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公开(公告)号:US11489091B2
公开(公告)日:2022-11-01
申请号:US16370791
申请日:2019-03-29
Applicant: NIKKISO CO., LTD. , SCIVAX Corporation
Inventor: Noritaka Niwa , Tetsuhiko Inazu , Yasumasa Suzaki , Akifumi Nawata , Satoru Tanaka
IPC: H01L33/32 , H01L33/22 , H01L33/00 , H01L21/3065 , H01L33/40
Abstract: A semiconductor light emitting device includes a light extraction layer having a light extraction surface. The light extraction layer includes: a plurality of cone-shaped parts formed in an array on the light extraction surface, and a plurality of granular parts formed both on a side part of the cone-shaped part and in a space between adjacent cone-shaped parts. A method of manufacturing the semiconductor light emitting device includes: forming a mask having an array pattern on the light extraction layer; and etching the mask and the light extraction layer from above the mask. The etching includes first dry-etching performed until an entirety of the mask is removed and second dry-etching performed to further dry-etch the light extraction layer after the mask is removed.
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公开(公告)号:US20210373217A1
公开(公告)日:2021-12-02
申请号:US17285992
申请日:2019-10-15
Applicant: SCIVAX CORPORATION
Inventor: Daiji Tanabe , Nobuyoshi Awaya , Satoru Tanaka
Abstract: A forming method of forming a micropattern which has a direction and a position controlled for each predetermined position on an object subjected to pattern formation, and an imprinting mold producing method, an imprinting mold and an optical device to which such a forming method is applied. A first mask pattern forming process of forming, by imprinting, a first mask pattern for forming the micropattern on a surface of an object subjected to pattern formation, the surface including a region where at least the micropattern is not formed yet; a second mask pattern forming process of forming a resist film on the object subjected to pattern formation and on the first mask pattern, exposing and developing such a film by light emission to form a second mask pattern that causes a region where the micropattern is not formed but the first mask patten is formed to appear in an uncovered manner; and a micropattern forming process of performing etching on the object subjected to pattern formation to form the micropattern. The first mask pattern forming process, the second mask pattern forming process and the micropattern forming process are repeated in this sequence.
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公开(公告)号:US10343312B2
公开(公告)日:2019-07-09
申请号:US14407510
申请日:2013-08-23
Applicant: SCIVAX CORPORATION
Inventor: Hirosuke Kawaguchi , Tatsuya Hagino , Satoru Tanaka
IPC: B29C59/02 , B29C43/10 , B29D11/00 , B29C43/12 , B82Y40/00 , G03F7/00 , B29C43/36 , B29C43/02 , B29C43/32 , B29C51/28
Abstract: An imprint device and an imprint method which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target using flexible first and second dies and includes first and second casings which each apply pressure of first and second pressurizing rooms respectively, to the first and second dies respectively and the molding target, a pressurizer that adjusts the pressures of the pressurizing rooms, first and second moving units that move the first and second dies respectively and the molding target in a direction coming close to or distant from each other, a depressurizer that depressurizes a depressurizing room formed between the first and second casings, and eliminates fluids present between the dies and the molding target, and a pressure adjuster that adjusts pressures to reduce pressure differences between the depressurizing room and the pressurizing rooms.
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公开(公告)号:US20150091220A1
公开(公告)日:2015-04-02
申请号:US14371849
申请日:2013-01-11
Applicant: SCIVAX CORPORATION
Inventor: Hirosuke Kawaguchi , Tatsuya Hagino , Satoru Tanaka
CPC classification number: B29C51/10 , B29C51/06 , B29C51/262 , B29C51/303 , B29C51/421 , B29C51/425 , B29C51/46 , B29C2791/007 , B29K2101/12 , B29K2105/256 , B29L2031/756 , B29L2031/7739
Abstract: A shaping method and a shaping device are provided which can easily and inexpensively form a curved face in a film including a micropattern. A shaping method is for forming, in a predetermined shaping-target area of a film including a patterned face with a micropattern, and a rear face opposite to the patterned face, a curved face beyond the thickness of the film, and includes a fixing step for fixing an outer edge of the shaping-target area of the film by fixing means, a first heating step for heating the film 20 by heating means 95, and a pressure adjusting step for producing a predetermined pressure difference between both faces of the film by the pressurizing means in such a way that pressure at a side where the film is fixed in the fixing step becomes small to form a pre-curved face.
Abstract translation: 提供了一种成形方法和成形装置,其可以容易且廉价地在包括微图案的薄膜中形成弯曲面。 一种成形方法是在包含具有微图案的图案面的膜的预定成形对象区域和与图案面相对的后表面上形成超过膜厚度的弯曲面,并且包括固定步骤 用于通过固定装置固定膜的成形对象区域的外边缘,通过加热装置95加热膜20的第一加热步骤和用于通过以下步骤产生膜的两个面之间的预定压力差的压力调节步骤: 加压装置使得在定影步骤中胶片固定的一侧的压力变小,形成预弯曲面。
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公开(公告)号:US20220317568A1
公开(公告)日:2022-10-06
申请号:US17849575
申请日:2022-06-24
Applicant: SCIVAX CORPORATION , SHIN-ETSU CHEMICAL CO., LTD.
Inventor: Yukiko Kondo , Satoru Tanaka
Abstract: The present disclosure provides an imprinting device and an imprinting method. The present disclosure also provides a stamp comprising a resin-made molding component.
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公开(公告)号:US20210333628A1
公开(公告)日:2021-10-28
申请号:US16621084
申请日:2019-06-24
Applicant: SCIVAX CORPORATION
Inventor: Nobuyoshi Awaya , Yasumasa Suzaki
IPC: G02F1/1335 , G02F1/1333 , G02F1/00
Abstract: A polarizer that suppresses a decrease in extinction ratio due to leakage light in a Cross Nicol condition, a display that utilizes the same, and an ultraviolet emitting apparatus are provided. A polarizer includes a substrate transparent to light within a utilized bandwidth, a wire grid portion including a plurality of wires which extends in a direction and which is arranged side by side at a pitch shorter than a wavelength of the light, and a polarizing axis correcting portion which is formed of a dielectric provided at a side at which the light enters the wire grid portion, and which performs correction so as to reduce a displacement in an angle between an incidence-side transmittance axis of linear polarized light and an emitting-side absorption axis thereof when the linear polarized light within the utilized bandwidth enters at an azimuth angle of 45 degrees relative to the wires.
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公开(公告)号:US10357903B2
公开(公告)日:2019-07-23
申请号:US14402402
申请日:2013-12-06
Applicant: SCIVAX CORPORATION
Inventor: Hirosuke Kawaguchi , Yutaka Taniguchi , Satoru Tanaka
Abstract: A roller-type depressing device that can depress an object like a die or a molding target by controlling the pressure of a roller, an imprint device, and a method utilizing the same are provided. A roller-type depressing device depresses an object like a die or a molding target by a main roller, and includes a pressure adjusting plate, a roller moving unit that moves the main roller relative to the object, a pressure adjusting unit that holds the pressure adjusting plate so that force produced by a pressure difference in fluid applied to both faces of the pressure adjusting plate acts on the main roller, a pressure receiving stage receiving pressure of the main roller, a pressure adjuster that adjusts the pressure difference in fluid applied to both faces of the pressure adjusting plate, and a pressure equalizer that equalizes pressure applied to the object by the main roller.
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公开(公告)号:US20190179062A1
公开(公告)日:2019-06-13
申请号:US15566794
申请日:2017-06-19
Applicant: SCIVAX CORPORATION
Inventor: Akifumi Nawata , Nobuyoshi Awaya , Satoru Tanaka
Abstract: An optical image formation apparatus which has a high brightness of an actual image, easy for manufacturing, and reduces costs. This optical image formation apparatus mainly includes a polarizer causing P polarization light to pass through, and reflecting S polarization light, a phase difference element converting either one of or both of the P polarization light having passed through the polarizer or the S polarization light reflected by the polarizer into circular polarization light or elliptical polarization light, and a recursive light reflector recursively reflecting the light having passed through the phase difference element.
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公开(公告)号:US09808985B2
公开(公告)日:2017-11-07
申请号:US14400824
申请日:2013-06-19
Applicant: SCIVAX CORPORATION
Inventor: Hirosuke Kawaguchi , Yutaka Taniguchi , Satoru Tanaka
CPC classification number: B29C59/04 , B29C35/0805 , B29C2059/023 , B29L2007/001 , G03F7/0002
Abstract: A roller-type depressing device, an imprint device and an imprint method utilizing the same which can depress an object like a die or a molding target by controlling the depressing force of a roller is provided. A roller-type depressing device to depress the object with a roller includes a pressure adjusting plate provided with the roller, a roller moving unit moving the roller relative to the object, a pressure adjusting unit holding the pressure adjusting plate in such a way that force produced by a pressure difference in fluid applied to both faces of the pressure adjusting plate acts on the roller, a pressure receiving stage receiving the pressure of the roller via the object, and a pressure adjuster adjusting the pressure difference in fluid applied to both faces of the pressure adjusting plate.
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公开(公告)号:US08721950B2
公开(公告)日:2014-05-13
申请号:US13666339
申请日:2012-11-01
Applicant: Scivax Corporation , Maruzen Petrochemical Co., Ltd.
Inventor: Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
CPC classification number: B29C59/005 , B29C59/026 , B29K2045/00 , C08F232/08 , C08G61/06 , C08G61/08 , H05K1/032 , H05K3/0014 , H05K3/107 , H05K2201/0158 , H05K2203/0108
Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.)
Abstract translation: 用于热压印的树脂包括在主链中含有由以下化学式1或以下化学式2表示的骨架中的至少一种的环状烯烃系热塑性树脂。 玻璃化转变温度Tg(℃)和MFR在260℃下的值([M])满足下列等式1,[M]> 10。 热压印特性(转印性,脱模特性等)优异,生产率(生产率)提高。 Tg(℃)<219×log [M] -104 [等式1]
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