US20130299982A1

公开(公告)日：2013-11-14

申请号：US13944825

申请日：2013-07-17

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo ,  HeeJo Chi

IPC: H01L23/498 ,  H01L21/56

CPC classification number: H01L21/56 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/13 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/552 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32145 ,  H01L2224/45015 ,  H01L2224/48091 ,  H01L2224/48157 ,  H01L2224/48158 ,  H01L2224/4816 ,  H01L2224/73203 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81001 ,  H01L2224/812 ,  H01L2224/81801 ,  H01L2224/83 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06589 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15151 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/1532 ,  H01L2924/15331 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19041 ,  H01L2924/19105 ,  H01L2924/207 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099

Abstract: A semiconductor device has an interposer mounted over a carrier. The interposer includes TSV formed either prior to or after mounting to the carrier. An opening is formed in the interposer. The interposer can have two-level stepped portions with a first vertical conduction path through a first stepped portion and second vertical conduction path through a second stepped portion. A first and second semiconductor die are mounted over the interposer. The second die is disposed within the opening of the interposer. A discrete semiconductor component can be mounted over the interposer. A conductive via can be formed through the second die or encapsulant. An encapsulant is deposited over the first and second die and interposer. A portion of the interposer can be removed to that the encapsulant forms around a side of the semiconductor device. An interconnect structure is formed over the interposer and second die.

Abstract translation: 半导体器件具有安装在载体上的插入器。 插入器包括在安装到载体之前或之后形成的TSV。 在插入器中形成开口。 插入器可以具有通过第一阶梯部分的第一垂直传导路径和穿过第二阶梯部分的第二垂直传导路径的两级台阶部分。 第一和第二半导体管芯安装在插入件上。 第二管芯设置在插入件的开口内。 分立半导体部件可以安装在插入器上。 可以通过第二管芯或密封剂形成导电通孔。 密封剂沉积在第一和第二管芯和插入件上。 插入器的一部分可以被去除，使得密封剂围绕半导体器件的一侧形成。 互连结构形成在插入件和第二管芯上。