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公开(公告)号：US20140264093A1
公开(公告)日：2014-09-18
申请号：US14294048
申请日：2014-06-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Georgiy O. Vaschenko
CPC classification number: H05H1/42 , G03F7/70033 , H01J35/20 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T29/49 , Y10T156/10
Abstract: Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.
Abstract translation: 在具有包括喷射目标材料的液滴的喷嘴的照射目标产生系统的极紫外（EUV）光源中产生照射靶的方法和装置以及具有产生调制波形的电致动元件的子系统， 对液滴的干扰，从而使至少一些液滴聚结成辐射靶。 包括产生用于照射照射目标以产生产生EUV的等离子体的光束的激光，其中电致动元件被偏置在喷嘴上，以使干扰能够传递到液滴，同时允许电致动的等离子体之间的相对运动 元件和喷嘴。
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公开(公告)号：US20250166166A1
公开(公告)日：2025-05-22
申请号：US18838459
申请日：2023-01-19
Applicant: ASML Netherlands B.V.
Inventor： Shengcheng JIN , Yunbo GUO , Chen ZHANG
IPC: G06T7/00
Abstract: Apparatuses, systems, and methods for providing beams for defect detection and defect location binning associated with a sample of charged particle beam systems. A method of image analysis may include obtaining an image of a sample, identifying a feature captured in the image of the sample, generating a template image from a design layout of the identified feature, comparing 5 the image of the sample with the template image, and processing the image based on the comparison. In some embodiments, a method of image analysis may include obtaining an image of a sample, identifying a feature captured in the obtained image of the sample, mapping the obtained image to a template image generated from a design layout of the identified feature, and analyzing the image based on the mapping.
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公开(公告)号：US12300458B2
公开(公告)日：2025-05-13
申请号：US18498984
申请日：2023-10-31
Applicant: ASML Netherlands B.V.
Inventor： Shuai Li , Zhongwei Chen
IPC: H01J37/145 , H01J37/141 , H01J37/147
Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).
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公开(公告)号：US12298257B2
公开(公告)日：2025-05-13
申请号：US18012801
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Ilse Van Weperen , Arjan Johannes Anton Beukman , Mohamed Swillam , Justin Lloyd Kreuzer , Stephen Roux
IPC: G01N21/956
Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号：US20250146948A1
公开(公告)日：2025-05-08
申请号：US18838135
申请日：2023-01-26
Applicant: ASML Netherlands B.V.
Inventor： Alexander Ludwig KLEIN , Ties Wouter VAN DER WOORD
Abstract: A sample inspection tool is described. The inspection tool includes a light source configured to produce effective inspection radiation below 200 nm, a sample holder, an imaging sub-system containing sub-system components that delivers light along an optical path from the light source to a sample to be held by the sample holder, and a barrier positioned between the last sub-system component in the optical path and the sample to be held by the sample holder. The barrier permits the radiation to pass therethrough while inhibiting impurities from reaching the sample to be held by the sample holder. In another embodiment, a barrier is provided for use in an inspection tool.
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Patent Agency Ranking
公开(公告)号：US12287591B2
公开(公告)日：2025-04-29
申请号：US18269191
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arjan Johannes Anton Beukman , Sebastianus Adrianus Goorden , Stephen Roux , Sergei Sokolov , Filippo Alpeggiani
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号：US12287580B2
公开(公告)日：2025-04-29
申请号：US18015522
申请日：2021-06-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Cornelius Maria Rops , Christianus Wilhelmus Johannes Berendsen , Erik Henricus Egidius Catharina Eummelen , Dagmar Antoinette Wismeijer
Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.
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公开(公告)号：US12287470B2
公开(公告)日：2025-04-29
申请号：US18441710
申请日：2024-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden
Abstract: A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.
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公开(公告)号：US20250125120A1
公开(公告)日：2025-04-17
申请号：US18984879
申请日：2024-12-17
Applicant: ASML Netherlands B.V.
Inventor： Laura DEL TIN , Almut Johanna STEGEMANN , German AKSENOV , Diego MARTINEZ NEGRETE GASQUE , Pieter Lucas BRANDT
IPC: H01J37/317 , H01J37/09 , H01J37/12 , H01J37/20 , H01J37/28
Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focussing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.
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公开(公告)号：US20250123574A1
公开(公告)日：2025-04-17
申请号：US18983297
申请日：2024-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans BUTLER , Bas JANSEN
Abstract: An actuator assembly including a first piezo actuator and a second piezo actuator. The piezo actuator has a correction unit configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference.
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