公开(公告)号：US20190198281A1

公开(公告)日：2019-06-27

申请号：US16313051

申请日：2017-11-30

Applicant: ION LAB Co., Ltd.

Inventor： Masanobu NUNOGAKI

IPC: H01J27/22 ,  H01J27/08 ,  H01J27/16 ,  H01J27/04 ,  H01J37/08

CPC classification number: H01J27/22 ,  H01J27/04 ,  H01J27/08 ,  H01J27/16 ,  H01J27/20 ,  H01J37/08

Abstract: Metallic ion source for resolving the issue of not being able to produce high-density ions efficiently with small-scale ion sources in situations where an electron beam injecting scheme is employed as the evaporation source to evaporate a solid, and for producing high-density ions highly efficiently. Designed to be compact and lightweight, the metallic ion source also facilitates selection of the ion extraction direction. The ion source, structured exploiting the characteristic physical property that whether ionization takes place is dependent on the energy of the electron beam, is furnished with a dual evaporation-plasma chamber that inside the same chamber enables a high-speed electron beam, whose ionization efficiency is low, and low-speed electrons generated by electric discharge, whose ionization efficiency is high, to participate independently and simultaneously in, respectively, evaporation of precursor and ionization action.

公开(公告)号：US10418220B2

公开(公告)日：2019-09-17

申请号：US16313051

申请日：2017-11-30

Applicant: ION LAB Co., Ltd.

Inventor： Masanobu Nunogaki

IPC: H01J7/08 ,  H01J27/04 ,  H01J27/08 ,  H01J27/16 ,  H01J27/22 ,  H01J37/08

Abstract: Metallic ion source for resolving the issue of not being able to produce high-density ions efficiently with small-scale ion sources in situations where an electron beam injecting scheme is employed as the evaporation source to evaporate a solid, and for producing high-density ions highly efficiently. Designed to be compact and lightweight, the metallic ion source also facilitates selection of the ion extraction direction. The ion source, structured exploiting the characteristic physical property that whether ionization takes place is dependent on the energy of the electron beam, is furnished with a dual evaporation-plasma chamber that inside the same chamber enables a high-speed electron beam, whose ionization efficiency is low, and low-speed electrons generated by electric discharge, whose ionization efficiency is high, to participate independently and simultaneously in, respectively, evaporation of precursor and ionization action.