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    Multiple-wavelength binary diffractive lenses
    1.
    发明授权
    Multiple-wavelength binary diffractive lenses 有权
    多波长二元衍射透镜

    公开(公告)号：US08049963B2

    公开(公告)日：2011-11-01

    申请号：US12253512

    申请日：2008-10-17

    Applicant: Rajesh Menon ,  Paul Rogge ,  Hsin-Yu Tsai

    Inventor： Rajesh Menon ,  Paul Rogge ,  Hsin-Yu Tsai

    IPC: G02B27/44 ,  G02B3/08

    CPC classification number: G02B27/4288 ,  G02B3/10 ,  G02B27/4211

    Abstract: A dichromatic lens includes a plurality of zones being arranged on a lens structure, each of the zones having a specified radius and varying height. The lens structure focuses propagating light applicable to any intensity distribution for a plurality of wavelengths.

    Abstract translation: 双色透镜包括布置在透镜结构上的多个区域，每个区域具有指定的半径和变化的高度。 透镜结构聚焦适用于多个波长的任何强度分布的传播光。

    PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS
    2.
    发明申请
    PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS 有权
    通过光学可饱和晶片进行绘图

    公开(公告)号：US20100248159A1

    公开(公告)日：2010-09-30

    申请号：US12749960

    申请日：2010-03-30

    Applicant: Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    Inventor： Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    IPC: G03F7/20 ,  G03B27/00

    CPC classification number: G03B27/00

    Abstract: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

    Abstract translation: 提供了一种用于纳米图案的光学材料系统，其包括具有光谱选择性可逆和不可逆转变的一个或多个材料系统，其通过将光谱选择性可逆转换中的一个与保留单个分子的配置中的光学节点饱和，并将单个分子暴露于其光谱 不可逆转的过渡形成一种模式。

    OPTICAL SUPERRESOLUTION USING MULTIPLE IMAGES
    4.
    发明申请
    OPTICAL SUPERRESOLUTION USING MULTIPLE IMAGES 有权
    使用多个图像的光学超分辨率

    公开(公告)号：US20100097702A1

    公开(公告)日：2010-04-22

    申请号：US12253461

    申请日：2008-10-17

    Applicant: Rajesh Menon

    Inventor： Rajesh Menon

    IPC: G02B27/46

    CPC classification number: G06T3/4053

    Abstract: An imaging system is provided. The imaging system includes a point spread function (PSF) module producing a diffraction-limited image of a sample. A convolution module performs convolution of the diffraction-limited image with a first image of a focal spot having a first wavelength to produce a first simulated image. The convolution also performs convolution of the diffraction-limited image with a second image of a focal ring having a second wavelength to produce a second simulated image. A difference module subtracts said first simulated image and said second simulated image to produce said high resolution composite image.

    Abstract translation: 提供成像系统。 成像系统包括产生样本的衍射受限图像的点扩散函数（PSF）模块。 卷积模块执行衍射受限图像与具有第一波长的焦点的第一图像的卷积以产生第一模拟图像。 卷积还执行衍射受限图像与具有第二波长的焦环的第二图像的卷积以产生第二模拟图像。 差分模块减去所述第一模拟图像和所述第二模拟图像以产生所述高分辨率合成图像。

    System and method for contrast enhanced zone plate array lithography
    5.
    发明授权
    System and method for contrast enhanced zone plate array lithography 失效
    对比增强区板阵列光刻的系统和方法

    公开(公告)号：US07666580B2

    公开(公告)日：2010-02-23

    申请号：US12337000

    申请日：2008-12-17

    Applicant: Rajesh Menon ,  Henry I. Smith

    Inventor： Rajesh Menon ,  Henry I. Smith

    IPC: G03F7/22

    CPC classification number: G03F7/70291 ,  G03F7/091

    Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

    Abstract translation: 公开了一种光刻系统，其包括用于将聚焦照明引向记录介质的聚焦元件阵列，以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

    Patterning via optical-saturable transitions
    9.
    发明授权
    Patterning via optical-saturable transitions 有权
    通过光学饱和转换进行图案化

    公开(公告)号：US09164369B2

    公开(公告)日：2015-10-20

    申请号：US12749960

    申请日：2010-03-30

    Applicant: Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    Inventor： Rajesh Menon ,  Trisha L. Andrew ,  Francesco Stellacci

    IPC: G03F7/20 ,  G03B27/00

    CPC classification number: G03B27/00

    Abstract: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally irreversible transitions to form a pattern.

    Abstract translation: 提供了一种用于纳米图案的光学材料系统，其包括具有光谱选择性可逆和不可逆转变的一个或多个材料系统，其通过将光谱选择性可逆转换中的一个与保留单个分子的配置中的光学节点饱和，并将单个分子暴露于其光谱 不可逆转的过渡形成一种模式。

    Nanoscale imaging via absorption modulation
    10.
    发明授权
    Nanoscale imaging via absorption modulation 有权
    通过吸收调制进行纳米成像

    公开(公告)号：US08143601B2

    公开(公告)日：2012-03-27

    申请号：US12186968

    申请日：2008-08-06

    Applicant: Rajesh Menon ,  Henry I. Smith

    Inventor： Rajesh Menon ,  Henry I. Smith

    IPC: G01J1/58

    CPC classification number: G01Q60/22 ,  G03F1/50 ,  G03F1/84 ,  G03F7/2014

    Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.

    Abstract translation: 提供成像系统。 成像系统包括要由成像系统扫描的样品。 吸收调制层（AML）位于样品附近，物理上与样品分开。 在AML内产生一个或多个亚波长孔径，其尺寸由AML的材料特性和照明波长的强度决定。 光源通过一个或多个子波长孔径传输光信号，产生用于成像的光学近场。

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