MASS SPECTRUM DATA PROCESSING
    3.
    发明申请

    公开(公告)号:US20250054741A1

    公开(公告)日:2025-02-13

    申请号:US18710242

    申请日:2022-11-18

    Abstract: A method for processing mass spectral data that has, for example, been obtained using a mass spectrometry device comprising deflection beams for scanning an ion beam over an area spanning the vertical direction of a microchannel plate focal plane detector, in order to increase the count rate of the detector. The method allows to efficiently combine ion counts that are detected on different areas of the focal plane detector, as a result of different deflection voltages being applied to the corresponding ion beams. Even though such beams also suffer unwanted deflections along the horizontal axis of the focal plane detector, the present method allows to re-align ion counts efficiently and to register them with accurate mass-to-charge ratios, which results in increased mass resolution power of the resulting combined mass spectrum.

    THERMAL MANAGEMENT SYSTEM
    10.
    发明公开

    公开(公告)号:US20240042451A1

    公开(公告)日:2024-02-08

    申请号:US18254462

    申请日:2021-11-24

    Abstract: A thermal management system comprising: a thermal source of low to cryogenic temperature; a heating element for heating the source; a shield adapted to exchange heat by conduction to/from a sample and to/from the source; a controller calibrated for maintaining a gradient of temperature along the shield within a pre-determined range; a vacuum sealing feedthrough comprising a thermal insulator element, the vacuum sealing feedthrough delimiting around the first interface a vacuum sealed volume so that the shield exchanges heat with the thermal source exclusively by conduction and exclusively at a first interface. An exemplary purpose for this thermal management system is the sublimation of water ice and/or water ice trapped in a regolith, and positioned in a vacuum chamber. The heat insulator element is configured to separate physically the thermal source from a vacuum chamber into which the shield can protrude, so that sublimated compounds from the sample do not encounter colder point which would cause their deposition on the shield or on the walls of the chamber.

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