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公开(公告)号：US09568831B2
公开(公告)日：2017-02-14
申请号：US14361256
申请日：2012-12-20
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Arno Jan Bleeker
CPC classification number: G03F7/70058 , G03F7/70358 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70525 , G03F7/70558
Abstract: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.
Abstract translation: 光刻或曝光装置具有投影系统和控制器。 投影系统包括固定部分和移动部分。 投影系统被配置为将多个辐射束投影到目标上的位置上。 基于模式选择位置。 控制器被配置为控制设备以第一模式或第二模式操作。 在第一模式中，投影系统向选定位置传送第一量的能量。 在第二模式中，投影系统将第二量的能量传送到所选择的位置。 第二量的能量大于第一能量。
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Patent Agency Ranking
公开(公告)号：US09494869B2
公开(公告)日：2016-11-15
申请号：US14357530
申请日：2012-12-05
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Maria Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括：投影系统，被配置为将多个辐射束投影到目标上; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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63.发明授权Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program 有权平版印刷装置，用于提供设定点数据的装置，装置制造方法，计算设定点数据的方法和计算机程序公开(公告)号：US09488921B2
公开(公告)日：2016-11-08
申请号：US14356357
申请日：2012-11-15
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70508 , G03F7/70291 , G03F7/70391 , G03F7/70558
Abstract: An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.
Abstract translation: 一种曝光装置，被配置为将多个辐射束中的每一个投射到目标上的相应位置上，所述多个辐射束经由多个斑点曝光形成期望的剂量图案，剂量分布中特征点的标称位置 每个点曝光位于定义第一格栅的点上。 该装置具有或提供来自控制器的数据，该控制器被配置为：计算多个辐射束中的每一个的目标强度值以将目标暴露于期望的剂量模式，该计算使用所需剂量的光栅化表示 图案，光栅化表示包括在第二格栅上的多个点中的每一个处限定的剂量值，第一和第二栅格具有相同的几何形状，并且控制曝光装置发射具有目标强度值的光束。
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公开(公告)号：US09482962B2
公开(公告)日：2016-11-01
申请号：US14481740
申请日：2014-09-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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65.发明授权Lithographic apparatus involving an immersion liquid supply system with an aperture 有权涉及具有孔径的浸没液体供应系统的平版印刷设备公开(公告)号：US09285686B2
公开(公告)日：2016-03-15
申请号：US14586468
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Marie Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
Abstract translation: 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。
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公开(公告)号：US20140354970A1
公开(公告)日：2014-12-04
申请号：US14361256
申请日：2012-12-20
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Arno Jan Bleeker
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70358 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70525 , G03F7/70558
Abstract: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller is configured to control the apparatus to operate in a first mode or a second mode. In the first mode the projection system delivers a first amount of energy to the selected locations. In the second mode the projection system delivers a second amount of energy to the selected locations. The second amount of energy is greater than the first amount of energy.
Abstract translation: 光刻或曝光装置具有投影系统和控制器。 投影系统包括固定部分和移动部分。 投影系统被配置为将多个辐射束投影到目标上的位置上。 基于模式选择位置。 控制器被配置为控制设备以第一模式或第二模式操作。 在第一模式中，投影系统向选定位置传送第一量的能量。 在第二模式中，投影系统将第二量的能量传送到所选择的位置。 第二量的能量大于第一能量。
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