NOTCH FILTER WITH SUCCESSIVE WINDOWED INTEGRATIONS, RELATED BAND-PASS FILTERING DEVICE, FREQUENCY DETECTION SYSTEM AND PROCESSING METHOD

    公开(公告)号:US20220123771A1

    公开(公告)日:2022-04-21

    申请号:US17450574

    申请日:2021-10-12

    Inventor: Gilles MASSON

    Abstract: This electronic notch filter is able to receive an input signal and deliver a filtered signal having an amplitude, at a cut-off frequency, that is attenuated with respect to that of the input signal.
    It comprises a module for integrating the input signal during several successive time windows, each time window starting at a respective initial time instant and having a duration substantially equal to the inverse of the cut-off frequency, the initial temporal time instants of at least two distinct windows being separated by a temporal shift of a value greater than or equal to a predefined reference duration, each integration of the input signal during a respective temporal window resulting in a respective intermediate signal; and a module for summing the intermediate signals coming from the integration module; the filtered signal depending on the sum of said intermediate signals.

    IMAGE SENSOR
    84.
    发明申请

    公开(公告)号:US20220093656A1

    公开(公告)日:2022-03-24

    申请号:US17477332

    申请日:2021-09-16

    Abstract: An image sensor including a plurality of pixels, each including: a photodetector semiconductor region; a metal region arranged on a first surface of the semiconductor region; a band-pass or band-stop interference filter arranged on a second surface of the semiconductor region opposite to the first surface; and between the semiconductor region and the metal region, an absorbing stack comprising, in the order from the semiconductor region, a dielectric layer, a silicon layer, and a tungsten layer.

    CHIP WITH BIFUNCTIONAL ROUTING AND ASSOCIATED METHOD OF MANUFACTURING

    公开(公告)号:US20220093501A1

    公开(公告)日:2022-03-24

    申请号:US17479472

    申请日:2021-09-20

    Abstract: A functional chip includes a substrate including a first face and a second face, the second face of the substrate forming the front face of the functional chip; a first oxide layer on the first face of the substrate; a second oxide layer on the first oxide layer; a first routing level formed on the surface of the second oxide layer in contact with the first oxide layer; a third oxide layer on the second oxide layer wherein a semiconductor component is inserted; a rear face formed by the surface of the third oxide layer opposite the second oxide layer, the rear face including superconductor routing tracks surrounded at least partially by one or more conductor routing tracks, the semiconductor component being connected to the superconductor routing tracks via superconductor vias and the conductor routing tracks of the rear face being connected to the routing level via conductor vias.

    SEMICONDUCTOR DIODE AND METHOD OF MANUFACTURING SUCH A DIODE

    公开(公告)号:US20220037538A1

    公开(公告)日:2022-02-03

    申请号:US17381043

    申请日:2021-07-20

    Inventor: Julien Buckley

    Abstract: A semiconductor diode, including: a first doped semiconductor region of a first conductivity type; a second doped semiconductor region of a second conductivity type opposite to the first conductivity type, arranged on top of and in contact with the upper surface of the first semiconductor region; a first conductive region arranged on top of and in contact with the upper surface of the second semiconductor region, the first conductive region comprising a through opening opposite a portion of the second semiconductor region; a second conductive region made of a material different from that of the first conductive region, coating the upper surface of the second semiconductor region opposite said opening; a cavity extending through the second conductive region and through the second semiconductor region opposite a portion of said opening; a dielectric region coating the lateral walls and the bottom of the cavity; a third conductive region coating the dielectric region on the lateral walls and at the bottom of the cavity, the third conductive region being further electrically in contact with the first and second conductive regions.

    METHOD FOR DETERMINING AN AGEING FUNCTION OF AN ACCUMULATOR

    公开(公告)号:US20220011374A1

    公开(公告)日:2022-01-13

    申请号:US17305527

    申请日:2021-07-09

    Abstract: A method for determining an ageing function of an accumulator, the ageing function representing a variation in the capacity or resistance of the accumulator, as a function of variables representative of the operation of the accumulator, the method including carrying out a plurality of experimental cycles of charging and discharging a test accumulator, each cycle being parameterised by accumulator operating parameters that vary as a function of time during the various cycles; b) during experimental cycles, determining experimental data, including a value of each variable parameter, and determining the capacity or the resistance; c) on the basis of the experimental data resulting from b), determining the ageing function of the accumulator; wherein in step a), the variable parameters include the state of charge and a depth of discharge, such that, following step c), the variables of the ageing function with the state of charge and the depth of discharge.

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