Abstract:
Processes for making toners, and in particular, emulsion aggregation (EA) toners. These toners exhibit a low melt temperature while simultaneously exhibiting excellent relative humidity sensitivity regarding charging properties. In embodiments, the process comprises the preparation of the latex emulsion comprising high ratio resin compositions by injection of steam and neutralization agent vapors into the latex emulsion.
Abstract:
A method and structure for a device including a non-contact gap control device for maintaining a distance between surfaces can include a pliable platform, a frame to which the pliable platform is secured, an aerodynamic floating (AF) head attached to the pliable platform and a probe for measuring, testing, and/or characterizing a substrate adjacent to the AF head. A pressurized gas source can be coupled to the AF head, such that a pressurized gas is ejected onto the substrate to maintain a distance between the substrate and the AF head during measurement. While the frame can be held immobile, the pliable platform can react in response to irregularities in the substrate to maintain a generally constant distance between the AF head and the substrate.
Abstract:
There is described an image forming apparatus that includes an imaging member having a charge retentive-surface for developing an electrostatic latent image thereon. The imaging member includes a substrate and photoconductive member disposed on the substrate. The image forming apparatus includes a charging unit for applying an electrostatic charge on the imaging member to a predetermined electric potential wherein the charging unit is spaced from the photoconductive member a distance of from about 3 μm to about 300 μm. The image forming apparatus includes a delivery member in contact with the surface of the photoconductive member. The delivery member includes an elastomeric matrix impregnated with a liquid lubricant wherein the delivery member applies a layer of liquid lubricant to the surface of the photoconductor wherein in the layer has a thickness of from about 1 nm to about 15 nm during steady state operation.