公开(公告)号：US08233695B2

公开(公告)日：2012-07-31

申请号：US11956087

申请日：2007-12-13

Applicant: Satoshi Usui ,  Hideki Kanai ,  Koji Hashimoto

Inventor： Satoshi Usui ,  Hideki Kanai ,  Koji Hashimoto

IPC: G06K9/00 ,  G03F1/00

CPC classification number: G06T7/0006 ,  G06T2207/30148

Abstract: A method of generating an inspection data used for inspecting an inspection-object pattern on a substrate, the inspection-object pattern formed by transferring a first mask pattern formed on a first mask and a second mask pattern formed on a second mask onto one layer on the substrate, a part of a first transferred pattern of the first mask pattern and a part of a second transferred pattern of the second mask pattern being overlapped on the layer. The method performs a corner process on each corner of a first design data of the first mask pattern and each corner of a second design data of the second mask pattern and generates an inspection data by performing a logical operation using the corner-processed first design data and the corner processed second design data.

Abstract translation: 一种生成用于检查基板上的检查对象图案的检查数据的方法，所述检查对象图案通过将形成在第一掩模上的第一掩模图案和形成在第二掩模上的第二掩模图案转印到一个层上而形成 衬底，第一掩模图案的第一转印图案的一部分和第二掩模图案的第二转印图案的一部分重叠在该层上。 该方法对第一掩模图案的第一设计数据的第一设计数据和第二掩模图案的第二设计数据的每个角的每个角落执行拐角处理，并且通过使用经角落处理的第一设计数据执行逻辑运算来生成检查数据 并且角落处理了第二个设计数据。

公开(公告)号：US08163611B2

公开(公告)日：2012-04-24

申请号：US11643907

申请日：2006-12-22

Applicant: Koji Hashimoto ,  Soichi Inoue ,  Kazuhiro Takahata ,  Kei Yoshikawa

Inventor： Koji Hashimoto ,  Soichi Inoue ,  Kazuhiro Takahata ,  Kei Yoshikawa

IPC: H01L21/8249

CPC classification number: G03F7/0035 ,  H01L21/0338 ,  H01L21/28123 ,  H01L21/32139 ,  H01L21/823456 ,  H01L21/823475 ,  H01L27/10873 ,  H01L27/10894 ,  H01L27/10897

Abstract: A resist pattern (5) is formed in a dimension of a limitation of an exposure resolution over a hard mask material film (4) over a work film (3). The material film (4) is processed using the resist pattern (5) as a mask. A hard mask pattern (6) is thereby formed. Thereby a resist pattern (7), over a non-selected region (6b), having an opening (7a) through which a selection region (6a) in the mask pattern is exposed is formed. Only the mask pattern (6a) exposed through the opening (7a) is slimmed by performing a selection etching, the work film (3) is etched by using the mask pattern (6). A work film pattern (8) is thereby formed, which include a wide pattern section (8a) of a dimension width of the limitation of the exposure resolution and a slimmed pattern section (8a) of a dimension that is not more than the limitation of the exposure resolution.

Abstract translation: 在工作薄膜（3）上的硬掩模材料膜（4）上的曝光分辨率的限制的尺寸形成抗蚀剂图案（5）。 使用抗蚀剂图案（5）作为掩模来处理材料膜（4）。 由此形成硬掩模图案（6）。 由此，形成具有开口（7a）的非选择区域（6b）上的抗蚀剂图案（7），掩模图案中的选择区域（6a）通过该开口露出。 通过进行选择蚀刻，只有通过开口（7a）露出的掩模图案（6a）变薄，通过使用掩模图案（6）蚀刻工作膜（3）。 由此形成工作胶片图案（8），其包括具有限制曝光分辨率的尺寸宽度的宽图案部分（8a）和尺寸不超过限制的尺寸的纤薄图案部分（8a） 曝光分辨率。

公开(公告)号：US08142961B2

公开(公告)日：2012-03-27

申请号：US12717914

申请日：2010-03-04

Applicant: Toshiya Kotani ,  Satoshi Tanaka ,  Shigeki Nojima ,  Koji Hashimoto ,  Soichi Inoue

Inventor： Toshiya Kotani ,  Satoshi Tanaka ,  Shigeki Nojima ,  Koji Hashimoto ,  Soichi Inoue

IPC: G03F1/00

CPC classification number: G06F17/5068 ,  G03F1/36

Abstract: A pattern correcting method for correcting a design pattern to form a desired pattern on a wafer is disclosed, which comprises defining an allowable dimensional change quantity of each of design patterns, defining a pattern correction condition for the each design pattern based on the allowable dimensional change quantity defined for the each design pattern, and correcting the each design pattern based on the pattern correction condition defined for the each design pattern.

Abstract translation: 公开了一种用于校正在晶片上形成期望图案的设计图案的图案校正方法，其包括限定每个设计图案的允许尺寸变化量，基于允许的尺寸变化来定义每个设计图案的图案校正条件 并且基于为每个设计图案定义的图案校正条件来校正每个设计图案。

公开(公告)号：US20120070767A1

公开(公告)日：2012-03-22

申请号：US13289099

申请日：2011-11-04

Applicant: Satoshi Tanaka ,  Koji Hashimoto

Inventor： Satoshi Tanaka ,  Koji Hashimoto

IPC: G03F1/36

CPC classification number: H01L21/0274 ,  G03F1/70 ,  G06F17/5068 ,  H01L21/31144 ,  H01L21/32139

Abstract: A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging the design data by a resizing quantity; generating first mask data by filling a space area having a space width of a space quantity or less of the resized data; and generating second mask data, to be aligned with the first mask data, having a window portion for selectively exposing an area determined by enlarging the space area by the resizing quantity.

Abstract translation: 一种用于生成用于传送用于描绘半导体集成电路的电路图案的图案的掩模组的掩模数据的方法，包括：准备具有与要在半导体衬底上传送的图案相对应的设计图案的设计数据; 通过调整大小的数量扩大设计数据来生成调整大小的数据; 通过填充具有空间大小的空间宽度的空间区域来生成第一掩模数据; 以及生成与所述第一掩模数据对准的第二掩模数据，所述第二掩模数据具有窗口部分，用于通过所述调整大小量选择性地暴露由所述空间区域扩大所确定的区域。

公开(公告)号：US08052807B2

公开(公告)日：2011-11-08

申请号：US12185423

申请日：2008-08-04

Applicant: Naoki Yoshinaga ,  Nobuhiro Fujita ,  Manabu Takahashi ,  Koji Hashimoto ,  Shinya Sakamoto ,  Kaoru Kawasaki ,  Yasuhiro Shinohara ,  Takehide Senuma

Inventor： Naoki Yoshinaga ,  Nobuhiro Fujita ,  Manabu Takahashi ,  Koji Hashimoto ,  Shinya Sakamoto ,  Kaoru Kawasaki ,  Yasuhiro Shinohara ,  Takehide Senuma

IPC: C22C38/02 ,  C22C38/04 ,  C22C38/06

CPC classification number: C22C38/02 ,  C21D8/0226 ,  C21D8/0236 ,  C21D8/04 ,  C21D9/48 ,  C21D2211/002 ,  C21D2211/008 ,  C22C38/001 ,  C22C38/002 ,  C22C38/04 ,  C22C38/06 ,  C23C2/02 ,  C25D5/34

Abstract: The present invention provides a steel sheet excellent in workability, which may be used for components of an automobile or the like, and a method for producing the same. More specifically, according to one exemplary embodiment of the present invention, a steel sheet excellent in workability, including in mass, 0.08 to 0.25% C, 0.001 to 1.5% Si, 0.01 to 2.0% Mn, 0.001 to 0.06% P, at most 0.05% S, 0.001 to 0.007% N, 0.008 to 0.2% Al, at least 0.01% Fe. The steel sheet having an average r-value of at least 1.2, an r-value in the rolling direction of at least 1.3, an r-value in the direction of 45 degrees to the rolling direction of at least 0.9, and an r-value in the direction of a right angle to the rolling direction of at least 1.2.

Abstract translation: 本发明提供可以用于汽车等的部件的加工性优异的钢板及其制造方法。 更具体地说，根据本发明的一个示例性实施方案，可加工性优异的钢板，包括：0.08〜0.25％的C，0.001〜1.5％的Si，0.01〜2.0％的Mn，0.001〜0.06％的P， 0.05％S，0.001至0.007％N，0.008至0.2％Al，至少0.01％Fe。 钢板的平均r值为1.2以上，轧制方向的r值为1.3以上，轧制方向为45度的r值为0.9以上，r- 在与滚动方向成直角的方向上的值至少为1.2。

公开(公告)号：US20110268473A1

公开(公告)日：2011-11-03

申请号：US13174009

申请日：2011-06-30

Applicant: Koji Hashimoto

Inventor： Koji Hashimoto

IPC: G03G21/16 ,  G03G15/08

CPC classification number: G03G21/186 ,  G03G21/1864 ,  G03G2221/1654 ,  G03G2221/1657

Abstract: A process cartridge is detachably mountable to a main assembly of an electrophotographic image forming apparatus The cartridge includes a photosensitive drum, and a developing roller for developing a latent image. A development decoupling portion is provided adjacent to one axial end of the developing roller, with the development coupling portion including an engaging portion configured and positioned (a) to receive a driving force for rotating the developing roller, and (b) to be movable in a direction crossing the axis of the developing roller relative to the developing roller. The cartridge also includes an urging portion configured and positioned to urge the engaging portion in a direction crossing the axis of the developing roller. Also, an abutting portion is configured and positioned so that movement of the engaging portion can be prevented when the engagement portion has not established engagement with a development coupling member of the main assembly.

Abstract translation: 处理盒可拆卸地安装到电子照相成像设备的主组件上。盒包括感光鼓和用于显影潜像的显影辊。 显影解耦部分设置在显影辊的一个轴向端附近，显影耦合部分包括配置和定位的接合部分（a），以接收用于使显影辊旋转的驱动力，和（b）可移动到 与显影辊相对于显影辊的轴线相交的方向。 盒还包括构造和定位成在与显影辊的轴线交叉的方向上推动接合部分的推动部分。 此外，邻接部分被构造和定位成使得当接合部分未与主组件的显影连接构件建立接合时可以防止接合部分的移动。

公开(公告)号：US20110123224A1

公开(公告)日：2011-05-26

申请号：US13012181

申请日：2011-01-24

Applicant: Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

Inventor： Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

IPC: G03G21/16

CPC classification number: G03G21/1821 ,  G03G21/1609 ,  G03G21/1839 ,  G03G21/186 ,  G03G2221/1657 ,  G03G2221/1853 ,  G03G2221/1884

Abstract: A process cartridge detachably mountable to a main assembly of an electrophotographic image forming apparatus includes a drum unit containing a movably connected to a developing unit containing a developing roller between a contact position where the roller contacts the drum and a spaced position where the roller is spaced from the drum, a drum coupler engaging a first main assembly drive transmitter transmitting a first rotational driving force to the drum, when the process cartridge is mounted to the main assembly, a shaft coupler transmitting a second rotational driving force with a deviation permitted between an axis of a second main assembly drive transmitter and an axis of the roller, from the second main assembly drive transmission member to the roller when the process cartridge is mounted to the main assembly.

Abstract translation: 可拆卸地安装到电子照相成像设备的主组件的处理盒包括鼓单元，其包含可移动地连接到显影单元的显影单元，该显影单元包含显影辊，所述显影辊包含在辊与滚筒接触的接触位置与辊间隔开的间隔位置 当所述处理盒安装到所述主组件上时，所述鼓联接器与所述第一主组件驱动变送器接合，所述第一主组件驱动变送器将第一旋转驱动力传递到所述滚筒;当所述处理盒安装到所述主组件时， 当处理盒安装到主组件上时，第二主组件驱动变送器的轴线和辊的轴线从第二主组件驱动传动部件到辊子。

公开(公告)号：US07919611B2

公开(公告)日：2011-04-05

申请号：US12014592

申请日：2008-01-15

Applicant: Naoko Nakamura ,  Keiko Ito ,  Koji Hashimoto ,  Nobuhiro Gemma

Inventor： Naoko Nakamura ,  Keiko Ito ,  Koji Hashimoto ,  Nobuhiro Gemma

IPC: C07H21/04 ,  C12Q1/68 ,  C12P19/34

CPC classification number: C12Q1/6883 ,  C12Q2600/156

Abstract: There is provided a nucleotide primer set for LAMP amplification, used for detecting genotypes of single-nucleotide polymorphisms G590A, G857A and T341C of a NAT2 gene. There is also provided a nucleotide probe for detection of an amplification product amplified with the primer set according to the present invention. There is also provided a method of detecting the genotypes of NAT2 gene single-nucleotide polymorphisms G590A, G857A and T341C by using the primer set according to the present invention.

Abstract translation: 提供了LAMP扩增的核苷酸引物组，用于检测NAT2基因的单核苷酸多态性G590A，G857A和T341C的基因型。 还提供了用于检测根据本发明的引物组扩增的扩增产物的核苷酸探针。 还提供了通过使用本发明的引物组来检测NAT2基因单核苷酸多态性G590A，G857A和T341C的基因型的方法。

公开(公告)号：US20110055153A1

公开(公告)日：2011-03-03

申请号：US12920350

申请日：2009-05-28

Applicant: Koji Hashimoto ,  Fumio Narisawa ,  Kentaro Yoshimura ,  Tomohito Ebina ,  Junji Miyake

Inventor： Koji Hashimoto ,  Fumio Narisawa ,  Kentaro Yoshimura ,  Tomohito Ebina ,  Junji Miyake

IPC: G06F17/30

CPC classification number: G06F8/71

Abstract: It is possible to surely commit a revision made on a software component in a software component database and a software product group and to create a new software product from the same database. Provided is a software configuration management system which includes a software component database and a software product management unit and accepts data transmission/reception from a software component database management client and a software product operation client. The software configuration management system further includes: a component-product correspondence table, component-file correspondence information, a synchronization unit for mutually committing a modification of the software component database and a modification of a software product; update information; and a correspondence table update unit.

Abstract translation: 可以肯定地对软件组件数据库和软件产品组中的软件组件进行修改，并从同一数据库创建新的软件产品。 提供了一种软件配置管理系统，其包括软件组件数据库和软件产品管理单元，并且接受来自软件组件数据库管理客户端和软件产品操作客户端的数据发送/接收。 软件配置管理系统还包括：组件产品对应表，组件文件对应信息，用于相互提交软件组件数据库的修改的同步单元和软件产品的修改; 更新信息; 和对应表更新单元。

公开(公告)号：US07890025B2

公开(公告)日：2011-02-15

申请号：US11869344

申请日：2007-10-09

Applicant: Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

Inventor： Kazuo Chadani ,  Tomonori Mori ,  Koji Hashimoto

IPC: G03G15/00

CPC classification number: G03G21/186 ,  F16D3/04 ,  G03G15/757 ,  G03G2221/1657 ,  G03G2221/1861

Abstract: A process cartridge is detachably mountable to a main assembly of an electrophotographic image forming apparatus. The main assembly includes first and second rotatable main assembly drive transmission members. The cartridge includes an electrophotographic photosensitive drum, a developing roller, a drum coupling member, provided on one axial end of the drum, for engaging the first m transmission member and transmitting a first rotational driving force to the drum, when the cartridge is mounted to the main assembly, and a shaft coupler provided on one axial end of the developing roller, for transmitting a second rotational driving force with a deviation permitted between an axis of the second transmission member and an axis of the developing roller. The shaft coupler includes an engaging portion for engaging the second transmission member and receiving the second rotational driving force, when the cartridge is mounted to the main.

Abstract translation: 处理盒可拆卸地安装到电子照相成像设备的主组件上。 主组件包括第一和第二可旋转主组件驱动传递构件。 墨盒包括电子照相感光鼓，显影辊，鼓联接部件，设置在滚筒的一个轴向端部，用于接合第一传动部件并将第一旋转驱动力传递到滚筒，当墨盒安装到 主组件和设置在显影辊的一个轴向端上的轴联接器，用于传递第二旋转驱动力，该第二旋转驱动力允许在第二传动构件的轴线与显影辊的轴线之间允许的偏差。 轴联接器包括用于接合第二传动构件并且当筒安装到主体时接收第二旋转驱动力的接合部分。