SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS
    4.
    发明申请
    SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS 审中-公开
    合成,吸收和分散纳米晶体

    公开(公告)号:US20170044687A1

    公开(公告)日:2017-02-16

    申请号:US15335798

    申请日:2016-10-27

    Abstract: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.

    Abstract translation: 描述了半导体纳米晶体及其在溶剂和其它介质中的分散体的制备。 本文所述的纳米晶体具有小(1-10nm)的粒度,具有最小的聚集,并且可以高产率合成。 在合成后的纳米晶体上的封端剂以及经历了帽交换反应的纳米晶体导致在极性和非极性溶剂中形成稳定的悬浮液,这可能导致形成高质量的纳米复合膜。

    RESISTS FOR LITHOGRAPHY
    6.
    发明申请
    RESISTS FOR LITHOGRAPHY 审中-公开
    电影的电阻

    公开(公告)号:US20150185616A1

    公开(公告)日:2015-07-02

    申请号:US14591336

    申请日:2015-01-07

    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.

    Abstract translation: 本公开描述了涉及使用两步技术提供用于光刻的非线性抗蚀剂的多步可逆光化学反应的新途径。 它们可以根据光的强度二次提供曝光。 还描述了几个具体实例,包括但不限于使用纳米晶体。 结合双重图案化,这些方法可能产生亚衍射极限特征密度。

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