公开(公告)号：US20190206040A1

公开(公告)日：2019-07-04

申请号：US16200377

申请日：2018-11-26

Applicant: TechInsights Inc.

Inventor： Michael Green

IPC: G06T7/00 ,  G06F17/50 ,  G06F21/14

Abstract: Described are reverse engineering data analysis systems, and integrated circuit component data processing tools and methods thereof. A system can comprise: a data storage device operable to store a data structure comprising extracted IC component data nodes representative of corresponding IC components of target IC and a connectivity therebetween; a graphical user interface (GUI); and a digital data processor operable on said data structure to: render, via said GUI, a dynamic graph of said data nodes; graphically migrate at least some of said data nodes on said dynamic graph as a function of a connectivity thereof with other nodes, wherein connected nodes are attractively displaced relative to one another such that said migrating nodes progressively cluster with related nodes to define distinct IC component clusters representative of distinct groups of related IC components of the target IC, whereas unconnected notes are repulsively displaced so to progressively distance said unconnected nodes.

公开(公告)号：US20180144081A1

公开(公告)日：2018-05-24

申请号：US15809830

申请日：2017-11-10

Applicant: TechInsights Inc.

Inventor： Dale CARLSON

IPC: G06F17/50 ,  G06T7/00

CPC classification number: G06F17/5068 ,  G06F17/5081 ,  G06T7/0002 ,  G06T2207/30148

Abstract: Described are various embodiments of a system and method for verifying extracted integrated circuit (IC) features representative of a source IC and stored in a feature dataset structure. Generally, a set of extracted IC features imaged within a designated IC area is converted into a static tile image. The static tile image is then rendered for visualization as an interactive mapping of the feature dataset structure within the area. Corrections for one or more of the set of extracted IC features are received based on the static tile image and input corrections are executed on the feature dataset structure to produce an updated feature dataset structure.

公开(公告)号：US20170089813A1

公开(公告)日：2017-03-30

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: G01N1/32 ,  H01J37/32 ,  H01L23/00

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10803577B2

公开(公告)日：2020-10-13

申请号：US16200377

申请日：2018-11-26

Applicant: TechInsights Inc.

Inventor： Michael Green

IPC: G06F30/327 ,  G06F30/398 ,  G06F21/14 ,  G06T7/00

Abstract: Described are reverse engineering data analysis systems, and integrated circuit component data processing tools and methods thereof. A system can comprise: a data storage device operable to store a data structure comprising extracted IC component data nodes representative of corresponding IC components of target IC and a connectivity therebetween; a graphical user interface (GUI); and a digital data processor operable on said data structure to: render, via said GUI, a dynamic graph of said data nodes; graphically migrate at least some of said data nodes on said dynamic graph as a function of a connectivity thereof with other nodes, wherein connected nodes are attractively displaced relative to one another such that said migrating nodes progressively cluster with related nodes to define distinct IC component clusters representative of distinct groups of related IC components of the target IC, whereas unconnected notes are repulsively displaced so to progressively distance said unconnected nodes.

公开(公告)号：US10689763B2

公开(公告)日：2020-06-23

申请号：US15379049

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  G01N1/32 ,  H01L23/00 ,  H01J37/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US10469777B2

公开(公告)日：2019-11-05

申请号：US15560935

申请日：2016-03-22

Applicant: TechInsights Inc.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin ,  Vladimir Martincevic

IPC: H01J37/304 ,  H01J37/26 ,  H01J37/22 ,  H04N5/357 ,  G01N23/2251 ,  H01J37/28

Abstract: Devices, systems and methods relating to a distortion-correcting imaging for collecting image-related data of a substrate are disclosed, comprising: a beam emitter for directing an emission at an intended location on the substrate, and a signal detector for determining a signal intensity value associated with the emission; wherein the signal intensity value is associated with a corrected substrate location, said corrected substrate location determined from the intended substrate location and a correction factor, said correction factor being a function of said intended substrate location.

公开(公告)号：US20170096741A1

公开(公告)日：2017-04-06

申请号：US15378551

申请日：2016-12-14

Applicant: TECHINSIGHTS INC.

Inventor： Robert K. Foster ,  Christopher Pawlowicz ,  Jason Abt ,  Ian Jones ,  Heinz Josef Nentwich

IPC: C23F4/00 ,  H01J37/32 ,  G01N1/32 ,  H01L21/263 ,  H01L21/66

Abstract: There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.

公开(公告)号：US12165840B2

公开(公告)日：2024-12-10

申请号：US17309372

申请日：2019-11-20

Applicant: TechInsights Inc.

Inventor： Christopher Pawlowicz ,  Alexander Sorkin

IPC: H01J37/304 ,  G01N1/28 ,  G01N1/32 ,  G01N23/2251 ,  G01R31/28 ,  H01J37/31

Abstract: Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.

公开(公告)号：US20230273256A1

公开(公告)日：2023-08-31

申请号：US18007716

申请日：2021-06-01

Applicant: Christopher Pawlowicz ,  Spyridon Ntais ,  TECHINSIGHTS INC.

Inventor： Christopher Pawlowicz ,  Spyridon Ntais

IPC: G01R31/28 ,  G01N23/2251 ,  H01L23/14

CPC classification number: G01R31/2898 ,  G01N23/2251 ,  H01L23/147 ,  G01N2223/6116

Abstract: Described are various embodiments of a contrast-enhancing staining system and method. In one embodiment, a method is described for enhancing contrast in an image of a substrate surface between regions of said substrate having different charge carrier characteristics. The method comprises exposing said substrate to a staining precursor comprising an oxidant; directing microwave electromagnetic radiation at the substrate, said microwave electromagnetic radiation enhancing a reaction rate of said oxidant reacting into a deposition material, said reaction rate being related to the charge carrier characteristics of a proximal region; and acquiring an image of said substrate surface indicating a visual contrast between each of said regions based on differential deposition of the deposition material therebetween.

公开(公告)号：US20220399179A1

公开(公告)日：2022-12-15

申请号：US17805663

申请日：2022-06-06

Applicant: TECHINSIGHTS INC.

Inventor： Christopher PAWLOWICZ ,  Alexander SORKIN ,  Trevor Jason FRENCH ,  Ian JONES ,  Paul GAGNON

IPC: H01J37/08 ,  H01J37/32

Abstract: Described are various embodiments of an ion beam chamber fluid delivery system and method for delivering a fluid onto a substrate in an ion beam system during operation. In one embodiment, the system comprises: a chamber comprising an ion beam gun oriented so as to cause ions to impinge the substrate, said chamber having a fluid delivery conduit therein for delivering the fluid into the chamber; a transferable substrate stage for holding the substrate, the transferable stage further configured to move between an operating position and a payload position during non-operation, said payload position for receiving and removing said substrate; and a fluid delivery nozzle being in a fixed location relative to the transferable stage, at least during operation, with an outlet position that is configured to deliver a fluid to a predetermined location on said transferable stage.