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    Plasma deposition of amorphous semiconductors at microwave frequencies
    1.
    发明授权
    Plasma deposition of amorphous semiconductors at microwave frequencies 失效
    微波等离子体沉积非晶半导体

    公开(公告)号：US08222125B2

    公开(公告)日：2012-07-17

    申请号：US12855637

    申请日：2010-08-12

    Applicant: Stanford R. Ovshinsky ,  David Strand ,  Patrick Klersy ,  Boil Pashmakov

    Inventor： Stanford R. Ovshinsky ,  David Strand ,  Patrick Klersy ,  Boil Pashmakov

    IPC: H01L21/20 ,  H01L21/205 ,  C23C16/00 ,  C23C16/24 ,  C23C16/50 ,  C23C16/511

    CPC classification number: H01L31/03767 ,  C23C16/24 ,  C23C16/452 ,  H01J37/32211 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/3277 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/0262 ,  H01L31/028 ,  H01L31/065 ,  H01L31/076 ,  H01L31/202 ,  H01L31/204 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

    Abstract: Apparatus and method for plasma deposition of thin film photovoltaic materials at microwave frequencies. The apparatus avoids deposition on windows or other microwave transmission elements that couple microwave energy to deposition species. The apparatus includes a microwave applicator with conduits passing therethrough that carry deposition species. The applicator transfers microwave energy to the deposition species to transform them to a reactive state conducive to formation of a thin film material. The conduits physically isolate deposition species that would react to form a thin film material at the point of microwave power transfer. The deposition species are separately energized and swept away from the point of power transfer to prevent thin film deposition. The invention allows for the ultrafast formation of silicon-containing amorphous semiconductors that exhibit high mobility, low porosity, little or no Staebler-Wronski degradation, and low defect concentration.

    Abstract translation: 微波等离子体沉积薄膜光伏材料的设备和方法。 该装置避免了将微波能量耦合到沉积物质的窗户或其他微波传输元件上的沉积。 该装置包括带有通过其的导管的微波施加器，其携带沉积物质。 施加器将微波能量传递到沉积物质以将它们转变成有助于形成薄膜材料的反应状态。 导管物理隔离在微波功率传递点反应以形成薄膜材料的沉积物质。 沉积物质分开通电并从功率传递点扫除，以防止薄膜沉积。 本发明允许超快速地形成显示高迁移率，低孔隙率，很少或没有Staebler-Wronski降解和低缺陷浓度的含硅非晶半导体。

    Electrophoresis devices and methods for focusing charged analytes
    2.
    发明授权
    Electrophoresis devices and methods for focusing charged analytes 有权
    用于聚焦带电分析物的电泳装置和方法

    公开(公告)号：US08142630B2

    公开(公告)日：2012-03-27

    申请号：US10557582

    申请日：2004-05-19

    Applicant: David Strand ,  Dan M. Leatzow ,  Cornelius F. Ivory

    Inventor： David Strand ,  Dan M. Leatzow ,  Cornelius F. Ivory

    IPC: G01N27/447 ,  G01N27/453

    CPC classification number: G01N27/44795

    Abstract: Devices are provided for separating and focusing charged analytes, comprising a separation chamber and two or more electrodes, for example, an electrode array. A membrane separates the separation chamber and the electrodes. The separation chamber of the device is configured, that is, the separation chamber has a shaped geometry, which serves to induce a gradient in an electric field generated by the electrodes in the electrode chamber. Optionally, molecular sieve is included in the separation chamber that is operative to shift the location at which a stationary focused band of a charged analyte forms under a given set of focusing process parameters. Methods are provided for separating and focusing charged analytes comprising introducing a first fluid comprising at least one charged analyte into the separation chamber of a device as just described, applying an electric field gradient to the charged analyte to focus the charged analyte in the electric field gradient.

    Abstract translation: 提供了用于分离和聚焦带电分析物的装置，包括分离室和两个或更多个电极，例如电极阵列。 膜分离室和电极。 该装置的分离室被构造成即分离室具有成形几何形状，其用于在电极室中由电极产生的电场中引起梯度。 任选地，分子筛包括在分离室中，其可操作以在给定的一组聚焦工艺参数下移动带电分析物的固定聚焦带的位置。 提供了用于分离和聚焦带电分析物的方法，包括将如上所述将包含至少一种带电分析物的第一流体引入到装置的分离室中，对电荷分析物施加电场梯度以将带电分析物聚焦在电场梯度 。

    Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies
    3.
    发明申请
    Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies 失效
    微波频率下非晶半导体的等离子体沉积

    公开(公告)号：US20120040492A1

    公开(公告)日：2012-02-16

    申请号：US12855637

    申请日：2010-08-12

    Applicant: Stanford R. Ovshinsky ,  David Strand ,  Patrick Klersy ,  Boil Pashmakov

    Inventor： Stanford R. Ovshinsky ,  David Strand ,  Patrick Klersy ,  Boil Pashmakov

    IPC: H01L31/18

    CPC classification number: H01L31/03767 ,  C23C16/24 ,  C23C16/452 ,  H01J37/32211 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/3277 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/0262 ,  H01L31/028 ,  H01L31/065 ,  H01L31/076 ,  H01L31/202 ,  H01L31/204 ,  Y02E10/547 ,  Y02E10/548 ,  Y02P70/521

    Abstract: Apparatus and method for plasma deposition of thin film photovoltaic materials at microwave frequencies. The apparatus avoids unintended deposition on windows or other microwave transmission elements that couple microwave energy to deposition species. The apparatus includes a microwave applicator with conduits passing therethrough that carry deposition species. The applicator transfers microwave energy to the deposition species to activate or energize them to a reactive state conducive to formation of a thin film material. The conduits physically isolate deposition species that would react or otherwise combine to form a thin film material at the point of microwave power transfer. The deposition species are separately energized and swept away from the point of power transfer to prevent thin film deposition. Suitable deposition species include precursors that contain silicon, germanium, fluorine, and/or hydrogen. The invention allows for the ultrafast formation of silicon-containing amorphous semiconductors that exhibit high mobility, low porosity, little or no Staebler-Wronski degradation, and low defect concentration.

    Abstract translation: 微波等离子体沉积薄膜光伏材料的设备和方法。 该装置避免了将微波能量耦合到沉积物质的窗户或其他微波传输元件上的非预期沉积。 该装置包括带有通过其的导管的微波施加器，其携带沉积物质。 施加器将微波能量传递到沉积物质以激活或激发它们到有助于形成薄膜材料的反应状态。 导管物理地隔离在微波功率传递的点处将反应或以其他方式组合以形成薄膜材料的沉积物质。 沉积物质分开通电并从功率传递点扫除，以防止薄膜沉积。 合适的沉积物质包括含有硅，锗，氟和/或氢的前体。 本发明允许超快速地形成显示高迁移率，低孔隙率，很少或没有Staebler-Wronski降解和低缺陷浓度的含硅非晶半导体。

    Electrophoretic Devices, Instruments and Systems Including Same
    7.
    发明申请
    Electrophoretic Devices, Instruments and Systems Including Same 审中-公开
    电泳设备，仪器和系统包括相同

    公开(公告)号：US20070235335A1

    公开(公告)日：2007-10-11

    申请号：US10537197

    申请日：2003-12-01

    Applicant: David Strand ,  Dan Leatzow

    Inventor： David Strand ,  Dan Leatzow

    IPC: B01D57/02

    CPC classification number: G01N27/44795 ,  B01D57/02

    Abstract: Devices, systems and methods are provided for processing fluid samples containing one or more analytes. In certain examples, an electrophoretic device comprises a separation chamber and an electrode chamber, each of which may be uniform or non-uniform. The electrode chamber includes two or more electrodes or may include an electrode array. Molecular sieve may be included in the separation chamber, and the molecular sieve is operative to shift the location at which a stationary focused band of a charged analyte forms under a given set of focusing process parameters. Such systems are especially suitable for linking up analytical instruments in a hyphenated fashion, particularly where the instruments have differing system parameters.

    Abstract translation: 提供设备，系统和方法来处理含有一种或多种分析物的流体样品。 在某些实例中，电泳装置包括分离室和电极室，每个电极室可均匀或不均匀。 电极室包括两个或更多个电极或者可以包括电极阵列。 分子筛可以包括在分离室中，并且分子筛可操作以在给定的一组聚焦过程参数下移动带电分析物的固定聚焦带的位置。 这种系统特别适用于以连字的方式连接分析仪器，特别是在仪器具有不同系统参数的情况下。

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