-
公开(公告)号：US11578967B2
公开(公告)日：2023-02-14
申请号：US16620317
申请日：2018-06-08
Applicant: Rudolph Technologies, Inc.
Inventor： John Schaefer , Christopher Voges , Nicholas Smith , Jeffrey Treptau
Abstract: One example of an inspection system includes a laser, a magnification changer, and a first camera. The laser projects a line onto a wafer to be inspected. The magnification changer includes a plurality of selectable lenses of different magnification. The first camera images the line projected onto the wafer and outputs three-dimensional line data indicating the height of features of the wafer. Each lens of the magnification changer provides the same nominal focal plane position of the first camera with respect to the wafer.
-
公开(公告)号：US20220121676A2
公开(公告)日：2022-04-21
申请号：US16651870
申请日：2018-09-28
Applicant: RUDOLPH TECHNOLOGIES, INC.
Inventor： Kevin Barr , Edward Andrew Condon
IPC: G06F16/25 , G06F16/176 , G06F16/26 , G06F16/28
Abstract: A chuck assembly includes an upper surface configured to support a wafer-level package assembly and a clamping mechanism securing the wafer-level package assembly to the upper surface.
-
公开(公告)号：US10553504B2
公开(公告)日：2020-02-04
申请号：US15933366
申请日：2018-03-22
Applicant: Rudolph Technologies, Inc.
Inventor： Gurvinder Singh , Wu Y. Han , John Thornell , Chetan Suresh , Wayne Fitzgerald
Abstract: Concepts presented herein relate to approaches for performing substrate inspection. In one aspect, the concepts relate to detecting anomalies or candidate defects on the substrate based on contrast in images obtained of the substrate.
-
公开(公告)号：US10466179B2
公开(公告)日：2019-11-05
申请号：US15933362
申请日：2018-03-22
Applicant: Rudolph Technologies, Inc.
Inventor： Gurvinder Singh , Wu Y. Han , John Thornell , Chetan Suresh , Wayne Fitzgerald
Abstract: Concepts presented herein relate to approaches for performing substrate inspection. In one aspect, the concepts relate to detecting anomalies or candidate defects on the substrate based on contrast in images obtained of the substrate.
-
公开(公告)号：US10014228B2
公开(公告)日：2018-07-03
申请号：US14944839
申请日：2015-11-18
Applicant: Rudolph Technologies, Inc.
Inventor： James H. Greer , Troy Palm
IPC: H01L21/66 , H01L21/683 , H01L21/687 , H01L21/67 , H01L21/673
CPC classification number: H01L22/12 , H01L21/67288 , H01L21/673 , H01L21/67346 , H01L21/6838 , H01L21/68714 , H01L21/68721 , H01L21/68728 , H01L21/6875
Abstract: A method and apparatus for detecting and handling deformed substrates, thus allowing them to be processed, and for increasing device yield on the substrate is herein disclosed. A sensor detects deformity, then the substrate is flattened, allowing a support to hold it securely.
-
Patent Agency Ranking
公开(公告)号：US20170276758A1
公开(公告)日：2017-09-28
申请号：US15622246
申请日：2017-06-14
Applicant: Rudolph Technologies, Inc.
Inventor： Greg Olmstead
CPC classification number: G01R35/00 , G01R31/2891
Abstract: A method of assessing functionality of a probe card includes providing a probe card analyzer without a probe card interface, removably coupling a probe card having probes to a support plate of the probe card analyzer, aligning a sensor head of the probe card analyzer with the probe card, and measuring a component of the probes with the sensor head.
-
公开(公告)号：US09594230B2
公开(公告)日：2017-03-14
申请号：US14367564
申请日：2012-12-20
Applicant: Rudolph Technologies, Inc.
Inventor： Dennis L. Ohren , Christopher J. Voges , Andrew E. Rotering
CPC classification number: G02B7/28 , G01B11/00 , G01B11/026 , G01B11/0608 , G01N21/84 , G01N21/9501 , G01N2201/127 , H04N5/23212
Abstract: A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
Abstract translation: 用于检查半导体器件的光学系统中的焦点高度传感器包括发射电磁辐射束的传感器光束源。 反射器接收来自传感器光束源的电磁辐射束，并将光束引向位于光学系统的视野内的半导体器件的表面。 反射器定位成从半导体器件的表面接收光束的至少一部分，以将返回的光束引导到传感器。 传感器接收返回的光束，并沿着光学系统的光轴输出与视场内的表面的位置相关的信号。
-
公开(公告)号：US09535089B2
公开(公告)日：2017-01-03
申请号：US14282565
申请日：2014-05-20
Applicant: RUDOLPH TECHNOLOGIES, INC.
Inventor： Gary Mark Gunderson , Greg Olmstead
CPC classification number: G01R1/04 , G01R31/2891
Abstract: The inspection of semiconductors or like substrates by the present mechanism minimizes deflection in the checkplate and probe card. An inspection device including a housing, a toggle assembly within the housing, an objective lens assembly attached within the toggle assembly including an objective coupled within an objective focus, wherein the objective focus is deflectable along an optics axis, and a cam assembly including a rotary cam and a window carrier, wherein the window carrier is moveable along the optics axis with rotation of the rotary cam, wherein the cam assembly is coupled to the toggle assembly with the objective and window are aligned along the optics axis.
Abstract translation: 通过本机构检查半导体或类似基板可以最大限度地减少检查板和探针卡中的偏转。 一种检查装置，包括壳体，壳体内的肘节组件，附接在肘节组件内的物镜组件，其包括联接在物镜焦点内的物镜，其中物镜焦点可沿光学轴线偏转;以及凸轮组件，包括旋转 凸轮和窗户托架，其中所述窗口托架可随着所述旋转凸轮的旋转沿着所述光学轴线移动，其中所述凸轮组件联接到所述肘节组件，所述物镜和所述窗口沿着所述光学轴线对准。
-
公开(公告)号：US20160352997A1
公开(公告)日：2016-12-01
申请号：US15209218
申请日：2016-07-13
Applicant: Rudolph Technologies, Inc.
Inventor： Robert Bishop , Timothy Pinkney
CPC classification number: H04N5/2356 , G01N21/6456 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/6463 , G01N2021/95638 , G01N2201/0612 , G01N2201/062 , G01N2201/10 , G03B13/36 , H04N5/332 , H04N5/37206 , H04N5/378 , H04N7/18
Abstract: A method and apparatus for optimizing inspection high-speed optical inspection of parts using intelligent image analysis to determine optimal focus using high numerical aperture (NA) optics, achieve a superior signal-to-noise ratio, resolution, and inspection speed performance with very limited depth of field lenses.
Abstract translation: 使用智能图像分析优化检测部件的高速光学检测的方法和装置，使用高数值孔径（NA）光学元件确定最佳聚焦，实现了非常有限的信号噪声比，分辨率和检测速度性能 景深镜头。
-
公开(公告)号：US20160101445A1
公开(公告)日：2016-04-14
申请号：US14881847
申请日：2015-10-13
Applicant: Rudolph Technologies, Inc.
Inventor： Jian Ding , Priya Mukundhan , James Kane , Steven Peterson , Fei Shen
CPC classification number: B08B7/0057 , G01D18/00 , H01L21/02046 , H01L21/67028 , H01L21/67115 , H01L21/67288 , H01L22/12 , H01L22/20
Abstract: A method of cleaning calibration and other substrates that improves the correlation of measurements from calibration and product substrates and increases the useful life of the calibration substrates is herein disclosed. By exposing a calibration substrate to ultraviolet light, a reaction is triggered that results in the cleaning of the contaminants from the calibration substrate. For instance, monatomic oxygen is introduced to contaminants on the surface of a calibration substrate to remove the contaminants without inducing modifications in the substrate itself. Through the cleaning process, the temperature of the calibration substrate may be controlled to limit adverse effects caused by the overheating of the calibration substrate.
Abstract translation: 本文公开了一种清洁校准和其它基板的方法，其改进了来自校准和产品基板的测量值的相关性并增加了校准基板的使用寿命。 通过将校准基板暴露于紫外光，触发反应，导致从校准基板清洁污染物。 例如，将单原子氧引入到校准基板的表面上的污染物上以除去污染物，而不引起基板本身的修饰。 通过清洗处理，可以控制校准基板的温度，以限制由校准基板过热引起的不良影响。
-
-
-
-
-
-
-
-
-
Search Results
65
records
(took 0.018 seconds)
