Abstract:
A compact, selfshielded electron beam processing technique for three dimensional products includes a treatment zone bounded by at least one material of high atomic number. Energetic electrons are directed into the treatment zone in such a manner that electron reflection from the boundary of the treatment zone assists in filling the treatment zone with energetic electrons. The products to be treated are caused to travel through the treatment zone without any mechanical contact therewith (such as by ballistic or pneumatic techniques).
Abstract:
A surface discharge plasma cathode electron beam generating assembly (1) includes an anode (2) maintainable at a substantially constant first potential, a cathode device (3) having a first electrically conductive member (4), a dielectric member (5) at least partially surrounding the first member (4) and electrically conductive means (6) located on the outer surface of the dielectric member (5) and insulated therefrom. A capacitative divider circuit (7) is provided for maintaining the first electrically conductive member (4) at a second potential different from the first potential and for maintaining the electrically conductive means (6) at a high negative third potential relative to the first and second potentials.
Abstract:
An electrode array forms a latent image by generating an electrical breakdown region and extracting an imagewise distribution of charge carriers which are accelerated toward a separate surface. Different control mechanisms, environments and ranges of operating parameters provide controlled amounts of charge delivered by electrons or ions for improved latent image production. High speed, high resolution and high uniformity of charge deposition are accomplished by different structures within the scope of the invention.
Abstract:
An envelope apparatus is provided for facilitating the production of a vacuum at a localized region on the surface of an article such as a semiconductor wafer. The vacuum permits vacuum processing in the localized region. The envelope apparatus includes an internal processing zone in which the requisite processing level vacuum is maintained. The envelope apparatus also includes intermediate vacuum zones surrounding the internal processing zone. The internal processing zone and surrounding intermediate vacuum zones are exposed at an external surface so that when the external surface is placed in spaced apart, close coupled opposition to the article being processed a graded vacuum seal is formed. The graded seal extends from the internal processing zone, past the intermediate vacuum zones and out to ambient. The envelope apparatus is held either in a fixed position with respect to the surface of the article or actively tracks the topography of the surface of the article so that the gap between the external surface and the surface of the article lies within an acceptable range. For semiconductor processing applications, it has been found that a graded seal formed by two-stage differential pumping and having a gap in the range of 20 micrometers to 40 micrometers will permit vacuums on the order of 10.sup.-5 Torr to be maintained within the interior processing zone of the envelope apparatus.
Abstract:
The weight of an electroluminescent instrument panel is substantially reduced by manufacturing it from a pair of complementary plastic shells, which are molded together by a potting compound. The front shell of the panel is made by vacuum drawing a sheet of plastic over a first die plate, which forms in the back of the sheet a central recess, which has therein a plurality of rearwardly projecting, hollow bosses, and which is surrounded by a shallow overflow trough. One or more EL lamp elements are placed in the central recess with registering openings therein positioned over and surrounding the rearwardly projecting bosses, after which a potting compound is poured into the central recess to cover the EL elements. The complementary rear or back shell, which is also vacuum formed over a second die plate, is then forced into the back of the front shell, thereby causing excess potting material to flow out of the central recess in the front shell and into the surrounding overflow trough. After the potting compound has set the trough section containing the excess potting compound and the closed ends of the registering bosses in the complementary shells are milled away to provide openings for instruments and panel mounting screws.
Abstract:
An electron beam device having a vacuum chamber in which an electron beam generator generates a directed stream of electrons. An electron beam window comprising a foil which seals the vacuum chamber is in the path of the stream of electrons and permits passage of the stream of electrons into a working region exterior of the chamber and adjacent the electron beam window. An electrode is positioned closely adjacent the foil and a second electrode is spaced from the foil to form an elongated working or, in the case of a laser, a lasing region between them. The electrodes are maintained at a high electrical potential which, along with the electron beam, molecularly excites a gaseous working medium between the electrodes. The included angle of electrons passing through and scattered by the foil is limited and the electron beam confined to a desired region by an external shield or bezel overlying the foil. The bezel is provided with a series of openings which may be in the form of holes or slots of predetermined depth, size and spacing one from another to provide the electrons emerging from the foil with a desired included angle of emergence while maintaining losses at a minimum.
Abstract:
An orifice for coupling a highly-evacuated electron beam gun to a rotating print form cylinder for engraving is provided such that the gun has a rigid cover with an opening for the electron beam at its end facing the print form cylinder and a flexible band is arranged at the cover which partially surrounds the print form cylinder. The band is pivoted at the cover and at least one of the pivot points is elastically designed and pivoting occurs with the aid of springs which are adjustable with respect to the spring force.