公开(公告)号：US06690469B1

公开(公告)日：2004-02-10

申请号：US09397334

申请日：1999-09-14

Applicant: Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

Inventor： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC: G01J400

CPC classification number: G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

Abstract: A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

Abstract translation: 公开了能够利用这些缺陷的高分辨率光学图像检测更细的缺陷的缺陷检查装置，并且使得半导体器件的细线图案之间的对比度差异更大。 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US06650415B2

公开(公告)日：2003-11-18

申请号：US10206428

申请日：2002-07-26

Applicant: David E. Aspnes ,  Jon Opsal

Inventor： David E. Aspnes ,  Jon Opsal

IPC: G01J400

CPC classification number: G01J3/02 ,  G01J3/0229 ,  G01J3/0232 ,  G01N21/211 ,  G01N2021/213

Abstract: An ellipsometer, and a method of ellipsometry, for analyzing a sample using a broad range of wavelengths, includes a light source for generating a beam of polychromatic light having a range of wavelengths of light for interacting with the sample. A polarizer polarizes the light beam before the light beam interacts with the sample. A rotating compensator induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135° to 225°, and at least a second phase retardation value is induced that is outside of the primary range. An analyzer interacts with the light beam after the light beam interacts with the sample. A detector measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor determines the polarization state of the beam as it impinges the analyzer from the light intensities measured by the detector.

公开(公告)号：US06611331B2

公开(公告)日：2003-08-26

申请号：US10218242

申请日：2002-08-15

Applicant: Makoto Nakazawa

Inventor： Makoto Nakazawa

IPC: G01J400

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01N21/8422

Abstract: The surface form of a semiconductor thin film such as a polysilicon film formed on a semiconductor substrate is measured through spectro-ellipsometry or measured by performing an IPA quantitative analysis through GC. Mass (gas chromatography) after exposing the semiconductor thin film to IPA (isopropyl alcohol) vapor and drying the semiconductor thin film. Through either of these methods, the surface form of the polysilicon film can be easily and quickly measured.

Abstract translation: 半导体衬底上形成的多晶硅膜等半导体薄膜的表面形状通过分光椭圆偏光法测定，或者通过GC进行IPA定量分析来测定。 将半导体薄膜暴露于IPA（异丙醇）蒸气并干燥半导体薄膜后的质谱（气相色谱）。 通过这些方法中的任一种，可以容易且快速地测量多晶硅膜的表面形式。

公开(公告)号：US06600560B2

公开(公告)日：2003-07-29

申请号：US09845763

申请日：2001-05-02

Applicant: Hakon Mikkelsen ,  Horst Engel ,  Lambert Danner ,  Christof Stey

Inventor： Hakon Mikkelsen ,  Horst Engel ,  Lambert Danner ,  Christof Stey

IPC: G01J400

CPC classification number: G01B11/0641 ,  G01N21/211

Abstract: The invention concerns an optical measurement arrangement having an ellipsometer, in which an incident beam (16) of polarized light is directed at an angle of incidence &agr;≠0° onto a measurement location (M) on the surface of a specimen (P). Information concerning properties of the specimen (P), preferably concerning layer thicknesses and optical material properties such as refractive index n, extinction coefficient k, and the like, is obtained from an analysis of a return beam (17) reflected from the specimen (P). The incident beam (16) is directed by a mirror objective (15) onto the surface of the specimen (P). The return beam (17) is also captured by the mirror objective (15). The result is to create an optical measurement arrangement, operating on the ellipsometric principle, which has a simple, compact configuration and permits a high measurement accuracy down to the sub-nanometer range.

公开(公告)号：US06567213B2

公开(公告)日：2003-05-20

申请号：US10141256

申请日：2002-05-08

Applicant: Allan Rosencwaig ,  Jon Opsal

Inventor： Allan Rosencwaig ,  Jon Opsal

IPC: G01J400

CPC classification number: G01B11/0641

Abstract: An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.

公开(公告)号：US06563582B1

公开(公告)日：2003-05-13

申请号：US09415045

申请日：1999-10-07

Applicant: Cornell Seu Lun Chun

Inventor： Cornell Seu Lun Chun

IPC: G01J400

CPC classification number: G02B5/1814 ,  G01J4/04 ,  G02B5/3083

Abstract: In addition to having color, light waves have the attribute of polarization. An apparatus and method to convert circular polarized light into linearly polarized light over a wide range of wavelengths is provided by utilizing a first surface-relief grating functioning as a quarter-wave waveplate and a second surface-relief grating functioning as a half-wave waveplate. A plurality of such devices are arranged in a two-dimensional array and combined with an array of linear polarizers and an array of photodetectors to form a polarization imaging sensor. Such a sensor could have applications in automobiles to alert drivers of the presence of other vehicles, especially at night, in fog, or in rain. Military applications include the detection of vehicles placed among trees and shrubs. Another advantage of using circular polarization images is that the sign and magnitude of the circular polarization can potentially be used to reveal the spatial orientation, material, and surface roughness of the object's surface.

Abstract translation: 除了具有颜色之外，光波具有极化的属性。 通过利用用作四分之一波片的第一表面浮雕光栅和用作半波波片的第二表面浮雕光栅提供了将圆偏振光转换成宽波长范围内的线偏振光的装置和方法 。 多个这样的器件被布置成二维阵列并与线性偏振器阵列和光电检测器阵列组合以形成偏振成像传感器。 这种传感器可以在汽车中应用，以警告驾驶员其他车辆的存在，特别是在夜间，雾中或雨中。 军事应用包括检测树木和灌木之间的车辆。 使用圆偏振图像的另一个优点是圆偏振的符号和大小可潜在地用于显示物体表面的空间取向，材料和表面粗糙度。

公开(公告)号：US06549283B2

公开(公告)日：2003-04-15

申请号：US09894250

申请日：2001-06-27

Applicant: John Eckert

Inventor： John Eckert

IPC: G01J400

CPC classification number: G01J4/04

Abstract: Source light of unknown polarization is input into a polarization controller. The polarization controller transforms the polarization of the source light to a plurality of different polarizations. The transformed source light output by the polarization controller is input to a fixed polarizer, which passes a maximal transmitted intensity of the transformed source light at a given transformation perpendicular to an axis of propagation of the source light. The polarizer passes a minimal transmitted intensity of the transformed source light at a transformation orthogonal to the transformation at which the maximal transmitted intensity is passed. The discriminated transformed source light output by the fixed polarizer is input to a light-wave power meter, which measures the intensity thereof. The maximal and minimal measured transmitted intensities of the discriminated transformed source light can be used to determine the DOP of the source light. In the alternative, Mueller calculus can be used to determine the degree of polarization when at least four polarization transformations are performed by the polarization controller and angles by which a half-wave plate and a quarter-wave plate of the polarization controller are rotated are known.

公开(公告)号：US06535286B1

公开(公告)日：2003-03-18

申请号：US09531877

申请日：2000-03-21

Applicant: Steven E. Green ,  Gerald Cooney

Inventor： Steven E. Green ,  Gerald Cooney

IPC: G01J400

CPC classification number: G01J4/04 ,  G01J3/02 ,  G01J3/0235

Abstract: Disclosed are spectrophotometer, polarimeter, and ellipsometer systems which have multiple easily, sequentially, positionable detector systems therein mounted to allow easy positioning thereof, to for instance, allow sequential monitoring of ellipsometric and spectrophotometric signals, without removal of any detector system from the spectrophotometer, polarimeter, or ellipsometer system. Also disclosed are methods of use wherein-different detectors in a positionable multiple detector containing system are utilized during different electromagnetic beam detection steps.

Abstract translation: 公开了分光光度计，偏振计和椭偏仪系统，其中安装有多个容易，依次可定位的检测器系统，其允许容易地定位，例如允许连续监测椭偏仪和分光光度信号，而不从分光光度计中去除任何检测器系统， 偏振计或椭偏仪系统。 还公开了使用方法，其中在不同的电磁束检测步骤期间利用可定位的多检测器容纳系统中的不同检测器。

公开(公告)号：US06501548B1

公开(公告)日：2002-12-31

申请号：US09883602

申请日：2001-06-18

Applicant: Rudolf Oldenbourg

Inventor： Rudolf Oldenbourg

IPC: G01J400

CPC classification number: G01N21/21

Abstract: A method for measuring sample retardance in the presence of spurious background retardance contributed by optical components such as strained lenses in the measurement system, which is accurate where there is a retardance in excess of 15 degrees in the sample, the background, or the combination thereof. The method can be applied to imaging systems that record polarized light intensities for obtaining retardance magnitude and angular orientation values at all points in a scene simultaneously. The system first takes images that record the apparent slow axis orientation and the apparent retardance of the sample at all image points. Then the sample is removed and images are taken that record the background retardance alone. Algorithms for minimizing the effect of the background retardance on the measured sample retardance make use of the separately measured polarized light intensities of sample with background and of the background alone. The algorithms can be applied to each picture element simultaneously and do not make use of spatial relationships or distributions within the sample.

Abstract translation: 在测量系统中的诸如应变透镜之类的光学部件所造成的杂散背景延迟的存在下测量样品延迟的方法，其在样品中的延迟超过15度，背景或其组合是准确的 。 该方法可以应用于记录偏振光强度以在场景中的所有点处获得延迟幅度和角度定向值的成像系统。 系统首先拍摄在所有图像点记录样品的明显慢轴取向和表观延迟的图像。 然后取出样品，拍摄记录背景延迟的图像。 用于最小化背景延迟对测量的样品延迟的影响的算法使用单独测量的具有背景和背景的样品的偏振光强度。 这些算法可以同时应用于每个图像元素，并且不会利用样本中的空间关系或分布。

公开(公告)号：US06486952B2

公开(公告)日：2002-11-26

申请号：US09864678

申请日：2001-05-24

Applicant: Nobuaki Takeuchi

Inventor： Nobuaki Takeuchi

IPC: G01J400

CPC classification number: G01N21/21 ,  G01J4/00

Abstract: In the present invention, measuring the one-dimensional or two-dimensional voltage distribution or electrical field distribution in a measured device is made possible, and a reduction in the measuring time can be implemented. The present invention comprises a first optical system (2, 3) wherein light emitted from the light source is shaped into a line-shaped light beam and irradiates a desired measurement line in the measured device via the electrooptic element, a second optical system (7, 8, 9) that maintains as-is the shape of the line-shaped light beam reflected from the desired measurement line in the measured device after transiting the electro-optic element, a light receiving device (10) that receives the line-shaped light beam emitted from the second optical system and converts each of the measured points to an electrical signal depending on the strength of each light beam reflected at each of the measured points on the desired measurement line on the measured device and outputs the result, and a signal processing device (11, 12, 13, 14, 16) that calculates the voltage or electrical field at each of the measured points of the measured device from the output signal of the light receiving device and calculates the electrical field distribution or the voltage distribution at the measured part of measured device.

Abstract translation: 在本发明中，可以测量测量装置中的一维或二维电压分布或电场分布，并且可以实现测量时间的减少。 本发明包括第一光学系统（2,3），其中从光源发射的光被成形为线状光束，并且经由电光元件在测量的装置中照射期望的测量线，第二光学系统（7 ，8,9），其在转移所述电光元件之后维持从所述测量装置中的期望测量线反射的所述线状光束的形状，接收所述线形的光接收装置（10） 从第二光学系统发射的光束，并且根据在测量装置上的期望测量线上的每个测量点反射的每个光束的强度将每个测量点转换成电信号，并输出结果， 信号处理装置（11,12,13,14,16），其从所述光接收装置的输出信号和所述测量装置计算所测量的装置的每个测量点处的电压或电场 计算被测器件测量部分的电场分布或电压分布。