Method of fabricating metal-bearing integrated circuit structures having low defect density
    1.
    发明授权
    Method of fabricating metal-bearing integrated circuit structures having low defect density 有权
    制造具有低缺陷密度的金属轴承集成电路结构的方法

    公开(公告)号:US08258041B2

    公开(公告)日:2012-09-04

    申请号:US12816381

    申请日:2010-06-15

    Abstract: A method of fabricating metal-bearing structures in an integrated circuit such as metal-polysilicon capacitors using conductive metal compounds. Defects due to organometallic polymers formed during the etch of a hard mask material are minimized by using a process that includes a plasma etch for the hard mask that achieves a predominantly chemical character using a fluorine-based etch chemistry. Using a low-temperature liquid-phase strip of the hard mask photoresist instead of an ash prevents further cross-linking of polymers formed during the plasma etch. Etching the metal-bearing material using a hot fully-concentrated mixture of ammonium hydroxide and hydrogen peroxide allows short etch times that are particularly shortened for tantalum nitride films deposited with a nitrogen concentration of about 30 percent or greater.

    Abstract translation: 一种在集成电路中制造含金属结构的方法,例如使用导电金属化合物的金属 - 多晶硅电容器。 通过使用包括使用氟基蚀刻化学物质实现主要化学特征的硬掩模的等离子体蚀刻的方法,使在硬掩模材料的蚀刻期间形成的有机金属聚合物的缺陷最小化。 使用硬掩模光刻胶的低温液相条带代替灰分防止在等离子体蚀刻期间形成的聚合物的进一步交联。 使用氢氧化铵和过氧化氢的热的完全浓缩的混合物来蚀刻含金属材料允许短时间的蚀刻时间,其特别地缩短了以大约30%或更大的氮浓度沉积的氮化钽膜。

    METHOD AND APPARATUS FOR ASYNCHRONOUS MEDIATED COMMUNICATON
    3.
    发明申请
    METHOD AND APPARATUS FOR ASYNCHRONOUS MEDIATED COMMUNICATON 有权
    用于非同步介质通信的方法和装置

    公开(公告)号:US20090213852A1

    公开(公告)日:2009-08-27

    申请号:US12389358

    申请日:2009-02-19

    CPC classification number: H04L51/14 H04L51/34

    Abstract: A system and method for mediating the routing of asynchronous messages includes routing the asynchronous message to a first recipient, determining whether the first recipient opened the asynchronous message, and re-routing the asynchronous message to a second recipient who is qualified to receive and respond to the message if the first recipient fails to open the message. In an aspect, the second recipient is selected based upon the role that the second recipient performs within the system. In another aspect, the message is re-routed to the second recipient if the first recipient fails to open the message within a deadline imposed by the message sender. In another aspect, the message is re-routed to the second recipient if the first recipient fails to open the message within a deadline automatically imposed by the system when the message is of a certain type.

    Abstract translation: 用于中介异步消息的路由的系统和方法包括将异步消息路由到第一接收者,确定第一接收者是否打开异步消息,以及将异步消息重新路由到有资格接收和响应的第二接收者 该消息如果第一个收件人无法打开该消息。 在一方面,基于第二接收者在系统内执行的角色来选择第二接收者。 在另一方面,如果第一接收方在消息发送者施加的最后期限内未能打开消息,则该消息被重新路由到第二接收者。 在另一方面,如果第一接收方在消息是某种类型时在系统自动强加的期限内无法打开消息,则该消息被重新路由到第二接收方。

    METHOD OF FABRICATING METAL-BEARING INTEGRATED CIRCUIT STRUCTURES HAVING LOW DEFECT DENSITY
    6.
    发明申请
    METHOD OF FABRICATING METAL-BEARING INTEGRATED CIRCUIT STRUCTURES HAVING LOW DEFECT DENSITY 有权
    制造具有低缺陷密度的金属轴承集成电路结构的方法

    公开(公告)号:US20110306207A1

    公开(公告)日:2011-12-15

    申请号:US12816381

    申请日:2010-06-15

    Abstract: A method of fabricating metal-bearing structures in an integrated circuit such as metal-polysilicon capacitors using conductive metal compounds. Defects due to organometallic polymers formed during the etch of a hard mask material are minimized by using a process that includes a plasma etch for the hard mask that achieves a predominantly chemical character using a fluorine-based etch chemistry. Using a low-temperature liquid-phase strip of the hard mask photoresist instead of an ash prevents further cross-linking of polymers formed during the plasma etch. Etching the metal-bearing material using a hot fully-concentrated mixture of ammonium hydroxide and hydrogen peroxide allows short etch times that are particularly shortened for tantalum nitride films deposited with a nitrogen concentration of about 30 percent or greater.

    Abstract translation: 一种在集成电路中制造含金属结构的方法,例如使用导电金属化合物的金属 - 多晶硅电容器。 通过使用包括使用氟基蚀刻化学物质实现主要化学特征的硬掩模的等离子体蚀刻的方法,使在硬掩模材料的蚀刻期间形成的有机金属聚合物的缺陷最小化。 使用硬掩模光刻胶的低温液相条带代替灰分防止在等离子体蚀刻期间形成的聚合物的进一步交联。 使用氢氧化铵和过氧化氢的热的完全浓缩的混合物来蚀刻含金属材料允许短时间的蚀刻时间,其特别地缩短了以大约30%或更大的氮浓度沉积的氮化钽膜。

    METHOD AND APPARATUS FOR MONITORING MESSAGE STATUS IN AN ASYNCHRONOUS MEDIATED COMMUNICATION SYSTEM
    8.
    发明申请
    METHOD AND APPARATUS FOR MONITORING MESSAGE STATUS IN AN ASYNCHRONOUS MEDIATED COMMUNICATION SYSTEM 有权
    用于监测异常介质通信系统中的消息状态的方法和装置

    公开(公告)号:US20100161743A1

    公开(公告)日:2010-06-24

    申请号:US12551520

    申请日:2009-08-31

    CPC classification number: H04L51/14 G06F19/00 H04L51/34

    Abstract: A system and method for mediating the routing of asynchronous messages includes routing the asynchronous message to a first recipient, determining whether the first recipient opened the asynchronous message, and re-routing the asynchronous message to a second recipient who is qualified to receive and respond to the message if the first recipient fails to open the message (i.e., read, listen, display, act upon the message). In an embodiment, the message is re-routed to the second recipient if the first recipient fails to open the message within a deadline automatically imposed by the system when the message is of a certain type. In an embodiment, a mediator monitors if any recipient accepts responsibility for the asynchronous message and informs the other recipients that the asynchronous message may be deleted from their message queues.

    Abstract translation: 用于中介异步消息的路由的系统和方法包括将异步消息路由到第一接收者,确定第一接收者是否打开异步消息,以及将异步消息重新路由到有资格接收和响应的第二接收者 如果第一个收件人无法打开消息(即,读取,收听,显示,对消息执行操作)的消息。 在一个实施例中,如果第一接收方在消息是某种类型时在系统自动强加的期限内无法打开该消息,则该消息被重新路由到第二接收方。 在一个实施例中,调解器监视任何接收者是否接受异步消息的责任,并通知其他收件人异步消息可能从其消息队列中删除。

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