公开(公告)号：US08536060B2

公开(公告)日：2013-09-17

申请号：US13468042

申请日：2012-05-10

Applicant: Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

Inventor： Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

IPC: H01L21/302 ,  C23F1/00

CPC classification number: H01L21/3065 ,  H01L21/02057 ,  H01L21/02063

Abstract: A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.

Abstract translation: 描述了清除天然氧化物的方法。 提供了一种衬底，包括其中形成有自然氧化物层的暴露部分。 使用三氟化氮（NF 3）和氨（NH 3）作为反应气体对基板进行清除处理，其中NF 3的体积流量大于NH 3的体积流量。

公开(公告)号：US20090298294A1

公开(公告)日：2009-12-03

申请号：US12129978

申请日：2008-05-30

Applicant: Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

Inventor： Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

IPC: C25F3/30 ,  H01L21/302

CPC classification number: H01L21/3065 ,  H01L21/02057 ,  H01L21/02063

Abstract: A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.

Abstract translation: 描述了清除天然氧化物的方法。 提供了一种衬底，包括其中形成有自然氧化物层的暴露部分。 使用三氟化氮（NF 3）和氨（NH 3）作为反应气体对基板进行清除处理，其中NF 3的体积流量大于NH 3的体积流量。

公开(公告)号：US08642477B2

公开(公告)日：2014-02-04

申请号：US12129978

申请日：2008-05-30

Applicant: Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

Inventor： Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

IPC: H01L21/302 ,  C23F1/00

CPC classification number: H01L21/3065 ,  H01L21/02057 ,  H01L21/02063

Abstract: A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.

Abstract translation: 描述了清除天然氧化物的方法。 提供了一种衬底，包括其中形成有自然氧化物层的暴露部分。 使用三氟化氮（NF 3）和氨（NH 3）作为反应气体对基板进行清除处理，其中NF 3的体积流量大于NH 3的体积流量。

公开(公告)号：US20120220134A1

公开(公告)日：2012-08-30

申请号：US13468042

申请日：2012-05-10

Applicant: Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

Inventor： Yen-Chu Chen ,  Teng-Chun Tsai ,  Chien-Chung Huang ,  Keng-Jen Liu

IPC: H01L21/461 ,  B08B5/00

CPC classification number: H01L21/3065 ,  H01L21/02057 ,  H01L21/02063

Abstract: A method for clearing native oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A clearing process is performed to the substrate using nitrogen trifluoride (NF3) and ammonia (NH3) as a reactant gas, wherein the volumetric flow rate of NF3 is greater than that of NH3.

Abstract translation: 描述了清除天然氧化物的方法。 提供了一种衬底，包括其中形成有自然氧化物层的暴露部分。 使用三氟化氮（NF 3）和氨（NH 3）作为反应气体对基板进行清除处理，其中NF 3的体积流量大于NH 3的体积流量。